Shirui Zhao

ORCID: 0000-0002-5638-0175
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About
Contact & Profiles
Research Areas
  • Land Use and Ecosystem Services
  • Remote Sensing in Agriculture
  • Urban Heat Island Mitigation
  • Analytical Chemistry and Sensors
  • Surface Roughness and Optical Measurements
  • Biosensors and Analytical Detection
  • Nanofabrication and Lithography Techniques
  • Integrated Circuits and Semiconductor Failure Analysis
  • Advancements in Photolithography Techniques

Chinese Academy of Sciences
2014-2022

University of Chinese Academy of Sciences
2015-2022

Institute of Geographic Sciences and Natural Resources Research
2022

Institute of Microelectronics
2015

The national strategy for ecological protection and high-quality development is raising the security to an unprecedented level in Yellow River Basin (YRB) of China. Due explicitly analyzed land cover changes under climate change rapid urbanization YRB area since 1990, dynamic degree index, transfer matrix, geo-detector method were used explicate their key driving factors, based on spatial data from 1990 2020. results show that grasslands, croplands, forests are main types, accounting 48.37%,...

10.3390/land11091563 article EN cc-by Land 2022-09-14

Pattern distortions caused by the charging effect should be reduced while using electron beam lithography process on an insulating substrate. We have developed a novel SX AR-PC 5000/90.1 solution as spin-coated conductive layer, to help fabricate nanoscale patterns of poly-methyl-methacrylate polymer resist glass for phased array device application. This method can restrain influence substrate effectively. Experimental results show that solve problems distortion and main field stitching...

10.1088/1674-4926/35/12/126002 article EN Journal of Semiconductors 2014-12-01

The purity evaluation of deionized (DI) water is highly desirable for VLSI or ULSI industry, as the traditional "reverse osmosis filter" cannot always meet requirement towards DI water. filtered may still contain many contaminations which are not up to standard wet cleaning wafer surface. A novel method presented by analyzing residues a droplet after low-temperature evaporation. contamination contained in will remain during gasification. By residual contamination's morphology, can be...

10.1142/s0217984914502716 article EN Modern Physics Letters B 2015-01-30
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