A5013851483- Microfluidic and Bio-sensing Technologies
- Plasmonic and Surface Plasmon Research
- Advanced Sensor and Energy Harvesting Materials
- Microfluidic and Capillary Electrophoresis Applications
- Orbital Angular Momentum in Optics
- Near-Field Optical Microscopy
- Metamaterials and Metasurfaces Applications
- Biosensors and Analytical Detection
- Graphene and Nanomaterials Applications
- Adhesion, Friction, and Surface Interactions
- Electrohydrodynamics and Fluid Dynamics
- Optical Coatings and Gratings
- Nanofabrication and Lithography Techniques
- Bee Products Chemical Analysis
- Advancements in Transdermal Drug Delivery
- 3D Printing in Biomedical Research
- Photonic and Optical Devices
- Solar-Powered Water Purification Methods
- Nanoparticles: synthesis and applications
- Contact Dermatitis and Allergies
- Advanced Materials and Mechanics
- Electrowetting and Microfluidic Technologies
- Shape Memory Alloy Transformations
- 3D Surveying and Cultural Heritage
- Silk-based biomaterials and applications
Chulalongkorn University
2014-2024
Nationwide Children's Hospital
2023
University of California, Berkeley
2005-2008
U.S. National Science Foundation
2008
Lawrence Berkeley National Laboratory
2008
Berkeley College
2006
University of California, Los Angeles
2004
We report the focusing of surface plasmon polaritons by circular and elliptical structures milled into optically thick metallic films or plasmonic lenses. Both theoretical experimental data for electromagnetic nearfield is presented. The mapped experimentally using scanning optical microscopy lithography. find that intensity at focal points lenses increases with size.
In this paper, we demonstrate high-density nanolithography by utilizing surface plasmons (SPs). SPs are excited on an aluminum substrate perforated with 2-D hole arrays using a near UV light source in order to resolve sub-wavelength features high transmission. Our lithography experiments 365 nm wavelength 90 dot array patterns 170 period, well beyond the diffraction limit of far-field optical lithography. transmission measurements, strong and wavelength-dependent observed, which confirms...
This article reviews major micro-and nanolithography techniques and their applications from commercial micro devices to emerging in nanoscale science engineering.Micro-and has been the key technology manufacturing of integrated circuits microchips semiconductor industry.Such a is also sparking revolutionizing advancements nanotechnology.The lithography including photolithography, electron beam lithography, focused ion soft nanoimprint scanning probe are discussed.Furthermore, summarized into...
Recently, the concept of superlensing has received considerable attention for its unique ability to produce images below diffraction limit. The theoretical study predicted a 'superlens' made materials with negative permittivity and/or permeability, is capable resolving features much smaller than working wavelength and near-perfect image can be obtained through restoration lost evanescent waves (Pendry 2000 Phys. Rev. Lett. 85 3966–9). We have already demonstrated that 60 nm half-pitch object...
Nearfield scanning optical microscopy (NSOM) offers a practical means of imaging, sensing, and nanolithography at resolution below the diffraction limit light. However, its applications are limited due to strong attenuation light transmitted through subwavelength aperture. To solve this problem, we report development plasmonic nearfield microscope with an efficient focusing. By exciting surface plasmons, NSOM probes capable confining into 100 nm spot. We show by lithography experiments that...
A plasmonic interference pattern can be formed when multiple surface plasmon waves overlap coherently. Utilizing a sharp edge coupling mechanism, we experimentally demonstrate patterns that designed at will by shaping the edges in metallic film. The also dynamically tailored adjusting wavelength, polarization, and incident angle of excitation light beam. Possessing subdiffraction limited feature resolution, this dynamical manipulation method have profound potentials nanolithography, particle...
Titanium oxide (TiO2) exhibits intrinsically strong absorption of ultraviolet (UV) light, which has been utilized in a variety applications, such as environmental purification/sterilization, health care, and energies. Accordingly, it is greatly demanded to precisely tune further improve the UV TiO2 significantly broaden its versatility. Herein, we report an extraordinary enhancement nanoparticles (NPs) incorporated with graphene nanodots (GNDs) low oxygen concentration. Chemically bonded...
The development of a near-field optical lithography is presented in this paper. By accessing short modal wavelengths localized surface plasmon modes on planar metallic mask, the resolution can be significantly increased while using conventional UV light source. Taking into account real material properties, numerical studies indicate that ultimate lithographic at 20nm achievable through silver mask by 365nm wavelength light. quality improved adding an adhesion layer titanium during...
The development of a nanolithography technique utilizing ultrashort wavelength surface plasmons (SPs) is presented in this article. mask consists silver thin film perforated with two-dimensional hole arrays exhibiting superior confinement due to SPs equal 14 that the illuminating light (365 nm). This short can confine field on an area much smaller compared excitation wavelength, leading higher resolution lithography than conventional photolithography methods. Finite-difference time-domain...
Our laboratory has the fundamental responsibility to study cancer stem cells (CSC) in various models of human and animal neoplasms. However, major impediments that spike our accomplishment are lack universal biomarkers cellular heterogeneity. To cope with these restrictions, we have tried apply concept single cell analysis, which hitherto been recommended throughout world as an imperative solution pack for resolving such dilemmas. Accordingly, first step was utilize a predesigned spiral...
This paper demonstrates the potential of anisotropic 3D printing for alignable carbon nanomaterials. The ferrite-decorated nanocarbon material was synthesized via a sodium solvation process using epichlorohydrin as coupling agent. Employing one-pot synthesis approach, novel incorporated into photopolymer, manipulated, and printed low-cost microscale printer, equipped with digital micromirror lithography, monitoring optics, magnetic actuators. technique highlights ability to control...
We have investigated the novel plasmonic nanolithography by exposing a photoresist layer through mask, which is an opaque metal film with subwavelength hole arrays in it. The of various diameters are fabricated using focused ion beam (FIB). Through lithography, array patterns transferred to negative photoresists. As result, high contrast dot smallest diameter 120 nm, equivalent /spl sim//spl lambda//3, observed atomic force microscope (AFM).