Silicon Nitride is largely used as the base material to manufacture cutting tools. Due its low thermal expansion coefficient it ideal candidate for CVD diamond deposition. In this work, we functionalized surface of silicon nitride inserts (Si 3 N 4 ) with a polymer (PDDA Poly (diallyldimethylamonium chloride - Mw 40000)) promote seeding nanodiamond particles. The was performed in water slurry containing nm particles dispersed by PSS (sodium4-styrenesulfonate) polymer. films, high nucleation...

This paper shows successful hindering of the negative effects cobalt binder in process coating WC-Co cutting tools with CVD diamond films. The strategy was creating a boron-rich layer on surface substrates as an interlayer to block Co migration. traditional boriding technique improved by preheating salt powders and controlling brittle region thickness substrate surface. These procedures produce tougher for growth. Adding CF4 gas mixture also enhanced adhesion films evaluated indentation...

This article reports on the study of high-quality boron-doped diamond films using admittance techniques. We have found two well-defined energy states at 74 and 340 meV, indicating that doping procedure has induced defects consequently provoked localization carriers. is a direct indication there are different coexisting conduction mechanisms for transport Additionally, we perform complementary resistivity experiments showing presence variable range hopping as dominant mechanism.

A systematic study of the infrared photoluminescence from deep centres in polycrystalline CdSe layers is presented. The authors observe two emission bands at about 0.92 mu m and 1.22 m. evolution band shape intensity quenching with temperature analysed using a semiclassical model, characteristic parameters are obtained. results shown to be consistent transitions involving selenium vacancies VSe oxygen impurities OSe.

Surfaces with very poor mechanical and frictional properties can be improved, or even, acquire new similar to diamond if good adherent CVD film is obtained on it. In this work, nitrogen ions were sub-implanted pure molybdenum as a means enhance adherence. Deposition time from 2 up 60 h used for deposition of 10 400 µm thick films adherence substrate. Characterizations carried out by XPS, X-ray diffraction nano indentation prepared surfaces prior growth after the onset nucleation. The ionic...

The technological advances available have always helped to increase the performance and complexity of manufacturing processes, seeking meet growing demands an increasingly globalized market. In this sense, conventional printed circuit board (PCB) assembly systems generally a coupled linear work structure. This structure is characterized by low flexibility scalability, which directly impact final value product. Faced with challenge, article presents new methodological perspective, propose...

Buscou-se a redução da tensão intrínseca causada pelas impurezas que se agregam no processo de crescimento um filme diamante obtido por deposição química partir fase vapor (CVD, do inglês Chemical Vapor Deposition) em reator filamento quente (HFCVD), sobre substrato silício <100> 250 µm espessura uma superfície grande área (45 cm²), através imersão amostra, solução saturada H2SO4 e CrO3 e, seguida, 1:1 H2O2:NH4OH. Após esse procedimento, nova etapa era realizada. O CVD foi identificado...

Abstract Semiconducting CdSe films have been electrodeposited on a variety of substrates by means two techniques. The processes nucleation, coalescence and growth accompanied ex‐situ scanning electron microscopy, in‐situ optical reflectance. We analyze the mode for different film thicknesses we discuss applications in solar cells other devices.

O preparo dos substratos, para o crescimento de filmes diamante CVD, é fundamental importância por diversos fatores. Um novo método preparação substratos molibdênio, jateamento óxido alumínio, apresentado e comparado com os métodos tradicionais preparo. As amostras CVD obtidas foram analisadas espectroscopia espalhamento RAMAN microscopia eletrônica varredura (MEV). Obtiveram-se boa qualidade uniformidade processo proposto tratamento do substrato molibdênio permitiu maior taxa que tradicionais.

Nowadays, the diamond grown by chemical vapor deposition (CVD) is seen economically as one of most interesting materials, due to its vast application, mainly in short-term, resulting from diamond’s unique properties. Its applications reach many technological areas, standing out mechanics area possibilities use cutting tools, tribological layers automobiles and aeronautical engines, heat sinks, surfaces protection for aggressive environments abrasive special devices which also add biological...

Very accurate, durable and noiseless tools for many applications have been of great interest. Diamond-coated ultrasonic are excellent alternatives in this perspective, mainly cutting hard materials. However, the conventional technology diamond powder aggregation with nickel metallic binders could not withstand power. The grains easily peel off were enough while contact surfaces. This work presents studies concerning deposition CVD coatings on different forms substrates, very good adherence,...

Abstract Background The reactivity of blood with non‐endothelial surface is a challenge for long‐term Ventricular Assist Devices development, usually made pure titanium, which despite being inert, low density and high mechanical resistance it does not avoid the thrombogenic responses. Here we tested modification on titanium Laser Induced Periodic Surface Structures followed by Diamond Like Carbon (DLC) coating in different thicknesses to customize wettability profile changing energy...

e v a p o r t i n of CO gaseous atmosphere.