T. Witke

ORCID: 0009-0009-2888-7532
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Research Areas
  • Diamond and Carbon-based Materials Research
  • Metal and Thin Film Mechanics
  • Laser-induced spectroscopy and plasma
  • Vacuum and Plasma Arcs
  • High-Temperature Coating Behaviors
  • Advanced materials and composites
  • Advanced Sensor Technologies Research
  • Advanced ceramic materials synthesis
  • Plasma Diagnostics and Applications
  • Optical Imaging and Spectroscopy Techniques
  • Photoacoustic and Ultrasonic Imaging
  • Calibration and Measurement Techniques
  • Aluminum Alloys Composites Properties
  • Laser Material Processing Techniques
  • Atomic and Molecular Physics
  • Advanced Surface Polishing Techniques
  • Fiber-reinforced polymer composites
  • Lubricants and Their Additives
  • Ultrasound Imaging and Elastography
  • Ion-surface interactions and analysis
  • High-pressure geophysics and materials

Chemnitz University of Technology
2023

Fraunhofer Institute for Material and Beam Technology
1994-2002

Fraunhofer USA
1999

Fraunhofer Society
1999

10.1016/0257-8972(94)90179-1 article EN Surface and Coatings Technology 1994-12-01

Though vacuum arc cathode spot has been under investigation for more than a century, its structure and operation is still discussed controversially. Experimentally measured parameters descriptions of the visible structures given by different authors are far from fitting into an uniform picture. In present paper, wide range findings, parameter values, phenomenological will be explained as semblances complex structured object. The random behavior related parameters, mostly stated factor...

10.1109/27.640667 article EN IEEE Transactions on Plasma Science 1997-08-01

The main parameters and dimensions of cathode spots have been under discussion for years. To solve these current questions, a new system was specially designed. image converting high speed framing camera (HSFC) combines micrometer lateral resolution with nanosecond time very optical sensitivity. This used to study the microscopic behavior vacuum arc in pulsed discharge on copper. direct observation revealed that one single spot, as normally observed by means, consists number simultaneously...

10.1109/27.476476 article EN IEEE Transactions on Plasma Science 1995-12-01

A pulsed high current metal ion source that produces a metallic plasma flux was designed and successfully used for film deposition. The consists of the fully ionized beam produced by vacuum arc transported through curved magnetic duct. Deposition rates more than ten nm/s were achieved. deposited layers are free macroparticles, holes, pits. Films about 50 nm thickness have been homogeneously (thickness variation below 5%) on 4 in substrate after 300 pulses. Repetition adjustable from 100 Hz...

10.1109/27.782278 article EN IEEE Transactions on Plasma Science 1999-08-01

Short electrical discharges with high energy are a very promising tool for controlled ablation and deposition of materials. A source pulsed is the channel spark discharge. This channeled discharge can produce electron pulses about 15 keV 1 kA. Introducing pulse in target over small area penetration depth within short time (100 ns), density produced surface region leading to instantaneous rates. The energetic parameters comparable laser light PLD. Ablated material by distinguished its degree...

10.1109/27.640700 article EN IEEE Transactions on Plasma Science 1997-08-01

10.1016/s0169-4332(96)00775-1 article EN Applied Surface Science 1997-02-01

10.1016/s0257-8972(97)00197-7 article EN Surface and Coatings Technology 1997-12-01

10.1016/s0169-4332(96)00440-0 article EN Applied Surface Science 1996-10-01

Short electron pulses with high energy are a very promising tool for the controlled ablation and deposition of materials. The plasmas induced by beam irradiation distinguished their degree ionization excitation. A source pulsed beams is channel spark device. It delivers high-current self-focused (/spl sim/15 keV, 1 kA, 100 ns). For technology, plasma decisive element vapor (PVD) equipment. Hence, characteristics its dependence on primary principal importance. development has been...

10.1109/27.491691 article EN IEEE Transactions on Plasma Science 1996-02-01

Superharte amorphe Kohlenstoffschichten (ta-C), die mit gepulstem Hochstrombogen (High-Current Arc, HCA) abgeschieden werden, besitzen ein hohes Potential als zukünftige ultradünne Schutzschichten für Magnetspeicherplatten. Die ta-C-Schichten erfüllen alle wesentlichen Anforderungen, in mechanischer, chemischer und tribologischer Hinsicht an 23 nm dicke Verschleiß- Korrosionsschutzschichten gestellt werden. Auch Beschichtungstechnik ist aus jetziger Sicht Massenproduktion geeignet. Damit...

10.1002/1522-2454(200108)13:4<215::aid-vipr215>3.0.co;2-b article EN Vakuum in Forschung und Praxis 2001-08-01

10.1007/bf00322063 article EN Fresenius Journal of Analytical Chemistry 1995-01-01

10.1007/s0021653530333 article EN Analytical and Bioanalytical Chemistry 1995-10-01

The cochlea forms a key element of the human auditory system in temporal bone. Damage to continues produce significant impairment for sensory reception environmental stimuli. To improve this impairment, optical cochlear implant new research approach. A prerequisite method is understand how light propagation, as well scattering, reflection and absorption, takes place within cochlea. We offer study distribution through phantom materials Monte-Carlo simulations. calculation an angular after...

10.22541/au.169390127.79087027/v1 preprint EN Authorea (Authorea) 2023-09-05

The cochlea forms a key element of the human auditory system in temporal bone. Damage to continues produce significant impairment for sensory reception environmental stimuli. To improve this impairment, optical cochlear implant new research approach. A prerequisite method is understand how light propagation, as well scattering, reflection, and absorption, takes place within cochlea. We offer study distribution through phantom materials which have objective mimic behavior bone Monte-Carlo...

10.1002/jbio.202300358 article EN cc-by Journal of Biophotonics 2023-11-29

Plasma immersion ion implantation (PIII) is a promising new method to modify surfaces of materials by implantation. PIII works without expensive accelerators and therefore this should have the potential for more applications than conventional accelerators. By method, samples are immersed into plasma high voltage pulses applied it extracting ions from plasma. Neither an extraction system nor other optics needed. In addition great advantage, using PIII, higher current densities shorter times...

10.1116/1.590653 article EN Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena 1999-03-01

Summary form only as given. Vacuum deposition of thin films on large area substrates has enjoyed a steady growth during the last years. This development is strongly coupled to continuous improvement PVD techniques like magnetron or evaporation. Using traditional thermal evaporation, highest rates can be achieved at lowest costs, but there are number potential applications which would need an improved quality (nanocrystalline instead columnar growth, higher density, no pin-holes, etc.). There...

10.1109/deiv.1998.738717 article EN 2002-11-27
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