Hannah R. M. Margavio

ORCID: 0000-0001-5327-3713
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About
Contact & Profiles
Research Areas
  • Semiconductor materials and devices
  • Electronic and Structural Properties of Oxides
  • CO2 Reduction Techniques and Catalysts
  • Advanced Photocatalysis Techniques
  • Ferroelectric and Negative Capacitance Devices
  • ZnO doping and properties
  • Copper Interconnects and Reliability
  • Electrocatalysts for Energy Conversion
  • Molecular Junctions and Nanostructures
  • Gas Sensing Nanomaterials and Sensors
  • TiO2 Photocatalysis and Solar Cells
  • Covalent Organic Framework Applications
  • Advancements in Semiconductor Devices and Circuit Design
  • Transition Metal Oxide Nanomaterials
  • Ga2O3 and related materials
  • Catalytic Processes in Materials Science
  • Nanofabrication and Lithography Techniques

North Carolina State University
2021-2025

TiO2 thin films are often used as protective layers on semiconductors for applications in photovoltaics, molecule–semiconductor hybrid photoelectrodes, and more. Experiments reported here show that silicon electrochemically photoelectrochemically reduced buffered acetonitrile at potentials relevant to photoelectrocatalysis of CO2 reduction, N2 H2 evolution. On both n-type Si irradiated p-type Si, reduction is proton-coupled with a 1e–:1H+ stoichiometry, demonstrated by the Nernstian...

10.1021/jacs.4c00014 article EN Journal of the American Chemical Society 2024-04-02

Despite recent advances in area-selective deposition (ASD) processes, most studies have focused on single-material ASD. Multi-material ASD processes could provide additional flexibility for fabricating semiconductor devices. In this work, we identify process requirements to sequentially combine two intrinsic processes: (1) poly(3,4-ethylenedioxythiophene) (PEDOT) SiO2 vs Si–H via oxidative chemical vapor and (2) W atomic layer deposition. Using ex situ X-ray photoelectron spectroscopy, show...

10.1021/acs.chemmater.3c00530 article EN Chemistry of Materials 2023-05-22

Semiconductor photoelectrodes are regularly coupled to solid-state heterogeneous catalysts perform solar-driven reduction of CO2. Less frequently, molecular employed better control the reactivity toward desired products, yet development robust semiconductor/molecule interfaces has proven challenging. Here, we demonstrate that a 2-3 nm thermal oxide layer on Si exhibits stability in aqueous solution, high photovoltage, and photocurrent density ∼10 mA/cm2 for photoelectrochemical homogeneous...

10.1021/jacs.4c17251 article EN Journal of the American Chemical Society 2025-03-18

The strategy of incorporating earth-abundant catalytic centers into light-absorbing architectures is desirable from the viewpoint low cost, toxicity, and versatility at activating small molecules to produce solar-based fuels. Herein, we show that an Fe-bearing quaterpyridine molecular species can be anchored a light-absorbing, crystalline, carbon nitride, i.e., yielding molecular-catalyst/material hybrid capable facilitating selective CO2 reduction in aqueous solution. This material...

10.26434/chemrxiv-2025-qhfhd preprint EN cc-by-nc-nd 2025-03-24

Printed component sizes in electronic circuits are approaching 10 nm, but inherent variability feature alignment during photolithography poses a fundamental barrier for continued device scaling. Deposition-based self-aligned patterning is being introduced, nuclei defects remain an overarching problem. This work introduces low-temperature chemically film growth via simultaneous thin deposition and etching adjacent regions on nanopatterned surface. During deposition, nucleation avoided...

10.1021/acsnano.1c04086 article EN ACS Nano 2021-06-25

Area-selective deposition (ASD) has recently emerged as a promising augmentation of lithographic patterning small device features. However, current ASD processes are restricted to predefined growth and nongrowth surfaces, limiting their flexibility in industrial processing. In this work, we define the concept "dual-tone ASD," where patterned surface is tuned enable on one two adjacent surfaces while avoiding other surface. For example case starting with poly(3,4-ethylenedioxythipohene)...

10.1021/acs.chemmater.3c03158 article EN Chemistry of Materials 2024-02-27

Abstract Area‐selective deposition (ASD) is a forefront nanopatterning technique gaining substantial attention in the semiconductor industry. While current research primarily addresses single‐material ASD, exploring multi‐material ASD essential for mitigating complexity advanced nanopatterning. This study describes molybdenum hexafluoride (MoF 6 )‐mediated fluorination/passivation of hydroxylated SiO 2 (SiO ‒OH) at 250 °C as new method to pacify nucleation during subsequent ZnO and TiO...

10.1002/adfm.202316872 article EN cc-by Advanced Functional Materials 2024-04-25

Carbon electrodes are ideal for electrochemistry with molecular catalysts, exhibiting facile charge transfer and good stability. Yet solar-driven catalysis semiconductor light absorbers, stable semiconductor/carbon interfaces can be difficult to achieve, carbon's high optical extinction means it only used in ultrathin layers. Here, we demonstrate a plasma-enhanced chemical vapor deposition process that achieves well-controlled of out-of-plane "fuzzy" graphene (FG) on thermally oxidized Si...

10.1021/acsami.4c04691 article EN ACS Applied Materials & Interfaces 2024-07-12

Silicon-based photoelectrochemical devices show promise for the performance of light-driven CO2 reduction but suffer from instability under conditions relevant to reduction. Coating silicon electrodes with thin layers metal oxides has shown passivate unstable surfaces, and many different can be deposited on using various techniques. In this study, we investigate fundamental WO3-coated photoelectrodes, which were generated by oxidation W-metal films via atomic layer deposition both...

10.1021/acs.jpcc.4c06105 article EN The Journal of Physical Chemistry C 2024-12-09
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