Rahul Singh Rawat

ORCID: 0009-0008-1678-8708
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About
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Research Areas
  • GaN-based semiconductor devices and materials
  • 2D Materials and Applications
  • ZnO doping and properties
  • Thermal Radiation and Cooling Technologies
  • Electronic and Structural Properties of Oxides
  • Semiconductor materials and devices
  • Quantum Dots Synthesis And Properties
  • Plasmonic and Surface Plasmon Research

Jawaharlal Nehru Centre for Advanced Scientific Research
2023-2024

Traditionally, the Coulomb repulsion or Peierls instability causes metal-insulator phase transitions in strongly correlated quantum materials. In comparison, magnetic stress is predicted to drive transition materials exhibiting strong spin-lattice coupling. However, this mechanism lacks experimental validation and an in-depth understanding. Here we demonstrate existence of stress-driven archetypal material, chromium nitride. Structural, magnetic, electronic transport characterization,...

10.1103/physrevlett.131.126302 article EN Physical Review Letters 2023-09-22

Van der Waals heteroepitaxy refers to the growth of strain- and misfit-dislocation-free epitaxial films on layered substrates or vice versa. Such heteroepitaxial technique can be utilized in developing flexible near-infrared transition metal nitride plasmonic materials broaden their photonic bioplasmonic applications, such as antifogging, smart windows, bioimaging. Here, we show first conclusive experimental demonstration van heteroepitaxy-enabled semiconducting scandium (ScN) thin...

10.1021/acs.nanolett.4c04616 article EN Nano Letters 2024-10-29

Abstract Metal/semiconductor superlattices represent a fascinating frontier in materials science and nanotechnology, where alternating layers of metals semiconductors are precisely engineered at the atomic nano‐scales. Traditionally, epitaxial metal/semiconductor superlattice growth requires constituent from same family, exhibiting identical structural symmetry low lattice mismatch. Here, beyond this conventional constraint, novel class lattice‐matched is introduced that utilizes refractory...

10.1002/adma.202413537 article EN Advanced Materials 2024-12-02
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