Chidozie Onwudinanti

ORCID: 0000-0002-6570-7897
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About
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Research Areas
  • Chalcogenide Semiconductor Thin Films
  • Hydrogen Storage and Materials
  • Advanced Chemical Physics Studies
  • Perovskite Materials and Applications
  • Quantum, superfluid, helium dynamics
  • Thin-Film Transistor Technologies
  • Solid-state spectroscopy and crystallography
  • Ammonia Synthesis and Nitrogen Reduction
  • Solar Thermal and Photovoltaic Systems
  • Photovoltaic System Optimization Techniques
  • Plasma Diagnostics and Applications
  • Fusion materials and technologies
  • Corrosion Behavior and Inhibition
  • Metal and Thin Film Mechanics
  • Molten salt chemistry and electrochemical processes
  • Solar Radiation and Photovoltaics
  • Conducting polymers and applications
  • Semiconductor materials and devices
  • Quantum Dots Synthesis And Properties
  • Ion-surface interactions and analysis
  • solar cell performance optimization
  • Nuclear Materials and Properties

Dutch Institute for Fundamental Energy Research
2018-2022

Eindhoven University of Technology
2020-2022

Delft University of Technology
2015-2016

Because of its thermal stability, lead-free composition, and nearly ideal optical electronic properties, the orthorhombic CsSnI3 perovskite is considered promising as a light absorber for all-inorganic solar cells. However, susceptibility this three-dimensional toward oxidation in air has limited development cells based on material. Here, we report findings computational study which identifies Rb y Cs1-y Sn(Br x I1-x )3 perovskites cell applications, prepared by substituting cations (Rb Cs)...

10.1021/acs.jpcc.8b04013 article EN cc-by-nc-nd The Journal of Physical Chemistry C 2018-07-17

We have used 3-D optical modelling to investigate light management concepts based on periodic textures and material optimization for photovoltaic devices Cu(In,Ga)Se2 (CIGS) absorber material. At first, calibration of the software characterization a reference (1500-nm thick) CIGS device was carried out. The effects 1-D 2-D symmetric gratings cell were then investigated, showing significant improvement in anti-reflection effect absorptance active layer, achieved by excitation guided modes...

10.1364/oe.24.00a693 article EN cc-by Optics Express 2016-03-17

Hydrogen interaction with ruthenium is of particular importance for the ruthenium-capped multilayer reflectors used in extreme ultraviolet (EUV) lithography. causes blistering, which leads to a loss reflectivity. This problem aggravated by tin. study aims uncover mechanism via tin affects hydrogen uptake, view mitigation. We report here results surface presence using Density Functional Theory and charge density analyses. Our calculations show significant drop energy barrier penetration when...

10.3390/nano9010129 article EN cc-by Nanomaterials 2019-01-21

Hydrogen permeation into mirrors used in extreme ultraviolet lithography results the formation of blisters, which are detrimental to reflectivity. An understanding mechanism via hydrogen ends up at interface between top ruthenium layer and underlying bilayers is necessary mitigate blistering damage. In this study, we use density functional theory examine ways hydrogen, having entered near-surface interstitial voids, can migrate further metal or its surface. We show that with tin adsorbed on...

10.1039/d0cp00448k article EN cc-by-nc Physical Chemistry Chemical Physics 2020-01-01

Ruthenium (Ru) thin films are used as protective caps for the multilayer mirrors in extreme ultraviolet lithography machines. When these exposed to atomic hydrogen (H), it can permeate through Ru, leading formation of hydrogen-filled blisters on mirrors. H has been shown exhibit low solubility bulk but nature diffusion Ru and its contribution mechanisms blistering remain unknown. This work makes use reactive molecular dynamics simulations study influence imperfections a film behavior H. For...

10.1021/acs.jpcc.1c08776 article EN cc-by The Journal of Physical Chemistry C 2022-03-23

An atomistic description of tin deposition on ruthenium and its effect blistering damage is great interest in extreme ultraviolet (EUV) lithography. In EUV machines, debris from the EUV-emitting plasma may be deposited mirrors optical path. Tin facilitates formation hydrogen-filled blisters under top layer multi-layer mirrors. We have used Density Functional Theory (DFT) to show that a clean surface exhibits film-plus-islands (Stranski-Krastanov) growth mode, with first atomic bonding...

10.1039/d1cp01082d article EN cc-by-nc Physical Chemistry Chemical Physics 2021-01-01

Currently PV modules are positioned to receive the highest amount of incident radiation in a year. Therefore, generation pattern is independent consumption and large storage required compensate for same. This paper studies possibility orienting differently order match more efficiently.

10.1109/ptc.2015.7232610 article EN 2015-06-01

Performance of thin CIGS solar cells on periodic gratings was investigated. Optical simulations delivered the optimal grating dimensions and demonstrated benefits having a MoO3 buffer layer to quench optical losses in molybdenum.

10.1364/pv.2015.ptu4b.5 article EN 2015-01-01

2.25Cr1Mo0.25V is a state-of the-art alloy used in the fabrication of modern hydrogenation reactors.

10.1039/d0cp04833j article EN Physical Chemistry Chemical Physics 2021-01-01

Ruthenium thin films can serve as protective caps for multi-layer extreme ultraviolet mirrors exposed to atomic hydrogen. Hydrogen permeation through ruthenium is problematic it leads blisters on the mirrors. H has been shown exhibit low solubility in bulk Ru, and rapidly diffuses out of Ru. Therefore, underlying mechanisms blistering effect remains unknown. This work makes use reactive molecular dynamics simulations study influence imperfections a Ru film behaviour H. For Ru/H system,...

10.48550/arxiv.2110.00440 preprint EN cc-by-nc-sa arXiv (Cornell University) 2021-01-01
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