A5020573981- Metal and Thin Film Mechanics
- Diamond and Carbon-based Materials Research
- Semiconductor materials and devices
- Boron and Carbon Nanomaterials Research
- Advanced materials and composites
- MXene and MAX Phase Materials
- High-Temperature Coating Behaviors
- GaN-based semiconductor devices and materials
- Polymer Nanocomposite Synthesis and Irradiation
- Ion-surface interactions and analysis
- nanoparticles nucleation surface interactions
Linköping University
2018-2024
Sandvik (Sweden)
2023
Ti1−x(AlySi1−y)xN coatings covering a wide compositional range, 0.38 < x 0.76 and 0.68 ≤ y 1.00, are deposited to investigate the influence of Al+/Si+ ion irradiation on microstructural mechanical properties. The samples grown in Ar/N2 atmosphere by hybrid high-power impulse dc magnetron co-sputtering (HiPIMS/DCMS) method with substrate bias synchronized Al+/Si+-rich portion HiPIMS pulses. Two Ti targets operated DCMS mode, while one AlSi target is mode. Four different compositions used:...
Titanium tungsten carbide (TiWC) coatings are deposited by a combined high-power impulse and dc magnetron co-sputtering (HiPIMS/DCMS) technique. No external heating is applied during deposition phase, instead, the thermally driven adatom mobility substituted heavy ion irradiation. DCMS sources equipped with titanium targets provide constant neutral fluxes to establish predominant coating structures, whereas target in HiPIMS mode serves as source of metal-ions. Substrate bias -60V...
Abstract Detailed knowledge of correlations between direct current (DC) cathodic arc deposition process parameters, plasma properties, and the microstructure deposited coatings are essential for a comprehensive understanding DC process. In this study we have probed plasma, generated by on Ti-50 at.% Al cathode in N 2 ambience, at growth front TiAlN coating. Several consequences an increasing pressure observed, including decreased electron temperature, increased density, loss energetic ions....
We use a modified cathodic arc deposition technique, including an electromagnetic coil that introduces magnetic field in the vicinity of source, to study its influence on growth (Ti0.36Al0.64)N coatings. By increasing strength produced by coil, cathode spots are steered toward edge cathode, and electrons guided annular anode surrounding cathode. As result, plasma density between substrate decreased, which was observed as lateral spread plume, reduction rate. Optical emission spectroscopy...
The wurtzite phase of TiAlN has been known to form in industrial grade coatings with high Al content; yet, a significant knowledge gap exists regarding its behavior at temperatures and the impact defects on properties. Specifically, response implications characteristics are poorly understood. Here, high-temperature decomposition nitrogen-deficient epitaxial Ti1−xAlxNy (x = 0.79–0.98, y 0.82–0.86) films prepared by reactive magnetron sputtering was investigated using x-ray diffractometry...
A combined high-power impulse and dc magnetron co-sputtering (HiPIMS/DCMS) technique is used to deposit Ti0.6Al0.32Si0.08N films with 1-fold substrate table rotation. Layers are grown at two different substrate-target separations, rotational speeds, values of bias. The aim study the role (1) overlap between ion neutral fluxes generated from HiPIMS DCMS sources, respectively, (2) subplantation range low-mass ions. Results X-ray diffractometry highlight necessity flux intermixing in formation...
In this study, we use in-situ synchrotron x-ray diffractometry to monitor the real-time evolution of stress, grain size, and crystallographic orientation during cathodic arc deposition Titanium-Aluminium-Nitride (Ti1-xAlxN) films with varying Al content (x=0, 0.25, 0.5, 0.67). We vary substrate bias voltage evaluate its effect on film's stress size evolution. Our results show that deposited at a floating potential develop (111) fiber texture converged tensile while formed finite negative...