Block copolymers (BCPs) and their directed self-assembly (DSA) has emerged as a realizable complementary tool to aid optical patterning of device elements for future integrated circuit advancements. Methods enhance BCP etch contrast DSA application further potential applications inorganic nanomaterial features (e.g., semiconductor, dielectric, metal oxide) are examined. Strategies modify, infiltrate controllably deposit materials by utilizing neat self-assembled thin films open rich design...

Abstract Optical metamaterials are artificially engineered architectures that exhibit desired optical properties not found in nature. Bespoke design requires the ability to define shape, size, orientation, and composition of material structures on nanometer length scale. Bottom‐up self‐assembly methods, such as block copolymer (BCP) templating, offer unique pathways tailored features, at spatial resolution routinely achieved by conventional top‐down techniques. In this review, authors...

ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTSmall lead sulfide (PbS) clusters prepared via ROMP block copolymer technologyV. Sankaran, C. Cummins, R. Schrock, E. Cohen, and J. SilbeyCite this: Am. Chem. Soc. 1990, 112, 19, 6858–6859Publication Date (Print):September 1, 1990Publication History Published online1 May 2002Published inissue 1 September 1990https://doi.org/10.1021/ja00175a019RIGHTS & PERMISSIONSArticle Views479Altmetric-Citations102LEARN ABOUT THESE METRICSArticle Views are the...

Nanostructured surfaces are common in nature and exhibit properties such as antireflectivity (moth eyes), self-cleaning (lotus leaf), iridescent colors (butterfly wings), water harvesting (desert beetles). We now understand can mimic some of these natural structures the laboratory. However, synthetic limited since they not easily mass produced over large areas due to scalability current technologies UV-lithography, high cost infrastructure, difficulty nonplanar surfaces. Here, we report a...

A strategy combining graphoepitaxy and a metal oxide enhanced PS-<italic>b</italic>-P4VP BCP is utilized for generating aligned Si nanofins with 10 nm feature sizes.

Molecular self-assembling block copolymers (BCPs) have shown promise as a next generation bottom-up lithography technology. However, critical step in advancing this approach is the elimination of polymer dewetting due to bulk solvent nucleation and thermodynamically driven film rupture that can occur during vapor annealing process. We report on pattern formation via phase segregation spin coated diblock copolymer films through investigation parameters limit high saturation conditions results...

A new enzyme-free sensor based on iron oxide (Fe3O4) nanodots fabricated an indium tin (ITO) substrate via a block copolymer template was developed for highly sensitive and selective detection of hydrogen peroxide (H2O2). The self-assembly-based process described here Fe3O4 formation is simple, cost-effective, reproducible process. H2O2 response the electrodes linear from 2.5 × 10–3 to 6.5 mM with sensitivity 191.6 μA mM–1cm–2 limit 1.1 mM. electrocatalytic activity toward electroreduction...

An electrochemical sensor using copper oxide nanodots (CuO nanodots–ITO) developed from a block copolymer template is demonstrated for sensitive and selective determination of dopamine (DA). The current signal CuO nanodots–ITO was linear with the concentration DA in range between 0.12 56.87 μM (R = 0.9975) sensitivity 326.91 μA mM–1 cm–2 detection limit 0.03 μM. Furthermore, anti-interference ability present to possible interfering substances including ascorbic acid, uric acetaminophen,...

The self-assembly of ultra-high molecular weight (UHMW) block copolymers (BCPs) remains a complex and time-consuming endeavor owing to the high kinetic penalties associated with long polymer chain entanglement. In this work, we report unique strategy overcoming these barriers through precision solvent annealing an UHMW polystyrene-block-poly(2-vinylpyridine) BCP system (Mw: ∼800 kg/mol) by fast swelling very levels concentration (ϕs). Phase separation on timescales ∼10 min is demonstrated...

ADVERTISEMENT RETURN TO ISSUEPREVArticleSynthesis of norbornenes containing tin(II), tin(IV), lead(II), and zinc(II) their polymerization to give microphase-separated block copolymersC. C. Cummins, M. D. Beachy, R. Schrock, G. Vale, V. Sankaran, E. CohenCite this: Chem. Mater. 1991, 3, 6, 1153–1163Publication Date (Print):November 1, 1991Publication History Published online1 May 2002Published inissue 1 November...

Microwave annealing is an emerging technique for achieving ordered patterns of block copolymer films on substrates. Little understood about the mechanisms microphase separation during microwave process and how it promotes blocks. Here, we use controlled power irradiation in presence tetrahydrofuran (THF) solvent, to achieve lateral high-χ lamellar-forming poly(styrene-b-lactic acid) PS-b-PLA. A highly line pattern was formed within seconds silicon, germanium silicon insulator (SOI) In-situ...

Block copolymers (BCPs) are seen as a possible cost effective complementary technique to traditional lithography currently used in the semiconductor industry. This unconventional approach has received increased attention recent years process capable of facilitating ever decreasing device size demanded. Control over microdomain orientation and enhancing long range order key aspects for utility BCPs future lithographic purposes. paper provides an efficient route fabrication highly ordered...

Solvothermal vapor annealing (STVA) was employed to induce microphase separation in a lamellar forming block copolymer (BCP) thin film containing readily degradable block. Directed self-assembly of poly(styrene)-block-poly(d,l-lactide) (PS-b-PLA) BCP films using topographically patterned silicon nitride demonstrated with alignment over macroscopic areas. Interestingly, we observed patterns aligned parallel as well perpendicular (perpendicular microdomains substrate both cases) the topography...

The prolonged and aggressive nature of scaling to augment the performance silicon integrated circuits (ICs) technical challenges costs associated with this has led study alternative materials that can use processing schemes analogous semiconductor manufacturing. We examine status recent efforts develop active device elements using nontraditional lithography in article, a specific focus on block copolymer (BCP) feature patterning. An elegant route is demonstrated directed self-assembly (DSA)...

ABSTRACT Self‐assembled thin films of a lamellar forming polystyrene‐ block ‐poly( d,l )lactide (PS‐ b ‐PLA) copolymer (BCP) contain “reactive” that can be readily removed to provide template for substrate pattern formation. Various methods PLA removal were studied here with view develop the system as an on‐chip etch mask patterning. Solvo‐microwave annealing was used induce microphase separation in PS‐ ‐PLA BCP periodicity 34 nm ( L o ) on silicon and insulator (SOI) substrates. Wet etches...

High-mobility materials and non-traditional device architectures are of key interest in the semiconductor industry because need to achieve higher computing speed low power consumption. In this article, we present an integrated approach using directed self-assembly (DSA) block copolymers (BCPs) form aligned line-space features through graphoepitaxy on germanium insulator (GeOI) substrates. Ge is example a high mobility material (III–V, II–VI) where chemical activity surface its composition...

The nanometer range structure produced by thin films of diblock copolymers makes them a great interest as templates for the microelectronics industry. We investigated effect annealing solvents and/or mixture in case symmetric Poly (styrene-<i>block</i>-4vinylpyridine) (PS-b-P4VP) copolymer to get desired line patterns. In this paper, we used different molecular weights PS-<i>b</i>-P4VP demonstrate scalability such high &chi; BCP system which requires precise fine-tuning interfacial energies...

Area-selective deposition could be an important self-aligning material-deposition technique to enable future nanoelectronics by accurately placing active materials at previously defined substrate patterns. We describe a robust strategy pattern uniform gold (Au) thin films on only the dielectric areas of prepatterned copper/silicon dioxide (Cu/SiO2) substrates. The use amine-terminated polystyrene polymer brush (i.e., PS-NH2) selectively block micrometer Cu regions patterned Cu/SiO2...

Area-selective deposition is a promising technique for positional self-alignment of materials at prepatterned surface. Critical to this the development molecular systems that have selective surface binding and can act as templates material growth. This paper reports how end functionalized polymers be used create oxide films through grafting method. Here, we detail facile approach rapid (in seconds) polymer brush with complete coverage over large areas high uniformity (pinhole free)....

In this work, we are reporting a very simple and efficient method to form lamellar structures of symmetric polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) copolymer thin films with vertically (to the surface plane) orientated lamellae using solvent annealing approach. The methodology does not require any brush chemistry engineer neutral it is block nature film-solvent vapour interface that defines orientation lamellae. microphase separated structure two different molecular weight forming...

Abstract Nanostructured block copolymer (BCP) thin films constitute an elegant tool to generate complex periodic patterns with periodicities ranging from a few nanometers hundreds of nanometers. Such well‐organized nanostructures are foreseen enable next‐generation nanofabrication research potent applications in the design functional materials biology, optics or microelectronics. This valuable platform is, however, limited by geometric features attainable diblock architectures considering...

The self-assembly of a lamellar-forming polystyrene-