Denis Kurapov

ORCID: 0009-0004-8396-8937
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About
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Research Areas
  • Metal and Thin Film Mechanics
  • Diamond and Carbon-based Materials Research
  • Boron and Carbon Nanomaterials Research
  • Advanced materials and composites
  • Semiconductor materials and devices
  • MXene and MAX Phase Materials
  • Advanced Materials Characterization Techniques
  • Additive Manufacturing and 3D Printing Technologies
  • Adhesion, Friction, and Surface Interactions
  • ZnO doping and properties
  • Copper Interconnects and Reliability

Oerlikon (Liechtenstein)
2007-2023

RWTH Aachen University
2002-2007

PVD technologies, including vacuum arc evaporation and DC-magnetron sputtering, have been utilized in industrial settings since the early 1980s for depositing protective coatings. These coatings encompass a range of materials such as metal nitrides, carbonitrides, oxides, oxynitrides, DLC, serving diverse applications cutting forming tools, automotive components, decoration. Vacuum generates highly energized ionized particle flux toward substrate, while “classical” gas-ion-dominated direct...

10.1063/5.0159292 article EN cc-by Journal of Applied Physics 2023-10-23

Ti-Al-O-N coatings were synthesized by cathodic arc and high power pulsed magnetron sputtering. The chemical composition of the was determined means elastic recoil detection analysis energy dispersive X-ray spectroscopy. effect oxygen incorporation on stress-free lattice parameters Young's moduli investigated diffraction nanoindentation, respectively. As nitrogen is substituted oxygen, implications for charge balance may be expected. A reduction in equilibrium volume with increasing O...

10.1063/1.4894776 article EN Journal of Applied Physics 2014-09-05

Abstract It is well known that surface energy differences thermodynamically stabilize nanocrystalline γ-Al 2 O 3 over α-Al . Here, through correlative ab initio calculations and advanced material characterization at the nanometer scale, we demonstrate metastable phase formation of TiAlN, an industrial benchmark coating material, crystallite size-dependent. By relating calculated volume contributions to total energy, predict chemical composition-dependent boundary between two solid solution...

10.1038/s41598-017-16567-z article EN cc-by Scientific Reports 2017-11-17

The experimental set‐up and the results of high temperature compression tests for characterization tool materials steel thixoforming are presented. scope this test is to reproduce load profile processes consisting mechanical, thermal, tribological, chemical components on forming mould. Tool were chosen following a concept within Collaborative Research Center ‐ SFB 289 “Forming metals in semi‐solid state their properties”. Three groups distinguished: thin film deposited by physical vapor...

10.1002/srin.200405812 article EN steel research international 2004-08-01

Nitrides and oxides of chromium exhibit substantial differences in their crystallographic electronic structure. The present study shows some the possibilities for tuning properties oxynitride films by progressively increasing oxygen concentration. We observe that upon addition CrOxN1−x remain face centered cubic B1 structure CrN, up to contents x ≤ 0.70. At higher concentrations they gradually adopt sesquioxide crystallize corundum Cr2O3 gradual decrease stress-free lattice parameter with...

10.1063/1.3549115 article EN Journal of Applied Physics 2011-03-01

In this work thin Al 2 O 3 films were deposited on hot working steel AISI H11 by plasma assisted chemical vapour deposition (PACVD). The effect of the AlCl /O ratio in gas mixture and substrate temperature film hardness constitution was investigated nanoindentation X‐ray diffraction, respectively. Within process parameter window containing either γ‐Al or α‐Al phase grown. performance these coatings for semi‐solid processing studied with respect to hardness, adhesion resistance thermal shock....

10.1002/srin.200405813 article EN steel research international 2004-08-01

Alumina thin films were deposited onto tempered hot working steel substrates from an AlCl3–O2–Ar–H2 gas mixture by plasma-assisted chemical vapor deposition. The normalized ion flux was varied during deposition through changes in precursor content while keeping the cathode voltage and total pressure constant. As increased 0.8% to 5.8%, rate 12-fold, decreased approximately 90%. constitution, morphology, impurity incorporation, elastic properties of alumina found depend on flux. These...

10.1116/1.2748802 article EN Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2007-06-25
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