- Diamond and Carbon-based Materials Research
- Metal and Thin Film Mechanics
- Advanced materials and composites
- Semiconductor materials and devices
- High-Temperature Coating Behaviors
- Vacuum and Plasma Arcs
- Carbon Nanotubes in Composites
- Silicon Carbide Semiconductor Technologies
- Ion-surface interactions and analysis
- Tribology and Wear Analysis
- Advanced ceramic materials synthesis
- Force Microscopy Techniques and Applications
- Fusion materials and technologies
- Surface Roughness and Optical Measurements
- Electron and X-Ray Spectroscopy Techniques
- Optical Coatings and Gratings
- Molecular Junctions and Nanostructures
- Laser-induced spectroscopy and plasma
- Adhesion, Friction, and Surface Interactions
- Copper Interconnects and Reliability
- MXene and MAX Phase Materials
- Surface Modification and Superhydrophobicity
- Plasma Diagnostics and Applications
- Corrosion Behavior and Inhibition
- Metallurgical and Alloy Processes
Ovidius University
2015-2024
Constanta Maritime University
2010
This review summarizes the more-than-25-years of development so-called thermionic vacuum arc (TVA). TVA is an anodic discharge in vapors material to be deposited; energy for its melting delivered by means a focused electron beam. The resulting ions fall at substrate where they form well-adhesive layer; ion controllable. deposited layers are, as rule, free from droplets typical cathodic deposition systems and thermal stress substrates being coated low. especially suitable processing...
Tantalum pentoxide (Ta2O5) thin films were synthesized using thermionic vacuum arc (TVA) technology. TVA is an original deposition method a combination of anodic and electron gun system for the growth from solid precursors under 10−6 Torr. The properties deposited Ta2O5 investigated in terms wettability, refractive index, morphology, structure. surface free energy was determined by means evaluation indicating hydrophilic character index measured Filmetrics F20 device. morphology bright field...
A series of the multicomponent thin films (binary: Ti-C; Ti-Ag and ternary: Ti-C-Ag; Ti-C-Al) were fabricated by Thermionic Vacuum Arc (TVA) technology in order to study wear resistance anticorrosion properties. The effects Ti amount on microstructure, tribological morphological properties subsequently investigated. TVA is an original deposition method using a combination anodic arc electron gun systems for growth films. samples characterized scanning microscope (SEM) transmission (TEM)...
Binary elemental plasma of carbon and silver was synthesized using the thermionic vacuum arc technology for first time in this configuration. The structural investigations deposited silver/amorphous (Ag/a-C) nanocomposites thin film on different materials, such as Si, glass, stainless steel OLC 45 substrates performed by high-resolution transmission electron microscopy were reported, well modification properties at nanometer level.
Titanium-based composites—titanium and silver (TiAg) titanium carbon (TiC)—were synthesized by the Thermionic Vacuum Arc (TVA) method on substrates especially for gear wheels camshaft coating as mechanical components of irrigation pumps. The films were characterized surface morphology, microstructure, roughness through X-ray Diffraction (XRD), Atomic Force Microscopy (AFM), Scanning Electron (SEM), Transmission (TEM), Small-Angle Neutron Scattering (SANS). (Ag) crystallized into a cubic...
The current work aimed to characterize the morphology, chemical, and mechanical properties of Pt PtTi thin films deposited via thermionic vacuum arc (TVA) method on glass silicon substrates. were characterized by means a scanning electron microscope technique (SEM). quantitative elemental microanalysis was done using energy-dispersive X-ray spectroscopy (EDS). tribological studied ball-on-disc tribometer, measured nanoindentation tests. roughness, as well micro nanoscale features, atomic...
Crystalline Si-C thin films were prepared at substrate temperature between 200°C and 1000°C using Thermionic Vacuum Arc (TVA) method. To increase the acceleration potential drop a negative bias voltage up to -1000V was applied on substrate. The 200nm thickness carbon deposed glass Si then 200-500 nm layer deposed. Transmission Electron Microscopy (TEM), High Resolution (HRTEM), X-Ray Photoelectron Spectroscopy (XPS), electrical conductivity measurement technique characterized structure...
Laser-Induced Thermionic Vacuum Arc (LTVA) provides a better way to produce uniform metallic thin films than the classical (TVA) method. In Ti-doped chromium produced using LTVA, amorphous is superimposed with small bcc nanoparticles. These amorphous/crystalline structures crystallites induce lower roughness and electrical resistivity, reducing electron–phonon scattering increasing charge transport across LTVA films. A significant shift in resistivity for samples observed due electron on...
The aim of this paper is to an report analysis the different characteristics coatings obtained by extension in applicability thermionic vacuum arc method, i.e., gaseous using gases as precursors, instead solid materials. morphology and structure film were investigated transmission electron microscopy (TEM) provided high-resolution TEM with 1.4-Å resolution 1.2-M magnification.
Lucrarea de fata se refera la studiul filmelor subtiri carbon-metale (C-Me) depuse prin metoda Arcului Thermionic in vid (TVA) în configurația cu un tun eletronic, pe suport sticla si siliciu cristalin. Filmele au fost investigate pentru a determina structurile formate, scopul contura proprietatile gama aplicatii posibile. Morfologia suprafata udabilitatea analizate microscipia transmisie electroni (TEM), microscopia scanare (SEM) SEE SYSTEM. Rezultatele furnizate aratat modalitatea care Ag,...
Magnesium and magnesium thin alloy films were deposited using a thermionic vacuum arc (TVA), which has multiple applications in the field of metallic electrodes for diodes batteries or active corrosion protection. An improved laser-induced TVA (LTVA) method favors crystallization processes magnesium-based because interaction between laser plasma discharge changes thermal energy during photonic due to local temperature variation. Plasma diagnosis based on current measurements suggests an...
Ionized nitrogen doped Si-C thin films at 200°C substrate temperature were obtained by Thermionic Vacuum Arc (TVA) method. To increase the energy of N, C and Si ions, -400V, -600V -1000V negative bias voltages was applied on substrate. The 400nm, 600nm 1000nm N-SiC coatings glass deposed. characterize structure as-prepared coatings, Transmission Electron Microscopy (TEM), High Resolution (HRTEM), X-Ray Photoelectron Spectroscopy (XPS) techniques performed. Electrical conductivity measured...
Laser Induced-Thermionic Vacuum Arc (LTVA) technology was used for depositing uniform intermetallic CoNi thin films of 100 nm thickness. LTVA is an original deposition method using a combination the typical Thermionic (TVA) system and laser beam provided by QUANTEL Q-Smart 850 Nd:YAG compact Q-switched with second harmonic module. The novelty related to simultaneous bi-component metallic film photonic processes over plasma deposition, which improves roughness but also triggers composition...
Abstract Carbon thin films were synthesized using the original Thermionic Vacuum Arc (TVA) method. Mechanical properties investigated Micro Materials NanoTest 500 instrument a NT Berkovich indenter. XPS provides quantitative analysis of surface composition and X‐ray generated Auger electron spectroscopy (XAES) performed by Thermoelectron ESCALAB 250 revealed information about sp 3 :sp 2 ratio carbon bondings. Structure morphology was studied Transmission Electron Microscope CM120ST,...
Nanostructured carbon materials have increasingly attracted the interest of scientific community, because their fascinating physical properties and potential applications in high-tech devices. In current ITER design, tiles made fiber composites (CFCs) are foreseen for strike point zone tungsten (W) other parts divertor region. This choice is a compromise based mainly on experience with individual many different tokamaks. Also Carbon-Aluminum candidate material First Wall ITER. order to...
C-Ti multilayer nanostructures were deposed by Thermionic Vacuum Arc (TVA) technology. The layers consisting of about 100nm Carbon base layer and seven 40nm alternatively T i C on Silicon substrates. thickness such a structure was up to 500nm. On the other hand, in order obtain structures with variable different percentages layers, 20nm thick first Si substrate then i-C each these having deposed. To perform successively various changed discharge parameters for plasma sources desirable...