L. R. Sohngen

ORCID: 0009-0008-9867-472X
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About
Contact & Profiles
Research Areas
  • Metal and Thin Film Mechanics
  • Diamond and Carbon-based Materials Research
  • Laser-Plasma Interactions and Diagnostics
  • Boron and Carbon Nanomaterials Research
  • Ion-surface interactions and analysis

Lawrence Livermore National Laboratory
2023-2024

Sputter deposition of ultrathick (≈20μm) Au–Ta alloy coatings on sphero-cylindrical substrates is key for the fabrication hohlraums magnetically assisted inertial confinement fusion. Here, we study AuTa4 onto rotating substrates. We use high-power impulse magnetron sputtering (HiPIMS) in a constant peak target voltage mode. Results show that erosion state has strong impact dominant crystallographic phase, microstructure, surface morphology, and electrical resistivity films. This due to...

10.1063/5.0186803 article EN cc-by-nc-nd Journal of Applied Physics 2024-01-17

Conventional magnetron sputter deposition of B4C uses Ar as the working gas. Here, we explore with a Ne plasma, which is expected to exhibit larger sputtering yields than Ar. We study properties films deposited different substrate tilt angles source operated in either direct-current (DC) or radio-frequency (RF) mode an plasma. Results show that film are determined by combination ballistics and effects gas on plasma discharge phase scattering depositing species flux. At constant power, rates...

10.1063/5.0193653 article EN cc-by Journal of Applied Physics 2024-02-28
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