Alzheimer disease (AD) is a of lost memories. Mushroom postsynaptic spines play key role in memory storage, and loss mushroom has been proposed to be linked AD. Generation amyloidogenic peptides accumulation amyloid plaques one the pathological hallmarks It important evaluate effects on stability spines.In this study we used vitro vivo models synaptotoxicity investigate hippocampal spines. We discovered that application Aβ42 oligomers cultures or injection directly into region resulted...

This work is devoted to the development of nanosphere lithography (NSL) technology, which a low-cost and efficient method form nanostructures for nanoelectronics, as well optoelectronic, plasmonic photovoltaic applications. Creating mask by spin-coating promising, but not sufficiently studied method, requiring large experimental base different sizes nanospheres. So, in this work, we investigated influence technological parameters NSL on substrate coverage area monolayer nanospheres with...

The possibility of using colloidal lithography at the industrial level depends on ability to form defect-free coatings over large areas. spin-coating method has not yet shown acceptable results, but a more detailed studying regularities this process may improve quality masks. Langmuir–Blodgett is expected be most preferable for forming high-quality large-scale monolayers. Real-time controlling surface pressure monolayer can allow obtain close-packed arrays with long-range order. In work,...

A method for simple and fast (30-60 s) synthesis of spherical "Fe3O4 core-carbon shell" structures by atmospheric pressure aerosol pyrolysis benzoic acid in dimethylformamide solutions containing dispersed Fe3O4 nanoparticles is described. It has been experimentally shown that it possible to control both the size core-shell particles grains their amount particle core variation concentration solution using pre-stabilized mannitol iron oxide nanoparticles. found with an average 250-350 nm are...

Traditional approaches to creating colloidal crystals do not simultaneously achieve uniform thickness, three-dimensional ordering, and large areas of defect-free hexagonal close-packed domains. Only the realization all these conditions will allow use as templates for fabricating inverse opals with a tunable photonic band gap. Therefore, we propose novel approach 3D crystals. It combines Langmuir–Blodgett (LB) process form first layer sequential spin-coating processes following layers. The...

Abstract This work is the first systematic study of microhardness, scratch resistance, and abrasion resistance protective silica‐like layers deposited on polycarbonate by atmospheric pressure plasma‐enhanced chemical vapor deposition (AP PECVD) from tetraethoxysilane (TEOS) hexamethyldisiloxane (HMDSO). The influence layer composition abovementioned mechanical properties was considered in detail. It has been found that films HMDSO at 110°C are characterized a microhardness value almost three...

This work is an extensive study of the plasma chemical etching (PCE) process single-crystalline lithium niobate (LiNbO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> ) in SF xmlns:xlink="http://www.w3.org/1999/xlink">6</sub> /O xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> based inductively coupled (ICP). The influence main technological parameters LiNbO PCE process, including distance between sample and lower edge discharge...

In this work, we studied the influence of technological parameters plasma chemical etching silicon on rate, photoresist selectivity in relation to a photoresist, and sidewall angle etched structures. It was found that rate increases with raising percentage SF6 gas mixture (25%–50%), pressure (1–2.5 Pa), high-frequency (HF) power (1000–2000 W), bias voltage module (15–75 V) decreases total flow (5–35 SCCM) due increasing passivation efficiency sample surface. The HF power, different...

Abstract A detailed study of the influence technological parameters plasma chemical etching process in inductively coupled on rate single-crystal silicon carbide is presented. The physicochemical substantiation experimentally revealed patterns given. optimal gas mixture was determined terms SiC. It established that dependence percentage oxygen total non-linear. Thus, with an increase O 2 up to 23%, SiC gradually increases 560 nm/min, a further leads sharp decrease 160 nm/min at content 31%....

In this work, a method for in situ diagnostics of the etching profile silicon structures (etching window sizes 15–400 μm) using optical emission spectroscopy was proposed. To determine relationship between and plasma parameters, influence technological parameters on characteristics (vertical lateral rate, selectivity relation to photoresist, sidewall angle) studied. As general parameter, which reflects changes depending selected parameter X (C/F ratio SF6/C4F8 plasma) introduced. Based...

Abstract In this work we studied the influence of technological parameters plasma chemical etching silicon on photoresist rate, selectivity in relation to photoresist, and inclination angle profile wall etched windows. Based obtained results, a common regularity between windows optical emission spectra was revealed. The method situ diagnostics proposed, namely, controlling by ratio intensities carbon line (517.1 nm) fluorine (685.8 nm 703.9 designated as parameter X. It found that takes...

This paper presents the results of investigation gold nanoparticle array formation on GaN surface and its plasmon effect. Gold nanoparticles are formed layer grown by molecular beam epitaxy (MBE) solid-state dewetting technique both in air at atmospheric pressure under vacuum conditions. The influence thickness as-deposited film annealing ambient size spatial distribution was studied. Investigation optical characteristics showed appearance resonance reveal possibility to increase efficiency...

Abstract In this work, in situ non-perturbing method of optical emission spectroscopy is used to examine the features spectra NF 3 /Xe plasma, which can be for process continuous plasma-chemical etching lithium niobate. To understand physicochemical processes occurring influence high-frequency power, pressure chamber, bias voltage and substrate temperature on intensities F, N, Xe lines was studied. It determined that increasing from -300 -50 V 50 300°C doesn’t change relative analysed...

Abstract An article presents a study of the regularities formation gold up to 8 nm thick, deposited by vacuum thermal deposition on silicon wafers with natural oxide, its annealing and subsequent iron oxide chemical vapor deposition. The stages were accompanied SEM analysis sample surface, as well fixation optical FTIR spectra, I–V characteristics obtained structures.