A5071729996- X-ray Diffraction in Crystallography
- Crystallization and Solubility Studies
- Semiconductor materials and devices
- Organometallic Complex Synthesis and Catalysis
- Crystallography and molecular interactions
- Copper Interconnects and Reliability
- Metal complexes synthesis and properties
- Coordination Chemistry and Organometallics
- Synthesis and characterization of novel inorganic/organometallic compounds
- Electronic and Structural Properties of Oxides
- Inorganic Chemistry and Materials
- Metal and Thin Film Mechanics
- Catalytic Processes in Materials Science
- Magnetism in coordination complexes
- Ferrocene Chemistry and Applications
- Lanthanide and Transition Metal Complexes
- Molecular Junctions and Nanostructures
- Inorganic and Organometallic Chemistry
- Energetic Materials and Combustion
- Semiconductor materials and interfaces
- Synthesis of Tetrazole Derivatives
- Synthetic Organic Chemistry Methods
- Asymmetric Hydrogenation and Catalysis
- N-Heterocyclic Carbenes in Organic and Inorganic Chemistry
- Fluorine in Organic Chemistry
Wayne State University
2016-2025
Wayne State College
2024
Therapeutics Clinical Research
2022
Applied Materials (United States)
2019
The University of Texas at Dallas
2016
Michigan United
2016
University of Helsinki
2005-2007
Budapest University of Technology and Economics
2006
Helsinki Institute of Physics
2005
Bolton NHS Foundation Trust
2001
ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTPreparation, electrochemical oxidation, and XPS studies of unsymmetrical ruthenocenes bearing the pentamethylcyclopentadienyl ligandPaul G. Gassman Charles H. WinterCite this: J. Am. Chem. Soc. 1988, 110, 18, 6130–6135Publication Date (Print):August 1, 1988Publication History Published online1 May 2002Published inissue 1 August 1988https://pubs.acs.org/doi/10.1021/ja00226a030https://doi.org/10.1021/ja00226a030research-articleACS PublicationsRequest...
We employed the atomic layer deposition technique to grow Al(2)O(3) films with nominal thicknesses of 400, 300, and 200 nm on silicon soda lime glass substrates. The optical properties were investigated by measuring reflection spectra in 400-1800 wavelength range, followed numerical fitting assuming Sellmeier formula for refractive index Al(2)O(3). grown substrates possess higher indices as compared silicon. Optical waveguiding is demonstrated, confirming feasibility high-index contrast...
ADVERTISEMENT RETURN TO ISSUEPREVCommunicationNEXTLow Temperature Thermal Atomic Layer Deposition of Cobalt Metal FilmsJoseph P. Klesko, Marissa M. Kerrigan, and Charles H. Winter*View Author Information Department Chemistry, Wayne State University, Detroit, Michigan 48202, United States*C. Winter. E-mail: [email protected]Cite this: Chem. Mater. 2016, 28, 3, 700–703Publication Date (Web):January 21, 2016Publication History Received8 September 2015Revised8 January 2016Published online22...
ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTA single-source precursor to titanium nitride thin films. Evidence for the intermediacy of imido complexes in chemical vapor deposition processCharles H. Winter, Philip Sheridan, T. Suren Lewkebandara, Mary Jane Heeg, and James W. ProsciaCite this: J. Am. Chem. Soc. 1992, 114, 3, 1095–1097Publication Date (Print):January 1, 1992Publication History Published online1 May 2002Published inissue 1 January...
ADVERTISEMENT RETURN TO ISSUEPREVCommunicationNEXTSurprising Titanium Complexes Bearing η2-Pyrazolato Ligands: Synthesis, Structure, and Molecular Orbital StudiesIlia A. Guzei, Anwar G. Baboul, Glenn P. Yap, Arnold L. Rheingold, H. Bernhard Schlegel, Charles WinterView Author Information Department of Chemistry, Wayne State University Detroit, Michigan 48202 Delaware Newark, 19716 Cite this: J. Am. Chem. Soc. 1997, 119, 14, 3387–3388Publication Date (Web):April 9, 1997Publication History...
ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXT(Trifluoromethyl)cyclopentadienide: a powerful electron-withdrawing ligand for transition-metal complexesPaul G. Gassman and Charles H. WinterCite this: J. Am. Chem. Soc. 1986, 108, 14, 4228–4229Publication Date (Print):July 1, 1986Publication History Published online1 May 2002Published inissue 1 July 1986https://pubs.acs.org/doi/10.1021/ja00274a065https://doi.org/10.1021/ja00274a065research-articleACS PublicationsRequest reuse permissionsArticle...
The atomic layer deposition of copper metal thin films was achieved using a three precursor sequence entailing Cu(OCHMeCH2NMe2)2, formic acid, and hydrazine. A constant growth rate 0.47−0.50 Å/cycle observed at temperatures between 100 170 °C. resulting are high purity have low resistivities.
Owing to its narrow band gap and promising magnetic photocatalytic properties, thin films of zinc ferrite (ZFO, ZnFe2O4) are appealing for fabrication devices in recording media photoelectrochemical cells. Herein we report the first time photactive ferrites via a solvent free, conventional CVD approach, resulting ZFO layers show promise as photocatalyst PEC water-splitting. For large scale applications, chemical vapor deposition (CVD) routes film deposition; however, very little is known...
ADVERTISEMENT RETURN TO ISSUEPREVCommunicationNEXTRuthenium Complexes Bearing η5-Pyrazolato LigandsJayani R. Perera, Mary Jane Heeg, H. Bernhard Schlegel, and Charles WinterView Author Information Department of Chemistry, Wayne State University Detroit, Michigan 48202 Cite this: J. Am. Chem. Soc. 1999, 121, 18, 4536–4537Publication Date (Web):April 27, 1999Publication History Received12 January 1999Published online27 April inissue 1 May...
ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTTerminal and Bridging Imido Complexes from Titanium Tetrachloride Primary Amines. Implications for the Chemical Vapor Deposition of Nitride FilmsT. Suren Lewkebandara, Philip H. Sheridan, Mary Jane Heeg, Arnold L. Rheingold, Charles WinterCite this: Inorg. Chem. 1994, 33, 25, 5879–5889Publication Date (Print):December 1, 1994Publication History Published online1 May 2002Published inissue 1 December...
The atomic layer deposition growth of Ga2O3 films was demonstrated using Ga2(NMe2)6 and water with substrate temperatures between 150 300 °C. At 250 °C, surface saturative achieved vapor pulse lengths ≥1.5 s. rate 1.0 Å/cycle at 170 Growth rates 1.1 0.89 were observed 275 respectively. In a series deposited the film thicknesses varied linearly number cycles. Time-of-flight elastic recoil detection analyses stoichiometric films, carbon, hydrogen, nitrogen levels 1 2.1, 4.8−5.4, 0.6−0.9 at. %,...
Treatment of MCl2 (M = Cr, Mn, Fe, Co, Ni) with 2 equiv lithium metal and 1,4-di-tert-butyl-1,3-diazadiene (tBu2DAD) in tetrahydrofuran at ambient temperature afforded Cr(tBu2DAD)2 (38%), Mn(tBu2DAD)2 (81%), Fe(tBu2DAD)2 (47%), Co(tBu2DAD)2 (36%), Ni(tBu2DAD)2 (41%). Crystal structure determinations revealed monomeric complexes that adopt tetrahedral coordination environments were consistent tBu2DAD radical anion ligands. To evaluate the viability M(tBu2DAD)2 as potential film growth...
The atomic layer deposition (ALD) of Cu metal films was carried out by a two-step process with Cu(OCHMeCH2NMe2)2 and BH3(NHMe2) on Ru substrates three-step employing Cu(OCHMeCH2NMe2)2, formic acid, Pd Pt substrates. demonstrated self-limited ALD growth at 150 °C pulse lengths ≥3.0 ≥1.0 s, respectively. An window observed between 130 160 °C, rate about 0.13 Å/cycle. Atomic force microscopy (AFM) scanning electron (SEM) revealed rough that likely originate from the nanoparticle seed layer....
The atomic layer deposition (ALD) of cobalt metal films is described using the precursor bis(1,4-di-tert-butyl-1,3-diazadienyl)cobalt and tert-butylamine or diethylamine. Platinum, copper, ruthenium, Si(100) with native oxide, thermal SiO2, hydrogen-terminated silicon, carbon-doped oxide substrates were used growth temperatures between 160 220 °C. Plots rate versus pulse lengths showed saturative, self-limited behavior at ≥3.0 s for ≥0.1 tert-butylamine. An ALD window was observed 170 200...
The initial stages of cobalt metal growth by atomic layer deposition are described using the precursors bis(1,4-di-tert-butyl-1,3-diazadienyl)cobalt and formic acid. Ruthenium, platinum, copper, Si(100), Si–H, SiO2, carbon-doped oxide substrates were used with a temperature 180 °C. On platinum plots thickness versus number cycles linear between 25 250 cycles, rates 0.98 Å/cycle. By contrast, on ruthenium showed delay up to before normal rate was obtained. No films observed after 50 cycles....
Treatment of anhydrous magnesium bromide with 2 equiv (1,3-di-tert-butylacetamidinato)lithium, (1,3-di-tert-butylbenzamidinato)lithium, (1,3-diisopropylacetamidinato)lithium, or (1-tert-butyl-3-ethylacetamidinato)lithium (prepared in situ from the corresponding carbodiimide and alkyllithium) diethyl ether at ambient temperature afforded bis(N,N'-di-tert-butylacetamidinato)magnesium (81%), bis(N,N'-di-tert-butylbenzamidinato)magnesium (82%), bis[bis(N,N'-diisopropylacetamidinato)magnesium]...
Treatment of anhydrous rare earth chlorides with three equivalents lithium 1,3-di-tert-butylacetamidinate (prepared in situ from the di-tert-butylcarbodiimide and methyllithium) tetrahydrofuran at ambient temperature afforded Ln(tBuNC(CH3)NtBu)3 (Ln = Y, La, Ce, Nd, Eu, Er, Lu) 57–72% isolated yields. X-Ray crystal structures these complexes demonstrated monomeric formulations distorted octahedral geometry about lanthanide(III) ions. These new are thermally stable >300 °C, sublime without...
Heretofore, η2-bonding of pyrazolato ligands to d-block metals has been extremely rare. The tantalum−pyrazolato complexes 1 and 2 exhibit η2-pyrazolato bonding have several unusual features. homoleptic complex contains three two η1-pyrazolato is the first contain both types modes. Complex "slipped" ligands, where one tantalum−nitrogen bond in each ligand 0.087−0.170 Å longer than other. This type coordination unprecedented.
ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTCyclopentadienylmetal trichloride formation versus metallocene dichloride in the reactions of silylated cyclopentadienes with zirconium and hafnium chlorides. Crystal structure (1,3-bis(trimethylsilyl)cyclopentadienyl)titanium trichlorideCharles H. Winter, Xiao Xing Zhou, Daniel A. Dobbs, Mary Jane HeegCite this: Organometallics 1991, 10, 1, 210–214Publication Date (Print):January 1991Publication History Published online1 May 2002Published inissue...
Treatment of MI(2) (M = Ca, Sr) or BaI(2)(THF)(3) with 2 equiv potassium tris(3,5-diethylpyrazolyl)borate (KTp(Et2)) tris(3,5-di-n-propylpyrazolyl)borate (KTp(nPr2)) in hexane at ambient temperature afforded CaTp(Et2)(2) (64%), SrTp(Et2)(2) BaTp(Et2)(2) (67%), CaTp(nPr2)(2) (51%), SrTp(nPr2)(2) (75%), and BaTp(nPr2)(2) (39%). Crystal structure determinations CaTp(Et2)(2), SrTp(Et2)(2), revealed monomeric structures. X-ray structural for strontium tris(pyrazolyl)borate (SrTp(2)) barium...
Treatment of MCl2 (M = Cu, Ni, Co, Fe, Mn, Cr) with 2 equiv α-imino alkoxide salts K(RR'COCNtBu) (R Me, tBu; R' iPr, tBu) afforded M(RR'COCNtBu)2 or [Mn(RR'COCNtBu)2]2 in 9-75% yields. These complexes combine volatility and high thermal stability have useful atomic layer deposition (ALD) precursor properties. Solution reactions between Mn showed that BH3(NHMe2) can reduce all to metal powders. ALD growth Cr films is demonstrated. film may be possible, but the oxidize completely upon exposure air.
ADVERTISEMENT RETURN TO ISSUEPREVCommunicationNEXTAtomic Layer Deposition of Aluminum Metal Films Using a Thermally Stable Hydride Reducing AgentKyle J. BlakeneyKyle BlakeneyDepartment Chemistry, Wayne State University, 5101 Cass Avenue, Detroit, Michigan 48202, United StatesMore by Kyle Blakeneyhttp://orcid.org/0000-0002-0375-0056 and Charles H. Winter*Charles WinterDepartment States*C. Winter. E-mail: [email protected]More Winterhttp://orcid.org/0000-0003-0416-1234Cite this: Chem. Mater....
Several (pyrazolato)potassium complexes have been prepared by deprotonation of the parent pyrazoles with potassium hydride in tetrahydrofuran. A crystal structure one derivative shows a hexameric formulation, each atom bonded to nitrogen atoms pyrazolato ligand an η2-fashion and two adjacent ligands η1-interactions. The utility these synthesis new is demonstrated.