ADVERTISEMENT RETURN TO ISSUEPREVCommunicationNEXTAtomic Layer Deposition of Gold MetalMatthew B. E. Griffiths, Peter J. Pallister, David Mandia, and Seán T. Barry*View Author Information Department Chemistry, Carleton University, 1125 Colonel By Drive, Ottawa, Ontario K1S 5B6, Canada*Prof. Barry. E-mail: [email protected]Cite this: Chem. Mater. 2016, 28, 1, 44–46Publication Date (Web):December 2015Publication History Received23 November 2015Revised28 December 2015Published online30 inissue...

A series of copper(I) amidinates the general type [(R'NC(R)NR'')Cu](2) (R' and R'' = n-propyl, isopropyl, n-butyl, isobutyl, sec-butyl, tert-butyl; R methyl, n-butyl) have been synthesized characterized. These compounds are planar dimers, bridged by nearly linear N-Cu-N bonds. Their properties (volatility, low melting point, high thermal stability, self-limited surface reactivity) well-suited for atomic layer deposition (ALD) copper metal films that pure, highly conductive, conformal,...

The absolute refractive indices (RIs) of water and other liquids are determined with an uncertainty ±0.001 at near-infrared wavelengths by using the tilted fiber Bragg grating (TFBG) cladding mode resonances a standard single-mode to measure critical angle for total internal reflection interface between its surroundings. necessary condition obtain RIs (instead measuring RI changes) is thorough characterization dispersion core effective index TFBG across full range resonance spectrum. This...

Carbodiimides are known to insert into aluminum-carbon bonds form four-membered bidentate amidinate chelate rings. Insertions Al-R and Al-NR'2 (R, R' = alkyl) have been reported in the literature. We devised a mechanism for these insertions modeled it using density functional theory (DFT) calculations. The calculated barrier heights competitive show insertion Al-N(CH3)2 goes through lower than reaction with Al-CH3 diisopropyl carbodiimide due necessity of forming pentavalent carbon...

The continued dominance of copper in microelectronic manufacturing is due part to the techniques that have kept pace with relentless trend towards smaller feature sizes. Pure and defect-free features can be created at these scales using gas phase deposition methods such as chemical vapor (CVD) atomic layer (ALD). Here we review processes particular surface chemistry for depositing metal by CVD ALD. A summary known given, new trends film research are discussed. As well, process parameters...

The properties of the high order cladding modes standard optical fibers are measured in real-time during deposition gold nanoparticle layers by chemical vapor (CVD). Using a tilted fiber Bragg grating (TFBG), resonance wavelength and peak-to-peak amplitude radially polarized mode located 51 nm away from core reflection shift 0.17 13.54 dB respectively formation ~200 thick layer. For spectrally adjacent azimuthally resonance, corresponding shifts 0.45 16.34 dB. In both cases, amplitudes go...

The deposition of thin solid films is central to many industrial applications, and chemical vapor (CVD) methods are particularly useful for this task. For one, the isotropic nature adsorption species affords even coverages on surfaces with rough topographies, an increasingly common requirement in microelectronics. Furthermore, by splitting overall film-depositing reactions into two or more complementary self-limiting steps, as it done atomic layer depositions (ALD), film thicknesses can be...

Integrated circuits are presently constructed using top-down strategies composed of multiple etching and lithographic steps. As the feature sizes these devices approach single-digit nm scales, existing fabrication methods introduce defects which require further corrective steps rapidly becoming ineffective for industry needs. To meet future scaling requirements, bottom-up leverage differences in local surface environment such as area-selective atomic layer deposition (AS-ALD) promising but...

The insertion of carbodiimides into existing metal-heteroatom bonds is an important preparative route for the synthesis useful ligand systems such as amidinates and guanidinates. Our interest lies in multiple insertions at one metal center mechanisms rearrangement. We have synthesized characterized [Me(2)NC(N(i)Pr)(2)](n)M(NMe(2))(3)(-)(n) (n = 1, 2, 3; M Al, Ga). investigated mechanism discovered a transfer step that formation final products.

Copper (I) guanidinate dimers were generated by a salt metathesis route and structurally characterized. The guanidinates differed from the known amidinate because of large torsion dimer ring. This had direct effect on their thermal chemistry. reactivity was investigated several methods, including novel temperature-resolved, gas-phase method that monitored mass spectrometry. copper underwent carbodiimide deinsertion to produce metal at temperatures between 225 −and 250 °C in gas phase 125...

Abstract Several guanidinates of copper and silver, as well amidinates gold were synthesized potential precursors for vapour deposition methods. These compounds found to be dimers in the case gold, trimers silver. The showed good thermal photostability, isolable by sublimation. silver proved very reactive both heat light, deposit metal when heated, suggesting that these sensitive might used single source precursors. exhibit some light sensitivity, but much more stable than their...

Two novel N-heterocyclic carbene (NHC)-containing copper(I) amides are reported as atomic layer deposition (ALD) precursors. 1,3-Diisopropyl-imidazolin-2-ylidene copper hexamethyldisilazide (1) and 4,5-dimethyl-1,3-diisopropyl-imidazol-2-ylidene (2) were synthesized structurally characterized. The thermal behavior of both compounds was studied by thermogravimetric analysis (TGA), they found to be reasonably volatile compounds. Compound 1 had no residual mass in the TGA showed long-term...

The conformal coating of a 50 nm-thick layer copper nanoparticles deposited with pulse chemical vapor deposition (I) guanidinate precursor on the cladding single mode optical fiber was monitored by using tilted Bragg grating (TFBG) photo-inscribed in core.The pulse-per-pulse growth is readily obtained from position and amplitudes resonances reflection spectrum grating.In particular, we confirm that real part effective complex permittivity nano-structured an order magnitude larger than bulk...

Thin films of materials are critical components for most areas sustainable technologies, making thin film techniques, such as chemical vapor deposition (CVD), instrumental a future. It is, therefore, great importance to critically consider the sustainability aspects CVD processes themselves used make technologies. Here, we point several common practices in that not sustainable. From these, offer perspective on principles sustainable, “Green CVD” philosophy, which hope will spur research how...

The vapor deposition of many molybdenum-containing films relies on the delivery volatile compounds with general bis(tert-butylimido)molybdenum(VI) framework, both in atomic layer and chemical deposition. We have prepared a series (tBuN)2MoCl2 adducts using neutral N,N'-chelates investigated their volatility, thermal stability, decomposition pathways. Volatility has been determined by thermogravimetric analysis, 1,4-di-tert-butyl-1,3-diazabutadiene adduct (5) found to be most (1 Torr pressure...

A copper(I) iminopyrrolidinate was synthesized and evaluated by thermal gravimetric analysis (TGA), solution based 1H NMR studies surface chemistry to determine its stability decomposition mechanism. Copper(I) tert-butyl-imino-2,2-dimethylpyrrolidinate (1) demonstrated superior showed negligible in TGA experiments up 300 °C as well no solutions at 165 over 3 weeks.

In this paper, we compare emerging nanowire electrodes (100 nm wide × 50 high 45 μm long) against state-of-the-art commercial ultramicroelectrodes (12.5 diameter) in terms of improvements current density and also compatibility with rapid electroanalysis. Analyte diffusion profiles at ultramicrodisc were simulated for a variety scan rates (50–5000 mV.s−1) corresponding experimental measurements undertaken. Significant enhancements applied voltage rate (up to 300 fold increase) observed...

The geometry- and size-dependent effective medium properties of ultrathin gold films deposited on the bare cladding single mode optical fibers by chemical vapor deposition are characterized measuring polarized transmission spectra in-fiber gratings at wavelengths near 1550 nm. real part complex refractive indices with average thicknesses ranging from 6 to 65 nm about 10 times higher than that bulk these wavelengths, while imaginary values 2 orders magnitude lower. essentially isotropic,...

Surface supported, low dimensional gold nanostructures are of interest for plasmonic applications. Low readily accessible by solution-phase growth, where shape control through the addition growth-directing surfactants is well established. Yet, in chemical vapor deposition (CVD) has not been explored, and metallic films typically limited to nanoparticulate or thin film morphologies. This article describes self-seeded growth high aspect ratio plates wires CVD. A directed mechanism proposed,...

Volatile metal complexes are important for chemical vapour deposition (CVD) and atomic layer (ALD) to deliver components growing thin films. Compounds that thermally stable enough volatilize but can also react with a specific substrate uncommon remain unknown many centres. Guanidinate ligands, as discussed in this review, have proven their utility CVD ALD precursors broad range of been used deposit oxides, nitrides pure films by tuning process parameters. Our review highlights use...

Atomic layer deposition (ALD) is a viable method for depositing functional, passivating, and encapsulating layers on top of halide perovskites. Studies in that area have only focused metal oxides, despite great number materials can be made with ALD. This work demonstrates that, addition to other ALD processes compatible the We describe two new lead sulfide. These operate at low temperatures (45–155 °C) been inaccessible previous PbS processes. Our rely volatile reactive precursors Pb(dbda)...

In this work, we report a new and promising approach toward the atomic layer deposition (ALD) of metallic Co thin films. Utilizing simple known CoCl2(TMEDA) (TMEDA = N,N,N′,N′-tetramethylethylenediamine) precursor in combination with intramolecularly stabilized Zn aminoalkyl compound Zn(DMP)2 (DMP dimethylaminopropyl) as an auxiliary reducing agent, thermal ALD process is developed that enables Zn-free studies demonstrate saturation behavior both precursors linearity depending on applied...