A5004200570- Advanced Materials Characterization Techniques
- Advancements in Photolithography Techniques
- Advanced Surface Polishing Techniques
- Semiconductor materials and interfaces
- Silicon and Solar Cell Technologies
- Advanced X-ray Imaging Techniques
- Advanced ceramic materials synthesis
- Metal and Thin Film Mechanics
- Diamond and Carbon-based Materials Research
- Intermetallics and Advanced Alloy Properties
- Computer Graphics and Visualization Techniques
- Electron and X-Ray Spectroscopy Techniques
National Technical University "Kharkiv Polytechnic Institute"
2022-2024
By the method of X-ray tensometry (=0.154 nm), dependences residual stresses in Mo/Si multilayer Xray mirrors (MXMs) obtained by direct-current magnetron sputtering were studied as a function Ar pressure range 1…4 mTorr. It is shown that an increase accompanied from ~ 0.4 to 0.8 GPa for group with periods near 7 nm and 0.9 1.6 14 nm. The angles texture misorientation Mo crystallites measured argon pressure. Mechanisms have been proposed explain reasons stresses.
Abstract Application of x-ray multilayers as reflective masks for lithography is proposed. The mask a specially prepared multilayer mirror capable to selectively reflect x-rays. use grazing geometry allows pattern design on the be compressed in one direction. examples are given (WC/Si multilayers) with two types radiation source: an tube ( λ = 0.154 nm) and synchrotron ∼ 0.35 nm). compression segments by 14–33 times imprint size resist plane 3.5–4 μ m obtained. advantages proposed given....
Small-angle reflectometry, X-ray diffractometry and tensometry (=0.154 nm) were used to study the structure of Mo layers in Mo/Si multilayer mirrors produced by magnetron sputtering as a function Ar pressure range 1…4 mTorr. Two series samples with periods about 7 14 nm produced. In all MXMs, crystalline (c-Mo) Si amorphous. On average, lattice parameter a0 unstressed state is smaller for than series. It increases pressure, approaching tabular one. The content c-Mo has been estimated....
The work deals with the issue of miniaturization template images using X-ray radiation. compression method is based on fact that radiation directed at a specific reflects an grazing angle and one-dimensional compressed image recorded plane not parallel to template. advantage this relative simplicity its implementation. paper proposes use multilayer mirrors as reflective masks (RXM) for compression. Control structural parameters was carried out DRON- 3M diffractometer. RXM formed by...