- Silicon Nanostructures and Photoluminescence
- Nanowire Synthesis and Applications
- Semiconductor materials and devices
- solar cell performance optimization
- Advanced Surface Polishing Techniques
- Silicon and Solar Cell Technologies
- 3D IC and TSV technologies
- Advancements in Semiconductor Devices and Circuit Design
- Quantum Dots Synthesis And Properties
- Material Science and Thermodynamics
- Laser Material Processing Techniques
- Engineering Technology and Methodologies
- Advanced MEMS and NEMS Technologies
- Chalcogenide Semiconductor Thin Films
- Modular Robots and Swarm Intelligence
Université de Sherbrooke
2023-2024
Centre for Interdisciplinary Research in Rehabilitation
2022
GaAs Solar Cells In article number 2300643, Valentin Daniel and co-workers have grown monocrystalline GaAs/Ge epitaxial layers on 100 mm (4") porosified germanium wafers using metal-organic chemical vapor deposition. The single-junction photovoltaic cells, fabricated through front-side processing these structures, demonstrate efficiencies of up to 23.1%. This work paves the way for detachable III–V solar devices reusable wafers, ecological economic benefits.
The Porous germanium Efficient Epitaxial LayEr Release (PEELER) process is introduced allowing the fabrication of wafer scale detachable monocrystalline Ge nanomembranes compatible with III–V material growth on porous and substrate reuse.
Porous germanium (PGe) substrates have recently attracted significant attention for the development of lightweight and flexible solar cells optoelectronic devices. A reliable approach releasing epitaxial layers based on Germanium reusing substrate involves utilizing a bilayer structure PGe. The growth such detachable devices holds great potential integration onto Si platform. used PGe is made low-porosity layer serving as seed top high-porosity one weak separation layer. In this work, we...
III–V solar cells are mainly grown on GaAs or Ge substrate, which significantly contributes to the final cost and affects sustainable use of these rare materials. A so‐called PEELER process is developed, in a porosification technique used create weak layer between substrate epitaxial layers. This method enables separation layers, allowing for subsequent reuse germanium reduction environmental economic optoelectronic devices. Technology validation using device performance important assess...
Download This Paper Open PDF in Browser Add to My Library Share: Permalink Using these links will ensure access this page indefinitely Copy URL DOI
Download This Paper Open PDF in Browser Add to My Library Share: Permalink Using these links will ensure access this page indefinitely Copy URL DOI
Single crystal germanium (Ge) membranes have recently gained increasing interest for lightweight and low-cost solar cells flexible optoelectronic devices. These achieved similar material quality as bulk Ge substrate. However, the control of membrane detachment is still challenging. In this work, we explore post-growth engineering adhesion strength a on porous (PGe) substrate by inducing morphological transformations in separation layer through Thermal Budget (TB) control. Indeed, pillars...
Recent advancements in flexible optoelectronics have spurred interest developing nanoengineered substrates essential for the growth and fabrication of freestanding membranes (FSMs). The FSMs offer an extra degree flexibility applications previously unachievable through conventional techniques, such as heterointegration highly dissimilar materials. These allow stacking various materials, enabling seamless coupling their physical properties integration onto a variety substrates. Additionally,...
Germanium (Ge) is increasingly used as a substrate for high-performance optoelectronic, photovoltaic, and electronic devices. These devices are usually grown on thick rigid Ge substrates manufactured by classical wafering techniques. Nanomembranes (NMs) provide an alternative to this approach while offering wafer-scale lateral dimensions, weight reduction, limitation of waste, cost effectiveness. Herein, we introduce the Porous germanium Efficient Epitaxial LayEr Release (PEELER) process,...
Summary form only. III-V multi-junction solar cells on Ge substrate are widely used for space PV applications. However, challenges related to weight and cost reduction still encountered. Porous (PGe) lift-off is one of the reliable approaches allowing cell detachment (mass reduction) while offering multiple reuses (cost reduction). Accordingly, adhesion epilayer through PGe reconstructed weak layer (nm scale pillars) needs be investigated optimized offer scalable controllable detachment. In...