Environmental pollution poses a pressing global challenge, demanding innovative solutions for effective pollutant removal. Photocatalysts, particularly titanium dioxide (TiO2), are renowned their catalytic prowess; however, they often require ultraviolet light activation. Researchers had turned to doping with metals and non-metals extend utility into the visible spectrum. While this approach shows promise, it also presents challenges such as material stability dopant leaching. Co-doping,...

Abstract Resistive random‐access memories (ReRAM) are promising candidates for next‐generation non‐volatile memory, logic components, and bioinspired neuromorphic computing applications. The analog resistive switching (RS) tuning with a sizable memory window is crucial realizing multi‐level storage devices. This work demonstrates the capability of fabricated Ag/NiO/W ReRAM architecture, controlled through voltage modulations. structures exhibit stable bipolar RS, non‐overlapping resistance,...

ABSTRACT This research paper focuses on the development and validation of a rating curve for River Ganga at Varanasi. Traditional methods measuring gauges calculating discharge face challenges during floods, necessitating innovative approaches. study employs acoustic Doppler current profilers (ADCP) remote measurement techniques, addressing limitations conventional methods. The methodology involves two-step procedure: establishing stage–discharge relationship stage determination. results...

Hybrid metal-organic cluster resist materials, also termed as organo-inorganics, demonstrate their potential for use in next-generation lithography owing to ability patterning down ∼10 nm or below. High-resolution is integrally associated with the compatibility of and irradiation exposure source. Helium ion beam (HIBL) an emerging approach realization sub-10 patterns at considerably lower line edge/width roughness (LER/LWR) higher sensitivity compared electron (EBL). Here, first time, a...

Given the current need for resist materials patterning transistors with ultralow nodes, there has been a quest developing resists improved performance nanoscale good contrast. The present work demonstrates polymeric (MAPDST-TIPMA) developed through integration of radiation-sensitive monomer (MAPDST) an organoiodine functionality (TIPMA) sub-16 nm using electron-beam and helium ion beam lithography. structural integrity was established by several spectroscopic techniques particularly NMR,...

3-D Hybrid halide perovskites (HHPs) have garnered significant interest as a promising contender for next-generation resistive random access memory (ReRAM) technology. However, challenges such variations in cycle-to-cycle switching iterations, operating voltages, and restrained reproducibility arise due to the disproportionate presence of grain size (GS) boundaries (GBs), which are impediments widespread adoption perovskite-based devices commercial applications. Since GBs present thin film...

Since the fabrication of micro-/nanoelectronic devices are marching toward ultralow node technology with dense patterns to meet current industry demands, continuous advancement is needed in terms material design and lithographic techniques. In this perspective, helium ion beam lithography (HIBL) has gained tremendous attention scientific society realize high-performance device advanced technology. Salient features including sub-nanometer spot size, high-intensity lighter (with respect...

Given the need for advanced resist materials in view of fast shrinkage semiconductor node scaling, this work demonstrates lithography application an organotin-based cyclotrimeric species (Sn–CT) as a molecular sub-10 nm patterning using electron beam (EBL) and helium ion (HIBL) techniques. While has been successfully used ∼15 line/space features ∼9 discrete line at dose 2.5 mC/cm2 EBL, were printed on silicon 16 μC/cm2 HIBL. Moreover, Sn–CT also complex single nanometer regime such...

Inorganic resists have emerged as promising candidates in semiconductor industries to realize sub-10 nm node technology. However, controlling vertical shrinkage of resist films during the pattern development process, particularly for ultralow thin film applications, is among highly pressing limitations inorganic along with roughness and poor shelf-life characteristics. Tin-based clusters small molecules been recently introduced materials. They possess a high absorption coefficient fast...

Real Time object tracking based on template matching is one of the key technologies in image processing. This paper describes a fast algorithm Normalized Cross Correlation (NCC) for real time video sequence. It proposes an upper bound criteria, which states that calculated optimum correlation score at current position lower than maximum obtained previous position. condition accelerates process. At same time, sufficient termination adaptive threshold function also applied. has been proved...

The increase in the demand of sub-10 nm feature size semiconductor industries necessitates a new kind resist material development which can absorb large fraction irradiation and retains small cluster distribution (1-2 nm). In this context, we developed novel nickel-based organo-metallic comprising high optical density inorganic nickel as metal building units (MBU), 3,3-Dimethylacrylic acid an organic ligand to form Ni-DMA clusters. synthesised clusters have ~1 with narrow distribution....

Dynamics of river behavior plays a great role in meandering, sediment transporting, scouring, etc. at bend, which solely depends on hydraulics properties such as horizontal and vertical stress, spatial temporal variation discharge. Therefore understanding discharge distribution Ganga is essential to apprehend the cross section bend particularly. The measurement not very simple there no instrument that can measure directly, but velocity be made. Velocity different sections time also easy with...

While inorganic resists are emerging as possible potential candidates for sub-10 nm node semiconductor fabrication, fundamental understanding on such promising chemical compositions is inevitably paramount to confront the concerning challenges associated with resists. Given that assisted nanopatterning of may significantly improve patterning capability along addressing vertical shrinkage issue resist film during processing and a greater extent, we present an interesting aspect matrix...

For Infrared Search and Track (IRST) systems used in military applications, presence of small target a large background is quite common. To detect track those objects clutter noise very difficult especially when full field view processing employed. Sophisticated computer vision techniques perform well but with an expense heavy computational cost. In this paper, we have tried to solve these problems two ways. First, hardware software co-design method employing FPGA accelerate the search...

Groundwater is an important source of water worldwide due to its wide availability and generally good quality.Earlier groundwater was easily accessible meet various domestic demands, but recently, it vulnerable depletion in many areas over exploitation mismanagement resources.This study used the Artificial Neural Network (ANN) model forecast (GW) level near Varanasi.ANN a way develop prediction based on human brain's functions.This research provides flawless using LM (Levenberg-Marquardt)...

BackgroundAn incredible increase in the integration of electronic chips has pushed semicon industries to endorse high numerical aperture (h-NA ∼ 0.5), extreme-ultraviolet (EUV) lithography (EUVL) (λ 13.5 nm) at commercial scale. Induction h-NA postulates EUV resists that could outperform resolution, line pattern roughness, and sensitivity (RLS) trade-off for chip fabricators, which is currently extremely limited.AimThe development resist balance RLS as well overcome throughput limitations...