- Advanced Surface Polishing Techniques
- Advanced Machining and Optimization Techniques
- Advanced machining processes and optimization
- Force Microscopy Techniques and Applications
- Corrosion Behavior and Inhibition
- Anodic Oxide Films and Nanostructures
- Electrodeposition and Electroless Coatings
- Copper Interconnects and Reliability
- Enzyme-mediated dye degradation
- Advanced Combustion Engine Technologies
- Advanced oxidation water treatment
- Analytical chemistry methods development
- Slime Mold and Myxomycetes Research
- Evolution and Genetic Dynamics
- Biodiesel Production and Applications
- Power Systems Fault Detection
- Arsenic contamination and mitigation
- Electrochemical sensors and biosensors
- Chemical synthesis and alkaloids
- Semiconductor materials and devices
- Thermochemical Biomass Conversion Processes
- Synthesis of Organic Compounds
- Evolutionary Game Theory and Cooperation
- Smart Grid and Power Systems
- Silicon Nanostructures and Photoluminescence
Jilin Agricultural University
2024
Yingkou Institute of Technology
2023
Tianjin University of Technology
2017-2021
Hebei University of Technology
2012-2021
Harbin Institute of Technology
2021
Beijing University of Posts and Telecommunications
2020
Donghua University
2019
China Electric Power Research Institute
2013
North China Electric Power University
2013
Henan Polytechnic University
2013
Surface and subsurface defects were easily induced during abrasive machining process of optical crystals due to their high brittleness. Accurate characterization these is the prerequisite for obtaining components with surface integrity.This work aims evaluate CaF2 single by machining, mappings between micro cracks diffraction pattern curves, influence on lattice structures.Molecular dynamics simulation, grazing incidence X-ray experiments cross-sectional TEM detection used in this work.In...
Magnetic silica composite particles were prepared by using the biosilicification reaction, in which Fe3O4 nanoparticles entrapped a matrix. The functionalized with 3-aminopropyltriethoxysilane (APTES). These magnetic used to immobilize kind of valuable bulky industrial enzyme (laccase). incorporation greatly facilitates manipulation immobilized biocatalyst, since it can be easily and quickly recovered from reaction system simple application an external field. effects immobilization...
The chemical mechanical planarization (CMP) has been a key technology in the copper interconnection process of dual damascene. Corrosion inhibitors are often used as an important component CMP slurry to protect from corrosion at recess obtain high or low selectivity ratio for removal rate. 1,2,4-triazole (TAZ) recently reported be promising inhibitor that can replace benzotriazole(BTA). It proved 0.045M TAZ achieve same protection 0.002M benzotriazole on surface. present study investigates...
With the reduction of feature GLSI, cobalt (Co) became a novel barrier material due to its low resistivity and adhesion ability. On account different physical chemical properties copper cobalt, corrosion defects are easy occur in process post-CMP cleaning. The effects concentrations FA/O II chelating agent CBT inhibitor on galvanic Cu/Co silica particle removal surface were investigated this paper. Besides, was measured by electrochemical workstation, composition efficiency characterized...
Three Parallel Rivers is one of the world’s biodiversity hotspots. However, research on myxomycetes diversity scarce in this area. Random sampling was used to investigate myxomycetes’ and distribution characteristics One hundred seventeen species, including three varieties, were obtained, belonging 28 genera, nine families, six orders, with Arcyria cinerea Physarum viride being dominant species. Moreover, four species variety first reported China. Twenty-six Yunnan Province. The species’...
Detailed procedures for the modeling of synthesis load models (SLM) actual power network are presented, then classification indices based on 1oad characteristics and principle expounded.Based results general investigation 220 kV 330 substations in China's grid, classified, detailed characteristic selected different kinds typical carried out.By use statistical synthesis, SLM substations, which distribution networks taken into account, built; disseminated applied to whole Chinese grid.Besides,...
Purpose This paper aims to study the effects of processing parameters in reciprocating magnetorheological polishing (RMRP) on abrasive particle trajectory by simulation analysis, which provides a basis for machining uniformity workpiece. Design/methodology/approach The principle RMRP method is discussed, and series analysis are performed evaluate workpiece’s rotational speed, eccentric wheel’s eccentricity frame gap using method. Findings have significant influence trajectory, then workpiece...
During Cu CMP process, BTA is widely used as a corrosion inhibitor. After the residual leads to hydrophobic copper surface, which seriously affects device stability. Therefore, BTA, main organic residue on needs be effectively removed in post-CMP cleaning process. In this paper, removal of contaminants polished surface by different concentrations chelating agent FA/OII and ethylene diamine tetraacetic acid (EDTA) was studied. The residues characterized contact angle measurement...
Two dimensional ultrasonic vibration assisted grinding (TDUVG) is analyzed based on theoretical analysis of the cutting trace a grain in finished surface, and it gives kinematical model single grit during TDUVG, condition separate established, so two are introduced into system, which helps to form good machining way. Then TDUVG applied ultra-precise nanoZrO 2 ceramics, experiments surface quality ceramics were carried out using diamond both with without vibration. Experimental results show...
Purpose This paper aims to study the influence of different parameters magnetorheological polishing fluids (MRP fluids) on surface roughness and material removal rate (MRR) workpiece in reciprocating (RMRP) process. Design/methodology/approach A series single-factor experiments are performed evaluate concentration magnetic particles, abrasive particles size processing effects by using RMRP method. Moreover, yield stress viscosity MRP studied based Bingham plastic model varying parameters....
During Cu CMP process BTA is widely used as a corrosion inhibitor, reacts with and forms strong hydrophobic Cu(II)-BTA complex, which causes severe device problems. Thus, it very essential to clean detect the residue on surface after CMP. In this paper, characteristic peaks of powder, complex contaminated before cleaning FA/O II chelating agent were examined by Fourier transform infrared spectroscopy. The results demonstrated that spectroscopy method was accurate reliable for determination...
The large potential difference between copper and cobalt caused the corrosion of films galvanic in process chemical mechanical planarization (CMP) post cleaning barrier layer. In this paper, effects different inhibitors on inhibition copper-cobalt solution are studied. Different concentrations were added to FA/O II chelating agent as agent. effect was characterized by electrochemical workstation particles tested SEM. results show that Cu Co surface roughness can be significantly reduced with...