ADVERTISEMENT RETURN TO ISSUEPREVCommunicationNEXTAtomic Layer Deposition of Gold MetalMatthew B. E. Griffiths, Peter J. Pallister, David Mandia, and Seán T. Barry*View Author Information Department Chemistry, Carleton University, 1125 Colonel By Drive, Ottawa, Ontario K1S 5B6, Canada*Prof. Barry. E-mail: [email protected]Cite this: Chem. Mater. 2016, 28, 1, 44–46Publication Date (Web):December 2015Publication History Received23 November 2015Revised28 December 2015Published online30 inissue...

Sequential infiltration synthesis (SIS) is an emerging materials growth method by which inorganic metal oxides are nucleated and grown within the free volume of polymers in association with chemical functional groups polymer. SIS enables novel polymer-inorganic hybrid materials, porous spatially templated nanoscale devices relevance to a host technological applications. Although borrows from precursors equipment atomic layer deposition (ALD), chemistry physics differ important ways. These...

Previous work has shown that introduction of hexafluoroacetylacetone (Facac) units as nonstructural ligands for the zirconia-like nodes eight-connected metal–organic framework (MOF), NU-1000, greatly alters selectivity node-supported oxy-nickel clusters ethylene dimerization vs oligomerization. Here we explore a related concept: tuning support/catalyst interactions, and therefore, catalyst activity, via parallel installation organic modifiers on support itself. As focused para-substituted...

The absolute refractive indices (RIs) of water and other liquids are determined with an uncertainty ±0.001 at near-infrared wavelengths by using the tilted fiber Bragg grating (TFBG) cladding mode resonances a standard single-mode to measure critical angle for total internal reflection interface between its surroundings. necessary condition obtain RIs (instead measuring RI changes) is thorough characterization dispersion core effective index TFBG across full range resonance spectrum. This...

Abstract The first use of atomic layer deposition (ALD) to produce Janus membranes is reported, with an example system consisting a compositional gradient ranging from hydrophilic Al 2 O 3 on one face hydrophobic poly(propylene) the opposite face. Alternating pulses trimethyl aluminum and water vapor lead growth covalently bonded conforming membrane pore surfaces. Precise control ALD parameters significantly affects surface wetting modified depth infiltration into porosity. This derives slow...

Non-noble-metal, thin-film oxides are widely investigated as promising catalysts for oxygen evolution reactions (OER). Amorphous cobalt oxide films electrochemically formed in the presence of borate (CoBi) and phosphate (CoPi) share a common cobaltate domain building block, but differ significantly OER performance that derives from different electron–proton charge transport properties. Here, we use combination L edge synchrotron X-ray absorption (XAS), resonant emission (RXES), inelastic...

The sequential infiltration synthesis (SIS) of group 13 indium and gallium oxides (In2O3 Ga2O3) into poly(methyl methacrylate) (PMMA) thin films is demonstrated using trimethylindium (TMIn) trimethylgallium (TMGa), respectively, with water. In situ Fourier transform infrared (FTIR) spectroscopy reveals that these metal alkyl precursors reversibly associate the carbonyl groups PMMA in analogy to trimethylaluminum (TMAl), however, significantly lower affinity. This have important kinetic...

The properties of the high order cladding modes standard optical fibers are measured in real-time during deposition gold nanoparticle layers by chemical vapor (CVD). Using a tilted fiber Bragg grating (TFBG), resonance wavelength and peak-to-peak amplitude radially polarized mode located 51 nm away from core reflection shift 0.17 13.54 dB respectively formation ~200 thick layer. For spectrally adjacent azimuthally resonance, corresponding shifts 0.45 16.34 dB. In both cases, amplitudes go...

Atomic layer deposition (ALD) is a well-established technique for depositing nanoscale coatings with pristine control of film thickness and composition. The trimethylaluminum (TMA) water (H2O) ALD chemistry inarguably the most widely used yet to date, we have little information about atomic-scale structure amorphous aluminum oxide (AlOx) formed by this chemistry. This lack understanding hinders our ability establish process-structure-property relationships ultimately limits technological...

Sequential infiltration synthesis (SIS) is a route to the precision deposition of inorganic solids in analogy atomic layer but occurs within (vs upon) soft material template. SIS has enabled exquisite nanoscale morphological complexity various oxides through selective nucleation block copolymers templates. However, earliest stages growth remain unresolved, including structure nuclei and evolution local coordination environments, before after polymer template removal. We employed In K-edge...

Molybdenum sulfide films were grown by atomic layer deposition on silicon and fused silica substrates using molybdenum hexafluoride (MoF6) hydrogen at 200 °C. In situ quartz crystal microbalance (QCM) measurements confirmed linear growth 0.46 Å/cycle self-limiting chemistry for both precursors. Analysis of the QCM step shapes indicated that MoS2 is reaction product, this finding supported x-ray photoelectron spectroscopy showing Mo predominantly in Mo(IV) state. However, Raman diffraction...

The geometry- and size-dependent effective medium properties of ultrathin gold films deposited on the bare cladding single mode optical fibers by chemical vapor deposition are characterized measuring polarized transmission spectra in-fiber gratings at wavelengths near 1550 nm. real part complex refractive indices with average thicknesses ranging from 6 to 65 nm about 10 times higher than that bulk these wavelengths, while imaginary values 2 orders magnitude lower. essentially isotropic,...

Surface supported, low dimensional gold nanostructures are of interest for plasmonic applications. Low readily accessible by solution-phase growth, where shape control through the addition growth-directing surfactants is well established. Yet, in chemical vapor deposition (CVD) has not been explored, and metallic films typically limited to nanoparticulate or thin film morphologies. This article describes self-seeded growth high aspect ratio plates wires CVD. A directed mechanism proposed,...

Metal oxide semiconductors are important due to their diverse set of applications in (opto)electronics including light-emitting diodes, solar cells, and thin film transistors (TFTs). However, compared n-type counterparts, p-type films less often reported, there is a need for increased fundamental understanding process-structure–property relationships. In this study, CuOx was grown by plasma-enhanced atomic layer deposition (PE-ALD) using different ratios hydrogen oxygen plasma nonfluorinated...

Dimeric silver(I) and gold(I) tert-butyl-imino-2,2-dimethylpyrrolidinates were synthesized characterized by thermal gravimetric analysis (TGA), differential scanning calorimetry (DSC), single-crystal X-ray diffraction, chemical vapor deposition (CVD) experiments. The motivation for this work arose from the excellent stability of previously reported analogous copper(I) compound included completion a series potential precursors atomic layer deposition. These compounds are stable in air soluble...

The optical properties of an ultrathin discontinuous gold film in different dielectric surroundings are investigated experimentally by measuring the polarization-dependent wavelength shifts and amplitudes cladding mode resonances a tilted fiber Bragg grating. was prepared electron-beam evaporation had average thickness 5.5 nm ( ± 1 nm). Scanning electron imaging used to determine that is actually formed individual particles with lateral dimensions 28 8 complex refractive indices equivalent...

Aluminum oxide and aluminum nitride-containing films were grown by atomic layer deposition (ALD) plasma-enhanced (PE-ALD) employing an under-utilized tris(dimethylamido)aluminum(III) precursor. This compound has not been reported as a precursor for ALD of alumina previously, only AlN thermal process using ammonia coreagent. Thermogravimetric analysis demonstrates its excellent volatility stability, both which are ideal characteristics deposited thermally water By x-ray photoelectron...

Molten salts are promising reaction media candidates for the discovery of novel materials; however, they offer little control over oxidation state compared to aqueous solutions. Here, we demonstrated that when two hydroxides mixed, their melts become fluxes with tunable solubility, which surprisingly powerful solvents ternary chalcogenides and effective paths crystal growth new compounds. We report precise Ni is achievable in mixed molten LiOH/KOH grow single crystals all known K–Ni–S It...

The combined effect of nanoscale dielectric and metallic layers prepared by atomic layer deposition (ALD) chemical vapor (CVD) on the refractometric properties tilted optical fiber Bragg gratings (TFBG) is studied. A high index intermediate made up either 50 nm or 100 Al2O3 (refractive near 1.62) was deposited ALD followed thin gold (30–65 nm) from a known single-source (I) iminopyrrolidinate CVD precursor. fabricated devices were immersed in different surrounding refractive indices (SRI)...

The efficiency of a thermophotovoltaic (TPV) system depends critically upon the spectral selectivity and stability an emitter, which may operate most effectively at temperatures in excess 1000 °C. We computationally design experimentally demonstrate novel selective emitter based on multilayer nanostructures, robust to off-normal emission angles. A computational search material temperature compatibility space simple designs motivates new classes identifies several promising nanostructure for...

Abstract The tilted fiber Bragg grating (TFBG), as a versatile and robust tool for many sensing applications with particular focus on vapor deposition processes, is reviewed. Recent work employing the TFBG an optical probe monitoring metal‐organic (MO)CVD of noble‐metal, single‐source precursors discussed extensively. This also establishes broad scope that utilizes TFBGs other configurations to interrogate thin film growth associated properties. While it cannot possibly cover full respect...

Titanium nitride (TiN) is a unique refractory plasmonic material, the nanocomposites and alloys of which provide further opportunities to tailor its optical photonic properties. We prepare TiAlN films continuously variable compositions through systematic variation TiN versus AlN cycle ratio in plasma-enhanced atomic layer deposition (PEALD) investigate resulting thin-film composition, crystallinity, The properties are not simple linear combinations films, exhibit distinct metallic dielectric...

The gold(I) compound [Au(NiPr)2CNMe2]2 was used as a chemical vapour deposition precursor to deposit gold metal films between 200 – 225 °C on both flat silicon substrates well silica optical fibers. deposited film nanocrystalline with preferred (111) orientation and had marginal conductivity. shows good purity has very high growth rate of 222 nm/min (37 Å/s) when measured the fiber. fiber monitored by attenuation guided light mode diffracted into fiber's cladding tilted Bragg grating (TFBG)...

Thin hafnium oxide films were prepared by atomic layer deposition using a carbon-free precursor, tetrakis(tetrahydroborato)hafnium [Hf(BH4)4], and H2O. Film growth was studied an in situ quartz crystal microbalance Fourier transform infrared spectroscopy measurements. Self-limiting observed between 100 175 °C, but the thermal decomposition of Hf precursor occurred at higher temperatures. The film properties investigated x-ray photoelectron spectroscopy, reflectivity, diffraction,...