A5041034044- Advanced X-ray Imaging Techniques
- Advanced Surface Polishing Techniques
- Ion-surface interactions and analysis
- Laser-induced spectroscopy and plasma
- Laser Design and Applications
- Advancements in Photolithography Techniques
- X-ray Spectroscopy and Fluorescence Analysis
- Electron and X-Ray Spectroscopy Techniques
- Surface Roughness and Optical Measurements
- Optical Coatings and Gratings
- Semiconductor materials and interfaces
- Metal and Thin Film Mechanics
- Atomic and Molecular Physics
- Calibration and Measurement Techniques
- Optical measurement and interference techniques
- Advanced Measurement and Metrology Techniques
- Diamond and Carbon-based Materials Research
- Advanced Electron Microscopy Techniques and Applications
- Machine Learning in Healthcare
- Intermetallics and Advanced Alloy Properties
- Optical Systems and Laser Technology
- Crystallography and Radiation Phenomena
- Laser Material Processing Techniques
- Advanced X-ray and CT Imaging
- Integrated Circuits and Semiconductor Failure Analysis
Institute for Physics of Microstructures
2016-2025
Russian Academy of Sciences
2001-2020
Novosibirsk State University
2020
N. I. Lobachevsky State University of Nizhny Novgorod
2020
Institute of Semiconductor Physics
2020
Institute of Applied Physics
2016
A prospective move to 10.5 and 11.2 nm wavelengths, as an alternative 6.7 13.5 nm, for next generation nanolithography is discussed. Ten-mirror optical systems based on Ru/Be, Mo/Be, Rh/Sr, Mo/Si, La/B multilayers were compared efficiency at their working wavelengths. It shown that a transition may be solution the problem of increasing performance resolution projection system.
Results on optimization and manufacturing of La/B4C multilayers are reported. Such mirrors promising optical elements for the development next generation nano-lithography at an operation wavelength 6.7 nm. A near-normal incidence reflectivity up to 58.6% has been measured BESSY-II soft x-ray reflectometer beamline. This is highest so far this wavelength. The potential further increase discussed.
We have studied the surface treatment of polished fused silica by neutralized Ar ions with energy 500–1500 eV and incidence angles 0–90°. found following regularities: for samples that passed standard procedure deep polishing (initial effective roughness σeff∼0.5 nm), decreases to ultrasmooth level (i.e., σeff∼0.25 nm in range spatial frequencies q∈[4.9×10−2−63] μm−1). The effect begins be noticeable at material removal 150 reaches saturation depths greater than 1 μm. For supersmooth...
We provide an analysis of contemporary multilayer optics for extreme ultraviolet (EUV) solar astronomy in the wavelength ranges: λ=12.9-13.3 nm, λ=17-21 λ=28-33 and λ=58.4 nm. found new material pairs, which will make spaceborne experiments possible due to high reflection efficiencies, spectral resolution, long-term stabilities proposed coatings. In range λ=13 Mo/Be mirrors were shown demonstrate a better ratio efficiency resolution compared with commonly used Mo/Si. structure Al/Si was...
A description of a stand based on atomic force microscopy (AFM) for roughness measurements large optical components with arbitrary surfaces is given. The sample under study mounted uniaxial goniometer which allows the to be tilted in range ±30°. inclination enables local normal along axis probe established at any point surface study. comparison results measurement noise and flat quartz sample, spatial frequencies 0.025–70 μm−1, obtained from “standard” AFM developed versions Within...
An extended model for the reconstruction of multilayer nanostructures from reflectometry data in X-ray and extreme ultraviolet ranges is proposed. In contrast to standard approach, where transitional region defined advance as a specific function, transition layer sought linear combination several functions at once model. This allows one describe much wider class structures with different dominant physical mechanisms formation regions. The occupies an intermediate position between classical...
A comparative study was carried out of the structure and reflection performance four types multilayer mirror for extreme ultraviolet lithography at 11.2 nm; these were a pure Mo/Be three Mo/Be-based structures with thin B4C, C Si interlayers. It demonstrated that mirrors show maximum reflectance normal incidence, while structural perfection is shown by Mo/Be/Si mirrors. The introduction B4C layers into increases interlayer roughness reduces sharpness interfaces, adversely affecting target...
Problems in the application of a null lens for surface shape measurements aspherical mirrors are discussed using example manufacturing an concave mirror beyond extreme ultraviolet nanolithographer. A method allowing measurement sample under study and aberration simultaneously, evaluating accuracy, is described. Using this method, we made with aspheric 6th order (i.e., maximum deviation from best-fit sphere 6.6 μm) parameters deviations designed PV=5.3 nm RMS=0.8 nm. An approximation was...
Free-standing multilayer films consisting of Si, Zr, Mo and silicides both metals have been fabricated studied as spectral purity filters (SPF) for extreme ultraviolet (EUV) (13.5 nm) lithography tools. Comparative tests SPF structures various compositions performed at high power loads. It was found that a Mo/ZrSi2 structure with MoSi2 capping layers is featured capability to withstand prolonged heating in vacuum (10−7 mbar) 900-950°C. A technique fabrication large aperture free-standing...
We present an approach adapted to study the interface (composition and extension) of X-ray multilayer mirrors using angle resolved photoelectron spectroscopy (ARXPS). In we rely on concept average effective attenuation length (EAL) not inelastic mean free path (IMPF), which allows us take into account contribution elastically scattered electrons increase accuracy determined thickness layers. apply developed formation interfaces in a periodic Mo/Si mirror. The chemical composition...
The results of a study the structural and reflective characteristics short-period multilayer X-ray mirrors based on Mo/B 4 C at wavelengths 1.54 Å, 9.89 Å 17.59 are presented. period samples varied in range 8–35 Å. average widths interfaces were ∼3.5 2.2 one other boundaries, with tendency for weak growth any decrease period. interlayer roughness was ∼1 research indicate promising prospects use synchrotron applications.
We optimized the parameters of a laser-produced plasma source based on solid-state Nd: YAG laser (λ = 1.06 nm, pulse duration 4 ns, energy per up to 500 mJ, repetition rate 10 Hz, lens focus distance 45 mm, maximum power density radiation in 9 × 1011 W/cm2) and double-stream Xe/He gas jet obtain intensity around 11 nm wavelength. It was shown that key factor determining ionization composition is density. With decreased density, shifts toward smaller degree ionization, which leads an increase...
Circular Zernike polynomials are often used for approximation and analysis of optical surfaces. In this paper, we analyse their lateral resolving capacity, illustrating the effects a lack by finite set answering following questions: What is minimum number that necessary to describe local deformation certain size? relationship between approximating spatial spectrum approximation? connection mean-square error polynomials? The main results work formulas calculating fitting relief width order...
A high-resolution laboratory reflectometer designed for operation in the soft x-ray (SXR) and extreme ultraviolet (EUV) ranges is described. High spectral resolution, up to 0.028 nm, a wide range achieved due Czerny-Turner monochromator. laser plasma generated by irradiating solid-state target with focused beam (wavelength 1.06 µm, pulse energy 0.5 J, duration 4 ns, repetition rate 10 Hz) used as source of SXR EUV radiation. The goniometer allows study curved optical elements an aperture NA...
We describe a laboratory reflectometer developed at the IPM RAS for precision measurements of spectral and angular dependences reflection transmission coefficients optical elements in wavelength range 5–50 nm. The radiation is monochromatised using high-resolution Czerny–Turner spectrometer with plane diffraction grating two spherical collimating mirrors. A toroidal mirror focuses probe monochromatic beam on sample. X-ray source highly ionised plasma produced interaction high-power laser...
The paper deals with the problems of deposition multilayer Mo/Si mirrors (MLMs), reflecting in extreme ultraviolet (EUV) spectral range, onto microelectromechanical system (MEMS). Such MEMS micromirrors can be used to control beams EUV and soft x-ray radiation, particular, as spatial modulators radiation flux (dynamic masks) for maskless lithography (EUVL). requirements surfaces such use EUVL are analyzed. Experimental results on roughness surface shapes commercially available a pixel size 8...