ADVERTISEMENT RETURN TO ISSUEPREVCommunicationNEXTAtomic Layer Deposition of Gold MetalMatthew B. E. Griffiths, Peter J. Pallister, David Mandia, and Seán T. Barry*View Author Information Department Chemistry, Carleton University, 1125 Colonel By Drive, Ottawa, Ontario K1S 5B6, Canada*Prof. Barry. E-mail: [email protected]Cite this: Chem. Mater. 2016, 28, 1, 44–46Publication Date (Web):December 2015Publication History Received23 November 2015Revised28 December 2015Published online30 inissue...

The properties of the high order cladding modes standard optical fibers are measured in real-time during deposition gold nanoparticle layers by chemical vapor (CVD). Using a tilted fiber Bragg grating (TFBG), resonance wavelength and peak-to-peak amplitude radially polarized mode located 51 nm away from core reflection shift 0.17 13.54 dB respectively formation ~200 thick layer. For spectrally adjacent azimuthally resonance, corresponding shifts 0.45 16.34 dB. In both cases, amplitudes go...

The geometry- and size-dependent effective medium properties of ultrathin gold films deposited on the bare cladding single mode optical fibers by chemical vapor deposition are characterized measuring polarized transmission spectra in-fiber gratings at wavelengths near 1550 nm. real part complex refractive indices with average thicknesses ranging from 6 to 65 nm about 10 times higher than that bulk these wavelengths, while imaginary values 2 orders magnitude lower. essentially isotropic,...

Surface supported, low dimensional gold nanostructures are of interest for plasmonic applications. Low readily accessible by solution-phase growth, where shape control through the addition growth-directing surfactants is well established. Yet, in chemical vapor deposition (CVD) has not been explored, and metallic films typically limited to nanoparticulate or thin film morphologies. This article describes self-seeded growth high aspect ratio plates wires CVD. A directed mechanism proposed,...

Thermal atomic layer deposition of Au nanoparticles on titania in a fluidized bed reactor. Effects precursor pulse time nanoparticle size and loading.

A plasma-enhanced atomic layer deposition (PE-ALD) process to deposit metallic gold is reported, using the previously reported Me3Au(PMe3) precursor with H2 plasma as reactant. The has a window from 50 120 °C growth rate of 0.030 ± 0.002 nm per cycle on seed layers, and it shows saturating behavior for both reactant exposure. X-ray photoelectron spectroscopy measurements show that films deposited at are higher purity than ones (<1 at. % carbon oxygen impurities <0.1 phosphorous). low...

Two methods have been developed for determining antimony and lead in urine. In the first method urine is wet oxidised metals are extracted as chelates into an organic phase. This then analysed by atomicabsorption spectroscopy after carbon-rod atomisation. Nitric acid must be eliminated from wet-oxidation mixture because it causes incomplete recovery of antimony.In second directly again determined atomic-absorption with preferred routine analysis normal samples. The used samples that contain...

Atomic layer deposition (ALD) of gold is being studied by multiple research groups, but to date no process using non‐energetic co‐reactants has been demonstrated. In order access milder co‐reactants, precursors with higher thermal stability are required. We set out uncover how structure and bonding affect the volatility a family twelve organogold(I) compounds combination techniques: X‐ray diffraction (XRD), thermogravimetric analysis (TGA), differential scanning calorimetry (DSC), density...

The gold(I) compound [Au(NiPr)2CNMe2]2 was used as a chemical vapour deposition precursor to deposit gold metal films between 200 – 225 °C on both flat silicon substrates well silica optical fibers. deposited film nanocrystalline with preferred (111) orientation and had marginal conductivity. shows good purity has very high growth rate of 222 nm/min (37 Å/s) when measured the fiber. fiber monitored by attenuation guided light mode diffracted into fiber's cladding tilted Bragg grating (TFBG)...

We compare and contrast the volatility thermal stability of a family twelve organometallic gold(I) compounds using combination X-ray crystallography, thermogravimetric analysis (TGA), density functional theory (DFT) techniques. Pentafluorophenyl is used as new ligand for vapor deposition which produces rather low volatility, but very thermally stable when combined with PMe 3 N , '-di- tert -butylimidazolidin-2-ylidene. introduce precursor figure merit that can be to rank usefulness. Using...

Atomic layer deposition (ALD) is a versatile gas phase coating technique that allows of complex structured materials, as well high-surface area materials such nanoparticles. In this work, ALD used to deposit lutetium oxide on TiO2 nanoparticles (P25) in fluidized bed reactor produce particles for nuclear medical applications. Two precursors were tested: the commercially available Lu(TMHD)3 and custom-made Lu(HMDS)3. Using Lu(TMHD)3, loading up 15 wt. % could be obtained, while using...

We show that the N-heterocyclic carbene precursor employed has a significant influence on purity of resulting films prepared by vapour-phase deposition.

The reaction mechanism of the recently reported Me3AuPMe3-H2 plasma gold ALD process was investigated using in situ characterization techniques a pump-type system. In RAIRS and vacuo XPS measurements confirm that CH3 PMe3 ligands remain on surface after chemisorption precursor, causing self-limiting adsorption. Remaining groups are removed by H2 form CH4 likely as PHxMey groups, allowing new precursor molecules during next exposure. decomposition behaviour Me3AuPMe3 Au is also presented...

Gold nanoparticles have been extensively studied for their applications in catalysis. For Au to be catalytically active, controlling the particle size is crucial. Here we present a low temperature (105 °C) thermal atomic layer deposition approach depositing gold on TiO&lt;sub&gt;2&lt;/sub&gt; with controlled and loading using trimethylphosphino-trimethylgold (III) two co-reactants (ozone water) fluidized bed reactor. We show that exposure time of precursors variable can used decouple from...

Effectively size-dependent refractive index of ultrathin gold film deposited by chemical vapour deposition (CVD) is experimentally investigated at infrared wavelength. By coating the on tilted fiber Bragg grating (TFBG), wavelength and amplitude TFBG cladding modes are modulated interaction between their evanescent fields film. Then, complex in in-plane out-of-plane directions can be calculated from effective indices with azimuthally radically polarized electric boundary, respectively. The...

This is a survey of known gold-containing chemical vapor deposition (CVD) and atomic layer (ALD) precursors with focus on collecting their volatilization decomposition data. These data were applied to figure merit (σ) developed easily assess the thermal characteristics (“volatilization temperature” onset decomposition]) important in initial assessment molecules as potential ALD precursors. Of 46 compounds that identified, 23 had sufficient reported literature determine σ value. The two gold...

Eight new atomic layer deposition (ALD) precursors were synthesized using a ligand that is to the field of ALD: (tBuNH)SiMe2NMe2. Complexes containing Mg, V, Mn, Fe, Co, Ni, and Zn found be tetrahedral, Li complexes form more complex structures. These compounds performed exceptionally well by thermogravimetric analysis (TGA). All except for one species Fe left residual masses below 5%, similar or better than analogous amidinate complexes. In particular, Co(II) very thermally robust performs...

Pyrite-type cobalt disulfide (CoS2), which is one among other stable sulfide phases, exhibits interesting electronic and magnetic properties. Herein, we demonstrate a tailored metalorganic chemical vapor deposition (MOCVD) pathway for the growth of high-quality ferromagnetic CoS2 thin films. The influence CVD process parameters on quality films was investigated by complementary analyses. Superconducting quantum interference device (SQUID) measurements confirmed existence pure with moment...

Chemical vapour deposition (CVD) and atomic layer (ALD) are closely-related techniques for the fabrication of thin films on a variety substrates. Both these methods mature, have been heavily employed metal, semiconducting, dielectric in wide diversity industries. Specifically, microelectronics photovoltaics employ device fabrication.

Gold nanoparticles have been extensively studied for their applications in catalysis. For Au to be catalytically active, controlling the particle size is crucial. Here we present a low temperature (105 °C) thermal atomic layer deposition approach depositing gold on TiO 2 with controlled and loading using trimethylphosphino-trimethylgold (III) two co-reactants (ozone water) fluidized bed reactor. We show that exposure time of precursors variable can used decouple from loading. Longer...

We compare and contrast the volatility thermal stability of a family twelve organometallic gold(I) compounds using combination X-ray crystallography, thermogravimetric analysis (TGA), density functional theory (DFT) techniques. Pentafluorophenyl is used as new ligand for vapor deposition which produces rather low volatility, but very thermally stable when combined with PMe&lt;sub&gt;3&lt;/sub&gt;...