A5101539144- Advanced Optical Imaging Technologies
- Optical measurement and interference techniques
- Digital Holography and Microscopy
- Astronomical Observations and Instrumentation
- Refrigeration and Air Conditioning Technologies
- Advanced Image Processing Techniques
- Virtual Reality Applications and Impacts
- 3D Surveying and Cultural Heritage
- Welding Techniques and Residual Stresses
- Photorefractive and Nonlinear Optics
- Teleoperation and Haptic Systems
- Agriculture, Soil, Plant Science
- Gamma-ray bursts and supernovae
- Optical Coherence Tomography Applications
- Energy and Environmental Systems
- Recycling and Waste Management Techniques
- Interactive and Immersive Displays
- Plasmonic and Surface Plasmon Research
- Dyeing and Modifying Textile Fibers
- Advanced Optical Sensing Technologies
- Optical Coatings and Gratings
- Visual perception and processing mechanisms
- Organic Light-Emitting Diodes Research
- Organic Electronics and Photovoltaics
- Heat transfer and supercritical fluids
Seoul National University
2021-2024
Korea Institute of Machinery and Materials
2020
Kyungpook National University
2019
Pusan National University
2018
Pharmbio Korea (South Korea)
2002
This study presents HoloSR, a novel deep learning-based super-resolution approach designed to produce high-resolution computer-generated holograms from low-resolution RGBD images, enabling the real-time production of realistic three-dimensional images. The HoloSR combines enhanced network with resize and convolution layers, facilitating direct generation without requiring additional interpolation. Various upscaling scales, extending up ×4, are evaluated assess performance our method....
A metasurface is a planar optical device that controls the phase, amplitude, and polarization of light through subwavelength-scale unit elements, called meta-atom. The tunability plasmonic vortex lens (PVL) which generates surface plasmon polaritons (SPPs) carrying orbital angular momentum can be improved by using However, conventional PVLs exhibit nonuniform field profiles according to incident states owing spin-orbital interaction (SOI) effect observed during SPP excitation. This paper...
We propose a compact tomographic near-eye display by combining micro-electro-mechanical systems (MEMS) scanning mirror device, focus tunable lens, and single light-emitting diode source. A holographic optical element was used to elaborately the light source into MEMS while providing further miniaturization. implemented drastically downsized multifocal system that expresses depth range of 4.8 D with eight focal planes synchronizing these modules. Furthermore, planar images are optimized...
Spiral interferometry is a technique that accurately measures changes in 3D structures or refractive indices by converting phase into spiral fringe patterns. The patterns consist of distributions, which are wrapped from 0 to 2π, requiring unwrapping techniques. Phase transforms discontinuous image 2π continuous image, can ultimately be reconstructed information. information affected the unwrapped with noise. Among methods, number-theoretical method used 1D structured light unique approach...
In the surface inspection, it is necessary to irradiate light from various angles improve visibility. this paper, we propose a method that uses structured quickly entire of objects be inspected at and optimize distortion caused by object's curvature.
The purpose of this study is investigating characteristics paper-ash mortar according to partial replacement fine aggregate by Paper-ash. For purpose, selected test variables were mixing ratio with two levels mortar(1:2, 1:3), and 3 types paper-ash(A, B, C), content four levels(5%,, 10%, 15%, 20%). As a result study, in all mixes Paper-ash generally Produced decreased compressive strength at ail age as compared ordinary mixes. rate 1:2 was the higher increasing than 1:3. flow value unit...
Several multifocal displays have been proposed to provide accurate accommodation cues. However, an undesirable feature, which is especially emphasized in near-eye configuration, that the field of views (FOVs) virtual planes change over depth. We demonstrate this FOV causes image distortions, reduces overall quality, and depth perception error due variation sizes according depths. Here, we introduce a light optimization technique compensate for magnification variations among focal planes. Our...
Photometric techniques are one of the three-dimensional image reconstruction technologies. It is used in various fields, especially surface analysis because it focuses on extracting information such as texture and color. perform 3D using light sources a camera. If object has specular reflection properties, then an error may occur reconstructed data according to noise intensity acquired images. For solution these problems, optical system configurated by dome coaxial light, non-uniformity area...
This study presents a novel approach to high-quality gaze-contingent hologram generation, reducing artifacts and achieving generation speed of 100 Hz for 2k holograms. The simulation results validate its effectiveness, highlighting potential practical holographic display applications.
In this paper, we propose a multi-depth hologram generation algorithm using rotating binary mask. Multi-depth holograms generated by naïve optimization algorithms show severe speckle noise. By jointly optimizing the mask pattern and SLM phase pattern, noise can be significantly reduced.
A proposed method that can be applied to light sources illuminating toward the center of sensor with limited divergence is estimating source position using a single line image from linear-type sensor.
This study proposes a method to synthesize computer-generated holograms by applying discrete cosine transform conventional U-Net architecture resulting in competitive reproduced image quality with reduced generation time.
Reticle cleaning is one of the most important processes in photomask making, because smallest particles on reticle are supposed to be printable wafer. Moreover, requirement for stricter, should zero-defect and there no killer factor it. It facing difficult challenges as it enters new era 100 nm pattern, introducing DUV lithography phase shift materials. As defect sizes decreasing controlled process, performance depends not only conventional chemical treatment megasonics but also a IPA drying...