The main problems and the approach used by authors for roughness metrology of super-smooth surfaces designed diffraction-quality X-ray mirrors are discussed. limitations white light interferometry adequacy method atomic force microscopy surface measurements in a wide range spatial frequencies shown results studies effect etching argon xenon ions on fused quartz optical ceramics, Zerodur, ULE Sitall, given. Substrates with roughness, satisfying requirements optics intended working spectral...

A prospective move to 10.5 and 11.2 nm wavelengths, as an alternative 6.7 13.5 nm, for next generation nanolithography is discussed. Ten-mirror optical systems based on Ru/Be, Mo/Be, Rh/Sr, Mo/Si, La/B multilayers were compared efficiency at their working wavelengths. It shown that a transition may be solution the problem of increasing performance resolution projection system.

Results on optimization and manufacturing of La/B4C multilayers are reported. Such mirrors promising optical elements for the development next generation nano-lithography at an operation wavelength 6.7 nm. A near-normal incidence reflectivity up to 58.6% has been measured BESSY-II soft x-ray reflectometer beamline. This is highest so far this wavelength. The potential further increase discussed.

We have studied the surface treatment of polished fused silica by neutralized Ar ions with energy 500–1500 eV and incidence angles 0–90°. found following regularities: for samples that passed standard procedure deep polishing (initial effective roughness σeff∼0.5 nm), decreases to ultrasmooth level (i.e., σeff∼0.25 nm in range spatial frequencies q∈[4.9×10−2−63] μm−1). The effect begins be noticeable at material removal 150 reaches saturation depths greater than 1 μm. For supersmooth...

We provide an analysis of contemporary multilayer optics for extreme ultraviolet (EUV) solar astronomy in the wavelength ranges: λ=12.9-13.3 nm, λ=17-21 λ=28-33 and λ=58.4 nm. found new material pairs, which will make spaceborne experiments possible due to high reflection efficiencies, spectral resolution, long-term stabilities proposed coatings. In range λ=13 Mo/Be mirrors were shown demonstrate a better ratio efficiency resolution compared with commonly used Mo/Si. structure Al/Si was...

The effect of Be layers on the reflection coefficients Mo/Be/Si multilayer mirrors in extreme ultraviolet (EUV) region is reported. Samples were studied using laboratory and synchrotron based reflectometry, high-resolution transmission electron microscopy. samples under study have above 71% at 13.5 nm more than 72% 12.9 a near normal incidence mode. Calculations show that by optimizing thickness layer it should be possible to increase coefficient another 0.5-1%. These results are...

A description of a stand based on atomic force microscopy (AFM) for roughness measurements large optical components with arbitrary surfaces is given. The sample under study mounted uniaxial goniometer which allows the to be tilted in range ±30°. inclination enables local normal along axis probe established at any point surface study. comparison results measurement noise and flat quartz sample, spatial frequencies 0.025–70 μm−1, obtained from “standard” AFM developed versions Within...

An extended model for the reconstruction of multilayer nanostructures from reflectometry data in X-ray and extreme ultraviolet ranges is proposed. In contrast to standard approach, where transitional region defined advance as a specific function, transition layer sought linear combination several functions at once model. This allows one describe much wider class structures with different dominant physical mechanisms formation regions. The occupies an intermediate position between classical...

Abstract The article provides a review of the current state affairs in field physics and technology multilayer beryllium-containing mirrors intended for projection lithography solar corona studies extreme ultraviolet (EUV) region. methods synthesizing studying are described. results recent on internal structure EUV reflection coefficients given Mo/Be, Mo/Si, Be/Al, Be/Mg mirrors. effect Si Be interlayers reflectivity is explained. Avenues further research discussed.

Periodic magnetic nanodot arrays have been produced on an area as large 1 cm×1 cm by direct nanolithography using interferometric laser radiation. The dots are formed the local annealing of sputtered amorphous Co–C films in regions where intensity is highest. At room temperature exhibit ferromagnetic order and embedded a paramagnetic matrix. onset room-temperature ferromagnetism caused nanoscale chemical morphological changes during dot formation reflects phase separation Co-rich clusters....

Optical methods that provide high diffraction image quality with a spatial resolution of several to tens nanometers and are in demand such areas as projection lithography, X-ray microscopy, astrophysics, fundamental research on the interaction matter (vacuum) ultrahigh (– W cm) electromagnetic fields reviewed terms fabrication testing technologies possible use – nm wavelength range. The current worldwide status recent achievements by Institute for Physics Microstructures Russian Academy...

A comparative study was carried out of the structure and reflection performance four types multilayer mirror for extreme ultraviolet lithography at 11.2 nm; these were a pure Mo/Be three Mo/Be-based structures with thin B4C, C Si interlayers. It demonstrated that mirrors show maximum reflectance normal incidence, while structural perfection is shown by Mo/Be/Si mirrors. The introduction B4C layers into increases interlayer roughness reduces sharpness interfaces, adversely affecting target...

Problems in the application of a null lens for surface shape measurements aspherical mirrors are discussed using example manufacturing an concave mirror beyond extreme ultraviolet nanolithographer. A method allowing measurement sample under study and aberration simultaneously, evaluating accuracy, is described. Using this method, we made with aspheric 6th order (i.e., maximum deviation from best-fit sphere 6.6 μm) parameters deviations designed PV=5.3 nm RMS=0.8 nm. An approximation was...

The behavior of sputtering yield and the surface roughness monocrystalline silicon orientations ⟨100⟩, ⟨110⟩, ⟨111⟩ under ion-beam bombardment by neutralized Ar ions with energies 200-1000 eV is studied. significant dependence (modulation) on incidence angle due to crystalline structure observed. It shown that a sharp increase in decrease effective at above 400 occurs. At more than for normal ion incidence, smoothing range spatial frequencies ν∈[4.9⋅10-2-6.3⋅101µm-1] up value 0.17 nm This...

We report the observation of nuclear resonant diffraction synchrotron radiation by a synthetic multilayer. The period ${[}^{57}$Fe(22 \AA{})/Sc(11 \AA{})/Fe(22 \AA{})\ifmmode\times\else\texttimes\fi{}25 multilayer was chosen to be twice electronic obtain pure Bragg reflection. Strong enhancement radiative scattering channel provided fast time response for $^{57}\mathrm{Fe}$ at peak, with decay 4 ns. will useful as narrow bandpass monochromator radiation.

Free-standing multilayer films consisting of Si, Zr, Mo and silicides both metals have been fabricated studied as spectral purity filters (SPF) for extreme ultraviolet (EUV) (13.5 nm) lithography tools. Comparative tests SPF structures various compositions performed at high power loads. It was found that a Mo/ZrSi2 structure with MoSi2 capping layers is featured capability to withstand prolonged heating in vacuum (10−7 mbar) 900-950°C. A technique fabrication large aperture free-standing...

Al, with a passband in the wavelength range of 17-60 nm, and Zr, 6.5-17 thin films on support grid or membrane are frequently used as UV, visible, near-IR blocking filters solar observatories. Although they possess acceptable optical performance, these also have some shortcomings such low mechanical strength resistance to oxidation. These hinder meeting requirements for future telescopes. We propose multilayer film basis other materials improved characteristics. It was demonstrated that...

We have systematically investigated ultrathin Cr/Sc multilayers (nanolayers), using tunable soft-x-ray synchrotron radiation. The were optimized for use either in normal incidence or at 45 degrees photon energies around the 2p-absorption edges of Sc (399 eV) and Cr (574 eV), respectively. They sputter deposited on Si wafers thin Si(3)N(4)-membrane support structures reflection transmission, respectively, as polarizing phase-retarding elements a polarimeter. performance theoretically expected...

Abstract We present research investigations in the field of multilayer optics X-ray and extreme ultra-violet ranges (XUV), aimed at development optical elements for applications experiments physics scientific instrumentation. discuss normal incidence spectral region “water window”, collimation focusing hard X-ray, dispersing spectroscopy high-temperature plasma, analysis low Z-elements. Our pays special attention to optimization projection EUV-lithography (ψ-13nm) short period optics.

A new type of a reference spherical wave source (SWS) based on single mode optical fiber with narrowed down up to the submicrometer size exit aperture is proposed. It intended for precision point diffraction interferometers as wave. Systematic experimental errors which influence measurement accuracy quality fronts generated by SWSs are considered. Experimental data front deformations given. The combined root-mean-square (rms) deformation couple measured in numerical NA=0.27 reaches value...