A5086645448- Advancements in Photolithography Techniques
- Advanced Surface Polishing Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Ultrasound Imaging and Elastography
- Semiconductor materials and devices
- Electron and X-Ray Spectroscopy Techniques
- Photoacoustic and Ultrasonic Imaging
- Nanofabrication and Lithography Techniques
- Ultrasonics and Acoustic Wave Propagation
- Material Properties and Applications
- Molecular Junctions and Nanostructures
- Aeroelasticity and Vibration Control
- Advanced X-ray Imaging Techniques
- Engineering Applied Research
- Nanowire Synthesis and Applications
- Photocathodes and Microchannel Plates
- Ultrasound and Hyperthermia Applications
- Plasma Diagnostics and Applications
National Taiwan University
2008-2017
Multiple-electron-beam–direct-write lithography is one promising candidate for next-generation because of its high resolution and ability maskless operation. To achieve the throughput high-volume manufacturing, miniaturized electro-optics elements are utilized to drive massively parallel beams simultaneously. Fabrication errors uniformity can be serious issues in multiple-beam systems. Traditionally, electron optical systems (EOSs) assembled tested directly after fabricated. The yield by...
Electron-beam lithography is one of the promising candidates to replace optical projection due its high resolution and maskless direct-write capability. In order achieve throughput requirement for high-volume manufacturing, miniaturized electro-optics elements are utilized drive massively parallel beams simultaneously. high-throughput multiple-electron-beam systems, beam positioning drift problems can become quite serious several factors such as thermal distortion fabrication errors electron...
The design, fabrication, and evaluation of a high-frequency single-element transducer are described. has an annular geometry, with the thickness piezoelectric material increasing from center to outside. This (SEAT) can provide broader frequency range than conventional uniform (single-element transducer, or SEUT). We compared characteristics SEAT SEUT. Both transducers used 36deg-rotated, Y-cut lithium niobate (LiNbO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML"...
The purpose of this study is to propose and implement a new type high-frequency single-element annular transducer (SEAT) with increased bandwidth. Such broadband can be used improve the axial resolution and/or perform contrast tissue harmonic imaging. Compared conventional single element uniform thickness (SEUT), SEAT has an geometry piezoelectric material increasing from center outside. consisted six subelements, whose ranged 60 mum 110 mum. Note that each side pattern electrically...
Low-energy electron beam lithography is one of the promising next-generation technology solutions for 21-nm half-pitch node and beyond because fewer proximity effects, higher resist sensitivity, less substrate damage compared with high-energy lithography. To achieve high-throughput manufacturing, low-energy systems writing parameters larger size, grid lower dosage are preferred. However, shot noise can significantly increase critical dimension deviation line edge roughness. Its influence on...
Multiple-electron-beam-direct-write lithography is one of the promising candidates for next-generation because its high resolution and ability maskless operation. In order to achieve throughput requirement highvolume manufacturing, miniaturized electro-optics elements are utilized in drive massively parallel beams simultaneously. Electron beam drift problems can become quite serious multiple-beam systems. Periodic recalibration with reference markers on wafer has been single-beam systems...
The availability of metrology solutions, one the key factors to drive leading edge semiconductor devices and processes, can be confronted with difficulties in advanced node. For developing new high quality test structures fabricated at specific sizes are needed. Conventional resist-based lithography have been utilized manufacture such samples. However, it encounter significant resolution or requiring complicated optimization process for technology In this work, potential helium ion beam...
Low-energy electron beam lithography is a promising patterning solution for the 21 nm half-pitch node and beyond due to its high resolution, low substrate damage, increased resist sensitivities. To ensure successful electron-optical system (EOS) design, many factors such as focusing properties (FPs) fidelity (PF) have be considered. In traditional EOS optimization flow, FPs are typical performance indices selected when optimizing design parameters. each numerical iteration, FP simulation...
Zone plate array lithography (ZPAL) in the X-ray or EUV regimes is one possible next-generation solution because of its potential for high-resolution and maskless operation. To achieve a high throughput, Fresnel zone plates (FZPs) are integrated to form arrays massively parallel exposure beams. FZP fabrication errors uniformity can be serious issues ZPAL systems, which usually assembled tested directly after (ZPAs) fabricated. The yield this approach decrease significantly with increasing...
To improve the throughput of electron-beam–direct-write lithography (EBDWL), we propose a new electron-optical system (EOS) design method with capability systematically optimizing EOSs various types emission source. A ball-tip source initially proposed by another group is further discussed. numerical optimization utilized in to maximize EOS current while satisfying constraints including size electron beam spot and amount induced electric field on electrodes insulators inside EOSs. For...
Fresnel lens design has been used for annular arrays. In this case, the surface area of each concentric ring is same. By doing so, phase shift between adjacent transducer elements remains constant when focusing at depth. Recently, a 40 MHz proposed with increased bandwidth by varying thickness piezoelectric material from center to edge. Although equal can maintain uniform spectral weighting such transducer, results in non-uniform elements. To shift, element needs be adjusted based on its...