Calcium carbonate crystal growth on a chitosan substrate was achieved using supersaturated calcium solution. Heterogeneous nucleation of the crystals significantly influenced by surface profile. Poly(acrylic acid) (MW = 2000, PAA2K) chosen to modify surfaces in aqueous The adsorption PAA2K occurred film surface. thicknesses adsorbed films were determined ellipsometry. X-ray photoelectron spectroscopy (XPS) used determine structure modified films. sizes and morphology observed under polarized...

ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTDegradation of nonalternating poly(ester amides)K. E. Gonsalves, X. Chen, and J. A. CameronCite this: Macromolecules 1992, 25, 12, 3309–3312Publication Date (Print):June 1, 1992Publication History Published online1 May 2002Published inissue 1 June 1992https://pubs.acs.org/doi/10.1021/ma00038a047https://doi.org/10.1021/ma00038a047research-articleACS PublicationsRequest reuse permissionsArticle Views550Altmetric-Citations93LEARN ABOUT THESE...

Engineering multifunctionality in hybrid polyoxometalates (hybrid POMs) is an interesting but scarcely explored topic. Herein, we set about engineering two important materials properties, viz., photochromism and self-separating catalysis, a POM by modulating the counterion motif. A series of six aromatic sulfonium counterions have been developed on basis motif that allows structural electronic fine-tuning changing substituents at multiple locations. Using sodium molybdate, new octamolybdate...

The present article reviews the recent advances in area of non-chemically amplified photoresists particularly for sub-30 nm nodes.

ADVERTISEMENT RETURN TO ISSUEPREVNoteNEXTA Study of the Mechanism Free-Radical Ring-Opening Polymerization 2-Methylene-1,3-dioxepaneS. Jin and K. E. GonsalvesView Author Information Department Chemistry & Polymer Program at Institute Materials Science, U-136, University Connecticut, Storrs, Connecticut 06269 Cite this: Macromolecules 1997, 30, 10, 3104–3106Publication Date (Web):May 19, 1997Publication History Received28 October 1996Revised5 March 1997Published online19 May inissue 1...

A series of functionalized poly(ε-caprolactone) copolymers, poly(ε-caprolactone-co-vinylphosphonic acid) and poly(ε-caprolactone-co-dimethyl vinylphosphonate), were synthesized by the free-radical copolymerization 2-methylene-1,3-dioxepane with two vinyl monomers, vinylphosphonic acid dimethyl vinylphosphonate. The copolymers have ester groups in backbone as well pendant functional groups. structure each copolymer was established 1H 13C NMR IR spectroscopy. Differential scanning calorimetry...

ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTFerrocene-containing polyamides and polyureasKenneth Gonsalves, Lin Zhan-Ru, Marvin D. RauschCite this: J. Am. Chem. Soc. 1984, 106, 13, 3862–3863Publication Date (Print):June 1, 1984Publication History Published online1 May 2002Published inissue 1 June 1984https://pubs.acs.org/doi/10.1021/ja00325a027https://doi.org/10.1021/ja00325a027research-articleACS PublicationsRequest reuse permissionsArticle Views825Altmetric-Citations72LEARN ABOUT THESE...

The goal of this investigation is to develop poly(DL-lactide-co-glycolide) (PLGA) nanoparticles for the delivery antibiotics such as nafcillin osteoblasts. This important in order treat Staphylococcus aureus-mediated osteomyelitis. latter often chronic and highly resistant antibiotics. Nafcillin (a penicillinase-resistant penicillin)-loaded were prepared by a single emulsion/solvent evaporation method. In vitro drug release studies conducted an incubator shaker at 37 degrees C phosphate...

Polymerization of (4-(methacryloyloxy)phenyl)dimethylsulfoniumtriflate (MAPDST), as a key monomer containing the radiation sensitive sulfonium functionality, with various other monomers such methyl methacrylate (MMA), 4-carboxy styrene (STYCOOH), N-vinyl carbazole (NVK) in different molar ratios via free-radical polymerization method is described. This methodology led to development small chemical library six polymers for lithography applications. Fourier transform infrared (FT-IR) and...

Hybrid metal-organic cluster resist materials, also termed as organo-inorganics, demonstrate their potential for use in next-generation lithography owing to ability patterning down ∼10 nm or below. High-resolution is integrally associated with the compatibility of and irradiation exposure source. Helium ion beam (HIBL) an emerging approach realization sub-10 patterns at considerably lower line edge/width roughness (LER/LWR) higher sensitivity compared electron (EBL). Here, first time, a...

Given the need for a next-generation technology node in area of integrated circuits (ICs), improvement properties resist materials, particularly sensitivity (ED), resolution, good etch resistance, and low line edge/width roughness (LER/LWR), has been highly desirable but also extremely challenging. Herein, we report series organic–inorganic hybrid nonchemically amplified copolymer resists (n-CARs) bearing radiation-sensitive sulfonium functionality as well tin metal an organometallic unit...

Given the current need for resist materials patterning transistors with ultralow nodes, there has been a quest developing resists improved performance nanoscale good contrast. The present work demonstrates polymeric (MAPDST-TIPMA) developed through integration of radiation-sensitive monomer (MAPDST) an organoiodine functionality (TIPMA) sub-16 nm using electron-beam and helium ion beam lithography. structural integrity was established by several spectroscopic techniques particularly NMR,...

The oxidative dehydrogenation of phenol compounds, as well polymer formation from these monomers, was studied by UV−vis and Mössbauer spectroscopy using a novel biological catalyst hematin. mechanism the polymerization reaction also followed in various pH environments. Phenol radicals were formed two-step electron transfer catalyzed hematin presence peroxide, noncatalytic reaction. This partially explains analogous catalytic activity horseradish peroxidase.

Abstract Two new polyoxometalate (POM)‐based hybrid monomers (Bu 4 N) 5 (H)[P 2 V 3 W 15 O 59 {(OCH ) CNHCO(CH )CCH }] ( and (S(CH C 6 H OCOC(CH )=CH [PV Mo 10 40 ] were developed by grafting polymerizable organic units covalently or electrostatically onto Wells–Dawson Keggin‐type clusters characterized analytical spectroscopic techniques including ESI‐MS and/or single‐crystal X‐ray diffraction analyses. Radical initiated polymerization of with (methacryloyloxy)phenyldimethylsulfonium...

A new HfO₂-based hybrid n-CAR resist material has been developed for EUVL applications and its nano-mechanical properties have reported.

The present report demonstrates the potential of a polyarylenesulfonium polymer, poly[methyl(4-(phenylthio)-phenyl)sulfoniumtrifluoromethanesulfonate] (PAS), as versatile nonchemically amplified negative tone photoresist for next-generation lithography (NGL) applications starting from i-line (λ ∼ 365 nm) to extreme ultraviolet (EUV, λ 13.5 lithography. PAS exhibited considerable contrast (γ), 0.08, toward EUV and patterned 20 nm features successfully.

Abstract The crystal growth of calcium carbonate on a chitosan substrate was achieved using supersaturated solution, at different concentrations polyacrylic acid (PAA) as an additive. Several techniques have been employed to characterize the systems. pH solution one indices used monitor crystallization. In absence acid, changed from 6.00 8.50 during crystallization; meanwhile, sporadic nucleation and crystallization observed via optical microscopy. By introducing systems, positively charged...

We report in this paper a generic method to modify the surfaces of common polymeric biomaterials that enables spatially resolved attachment and growth mammalian cells biologically relevant milieu. demonstrate an amphiphilic comb polymer presenting short oligoethylene glycol side chains can be coated onto number different biomaterials, namely polystyrene, poly(methyl methacrylate), poly(ethylene terephthalate) from methanol/water mixture. The film is stable water presents reactive COOH groups...

A series of new anionic PAGs, as well PAG-bound polymers designed for use in 193 nm photoresist materials, have been synthesized and characterized. These novel materials provide optical transparency at also good etch resistance. PAG incorporated resists blended were exposed a wavelength using an ASML 5500/950B lithography system with 0.63 NA. Exposed wafers evaluated SEM. The fluorine substituted bound polymer blend resist provided 110 (220 pitch) line/space 11.5, 13.0 mJ cm−2, 80 isolated...