Anil U. Mane

ORCID: 0000-0003-1490-4476
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About
Contact & Profiles
Research Areas
  • Semiconductor materials and devices
  • Photocathodes and Microchannel Plates
  • Electronic and Structural Properties of Oxides
  • Advancements in Battery Materials
  • Electron and X-Ray Spectroscopy Techniques
  • Copper Interconnects and Reliability
  • Catalytic Processes in Materials Science
  • Ga2O3 and related materials
  • Advanced Battery Materials and Technologies
  • Radiation Detection and Scintillator Technologies
  • Dark Matter and Cosmic Phenomena
  • 2D Materials and Applications
  • ZnO doping and properties
  • Photonic and Optical Devices
  • Advanced Optical Sensing Technologies
  • Advanced Battery Technologies Research
  • Diamond and Carbon-based Materials Research
  • Membrane Separation Technologies
  • Radiation Therapy and Dosimetry
  • Particle Detector Development and Performance
  • Chalcogenide Semiconductor Thin Films
  • Advanced Memory and Neural Computing
  • Ferroelectric and Negative Capacitance Devices
  • Transition Metal Oxide Nanomaterials
  • MXene and MAX Phase Materials

Argonne National Laboratory
2015-2024

University of Chicago
2023

Boise State University
2021-2022

Micron (United States)
2021-2022

Center for Advanced Energy Studies
2022

Glan Clwyd Hospital
2021

University of Missouri
2020

Northwestern University
2020

National Institute for Subatomic Physics
2018

Delft University of Technology
2018

Conformal Al<sub>2</sub>O<sub>3</sub> coating improves wettability of liquid electrolyte on lithium leading to homogenous electrodeposition, reduced dendrite growth, and improved cyclability.

10.1039/c7ta03116e article EN Journal of Materials Chemistry A 2017-01-01

Disasters on the scale of Exxon Valdez and Deepwater Horizon serve as harrowing reminders devastating effects uncontrolled oil spills have environment.

10.1039/c6ta09014a article EN Journal of Materials Chemistry A 2017-01-01

ADVERTISEMENT RETURN TO ISSUEPREVCommunicationNEXTAmorphous Metal Fluoride Passivation Coatings Prepared by Atomic Layer Deposition on LiCoO2 for Li-Ion BatteriesJoong Sun Park†, Anil U. Mane‡, Jeffrey W. Elam‡, and Jason R. Croy*†View Author Information† †Chemical Sciences Engineering Division ‡Energy Systems Division, Argonne National Laboratory, Argonne, Illinois 60439, United States*E-mail: [email protected]Cite this: Chem. Mater. 2015, 27, 6, 1917–1920Publication Date (Web):March 5,...

10.1021/acs.chemmater.5b00603 article EN Chemistry of Materials 2015-03-05

Atomic layer deposition (ALD) was employed to synthesize supported Pt–Pd bimetallic particles in the 1 2 nm range. The metal loading and composition of nanoparticles were controlled by varying temperature applying ALD oxide coatings modify support surface chemistry. High-resolution scanning transmission electron microscopy images showed monodispersed on Al2O3- TiO2-modified SiO2 gel. X-ray absorption spectroscopy revealed that have a stable Pt-core, Pd-shell nanostructure. Density functional...

10.1021/cm300080w article EN Chemistry of Materials 2012-08-20

Abstract Membranes are among the most promising means of delivering increased supplies fit‐for‐purpose water, but membrane fouling remains a critical issue restricting their widespread application. Coupling photocatalysis with separation has been proposed as potentially effective approach to reduce fouling. However, commonly used materials in limit use low‐cost sources such sunlight due large bandgaps. There few examples situ photocatalytic self‐cleaning membranes, removal from filtration...

10.1002/adfm.202002847 article EN publisher-specific-oa Advanced Functional Materials 2020-06-30

Abstract Improvements in energy–water systems will necessitate fabrication of high‐performance separation membranes. To this end, interface engineering is a powerful tool for tailoring properties, and atomic layer deposition (ALD) has recently emerged as promising versatile approach. However, most non‐polar polymeric membranes are not amenable to ALD processing due the absence nucleation sites. Here, sensitization strategy ALD‐coating presented, illustrated by membrane hydrophilization....

10.1002/adfm.201910062 article EN Advanced Functional Materials 2020-02-16

Sulfide-based solid-state electrolytes (SSEs) exhibit many tantalizing properties including high ionic conductivity and favorable mechanical for next-generation batteries. Widespread adoption of these materials is hindered by their intrinsic instability under ambient conditions, which makes them difficult to process at scale, the Li||SSE cathode||SSE interfaces, limits cell performance lifetime. Atomic layer deposition leveraged grow thin Al2 O3 coatings on Li6 PS5 Cl powders address both...

10.1002/adma.202300673 article EN cc-by-nc Advanced Materials 2023-03-16

We investigated the atomic layer deposition (ALD) of indium oxide (In2O3) thin films using alternating exposures trimethylindium (TMIn) and a variety oxygen sources: ozone (O3), O2, deionized H2O, hydrogen peroxide (H2O2). used in situ quartz crystal microbalance measurements to evaluate effectiveness different sources found that only O3 yielded viable sustained In2O3 growth with TMIn. These also provided details about mechanism enabled us verify both TMIn surface reactions were...

10.1021/acs.jpcc.6b02657 article EN The Journal of Physical Chemistry C 2016-04-18

Non-noble-metal, thin-film oxides are widely investigated as promising catalysts for oxygen evolution reactions (OER). Amorphous cobalt oxide films electrochemically formed in the presence of borate (CoBi) and phosphate (CoPi) share a common cobaltate domain building block, but differ significantly OER performance that derives from different electron–proton charge transport properties. Here, we use combination L edge synchrotron X-ray absorption (XAS), resonant emission (RXES), inelastic...

10.1021/jacs.8b02719 article EN Journal of the American Chemical Society 2018-07-20

This scanning electron microscopy image (∼2 μm wide) depicts high-aspect-ratio features patterned in silicon using sequential infiltration synthesis (SIS) enhancement of photoresist. SIS penetrates the polymeric resist layer with etch-resistant alumina, thereby transforming it into a hard mask. conversion enables use very thin layers, so pattern collapse is virtually eliminated and goals set forth for lithography 2022 can be achieved today. Detailed facts importance to specialist readers are...

10.1002/adma.201104871 article EN Advanced Materials 2012-04-10

Abstract Atom‐probe tomography ( APT ) is currently the only analytical technique that, due to its spatial resolution and detection efficiency, has potential measure carbon isotope ratios of individual nanodiamonds. We describe three different sample preparation protocols that we developed for analysis meteoritic nanodiamonds at sub‐nm present peak synthetic The results demonstrate an instrumental bias associated with needs be quantified corrected obtain accurate ratios. After this...

10.1111/maps.12265 article EN Meteoritics and Planetary Science 2014-03-01

There are broad interests in selective and localized synthesis nanodomains of self-assembled block copolymers (BCPs) for a variety applications. Sequential infiltration (SIS) shows promise to selectively grow controllable amount materials one type nanodomain BCP film. However, the effects nanostructured domains film SIS cycles on material growth behavior rarely studied. In this work, we investigated TiO2 within polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) films two corresponding...

10.1021/acs.langmuir.7b02922 article EN Langmuir 2017-10-17

New complexes MoO2(tBuAMD)2 (1) and WO2(tBuAMD)2 (2) (AMD = acetamidinato) are synthesized fully characterized as precursors for atomic layer deposition (ALD). They contain metal-oxo functionalities not previously utilized in ALD-type growth processes by 1H 13C NMR, X-ray diffraction (XRD), Fourier transform infrared, thermogravimetric analysis, single-crystal XRD, elemental analysis. Guided quartz-crystal microbalance studies, ALD methodologies both have been developed. Remarkably, these...

10.1021/acs.chemmater.6b00248 article EN Chemistry of Materials 2016-02-26

Fouling is a ubiquitous challenge in water treatment systems. Typically, aggressive chemical cleaning or replacement of components are the only options. In article number 2002847, Jianquan Luo, Seth B. Darling, and co-workers demonstrate thin catalytic coating sensitive to visible light that enables membrane self-cleaning situ operando within filtration apparatuses. Photodegradation organic pollutants also possible with these membranes.

10.1002/adfm.202070230 article EN Advanced Functional Materials 2020-08-01

Li–O2 batteries suffer from large charge overpotentials due to the high transfer resistance of Li2O2 discharge products. A potential solution this problem is development LiO2-based that possess low lower LiO2. In report, IrLi nanoparticles were synthesized and implemented for first time as a LiO2 battery cathode material. The nanoparticle synthesis was achieved by temperature- time-optimized thermal reaction between precise ratio iridium lithium metal. employing IrLi-rGO cathodes cycled up...

10.1021/acsenergylett.2c01191 article EN ACS Energy Letters 2022-07-19

Membranes integrating two-dimensional (2D) materials have emerged as a category with unusual ion transport and potentially useful separation applications in both aqueous nonaqueous systems. The interlayer galleries these membranes drive selectivity, specific properties determined by the chemical structural modifications within inherently different interlayers. Here we report an approach to tuning spacing single source material─exfoliated restacked vermiculite alkanediamine cross-linkers─to...

10.1021/acsnano.2c05954 article EN ACS Nano 2022-11-01

Titanium-added praseodymium silicate layers on Si(001) are promising high-k insulators for silicon-based nanoelectronic devices. Synchrotron radiation x-ray photoelectron spectroscopy was applied to study the effect of titanium additives silicate/Si system. Nondestructive depth profiling by variation photon energy shows that thermal annealing activates diffusion deposited into silicate. A homogeneous layer is formed high-quality electrical properties.

10.1063/1.1978978 article EN Applied Physics Letters 2005-07-05

The ongoing development of Atomic Layer Deposition (ALD) enables the use relatively inexpensive and robust borosilicate micro-channel substrates for as Micro-Channel Plates (MCPs). surfaces channels in these glass plates are functionalized to control conductivity well Secondary Electron Yield (SEY). extensive SEY data found literature show significant variation a given material depending on apparatus, measurement procedure, sample preparation handling. We present systematic studies effects...

10.1016/j.phpro.2012.03.718 article EN Physics Procedia 2012-01-01

We demonstrate an economical and robust route to fabricate large-area microchannel plate (MCP) detectors which will open new opportunities in larger area MCP-based detector technologies. Using our newly developed bottom-up process flow, we have fabricated large MCPs (8 x 8). used Atomic Layer Deposition (ALD), a powerful precise thin film deposition technique, tailor the electrical resistance secondary electron emission (SEE) properties of area, low cost, borosilicate glass capillary arrays....

10.1016/j.phpro.2012.03.720 article EN Physics Procedia 2012-01-01

Atomic layer deposition (ALD) of the well-known Al2O3 on a LiCoO2 system is compared with that newly developed AlW x F y material. ALD coatings (∼1 nm thick) both materials are shown to be effective in improving cycle life through mitigation surface-induced capacity losses. However, behaviors and significantly different when coated directly cathode particles versus composite electrode composed active materials, carbons, binders. Electrochemical impedance spectroscopy, galvanostatic...

10.1021/acsomega.7b00605 article EN publisher-specific-oa ACS Omega 2017-07-19
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