A5059631020- Metal and Thin Film Mechanics
- Semiconductor materials and devices
- Diamond and Carbon-based Materials Research
- Advanced materials and composites
- ZnO doping and properties
- GaN-based semiconductor devices and materials
- Corrosion Behavior and Inhibition
- High-Temperature Coating Behaviors
- Nuclear Materials and Properties
- Copper-based nanomaterials and applications
- Silicon Nanostructures and Photoluminescence
- TiO2 Photocatalysis and Solar Cells
- Boron and Carbon Nanomaterials Research
- Dust and Plasma Wave Phenomena
- Advancements in Semiconductor Devices and Circuit Design
- Copper Interconnects and Reliability
- Bone Tissue Engineering Materials
- Surface Treatment and Coatings
- Plasma Diagnostics and Applications
- Polymer Nanocomposite Synthesis and Irradiation
- Hydrogen embrittlement and corrosion behaviors in metals
- Ga2O3 and related materials
- Advanced ceramic materials synthesis
- MXene and MAX Phase Materials
- Advanced Photocatalysis Techniques
Centre de Développement des Technologies Avancées
2016-2025
Practical Action
2018
Centre de Recherche en Technologie des Semi-conducteurs pour l’Energétique
2012
University of Sciences and Technology Houari Boumediene
1999
Abstract In this study, we present the effect of plasma deposition parameters on electrical and structural properties Ti/TiN multilayers. The films were formed by r.f. magnetron sputtering (13.56 MHz) under nitrogen argon reactive at low pressure. first step our study was optimization conditions in order to obtain good‐quality films. total pressure set between 2 10 mTorr. primary result is that self‐bias voltage plays a major role evolution TiN changing preferred film orientation their...
Photoreduction of hexavalent chromium, Cr(VI), identified as carcinogenic and mutagenic element, to Cr(III), believed be an essential using copper sulfide nanostructures (CuS NSs) photocatalyst was investigated under visible light irradiation (λ > 420 nm). The CuS NSs were synthesized at low temperature a wet chemical route fully characterized various techniques such scanning electron microscopy, transmission X-ray diffraction, photoelectron spectroscopy, Raman spectroscopy UV–vis...
Al2O3 alumina deposits were deposited on Ti6A4V titanium alloy substrates by rf-PVD at different substrate polarizations 0V, -50V, -100V and without polarization (wp). SEM images, the surface of deposits, showed a very good coverage with dense morphology. Quantitative EDS analysis these revealed presence elements Al O in deposits. The mass percentage elements, substrate, varies between 51.72% 56.19% for 43.80% 48.27% O. AFM, well-spread relatively uniform grooves. values arithmetic roughness...
In this paper, we report an experimental evidence of the impact applied a low magnetic field (B <; 10 mT) during negative bias temperature instability (NBTI) stress and recovery, on commercial power double diffused MOS transistor. We show that both interface (ANit) oxide trap (ANot) induced by NBTI are reduced applying field. This reducing is more pronounced as high. However, dynamic recovery phase not affected While, in phases.
Abstract Zirconium nitride films are deposited onto stainless steel AISI 316L and silicon (100) by radio frequency magnetron sputtering at different nitrogen flow ratios [N 2 /(Ar+N )] varied between 0 0.25). Scanning electron microscope, atomic force microscopy, X‐ray diffraction (XRD), Raman used to investigate the surface morphology microstructure of thin films. The mechanical electrochemical properties all coatings evaluated compared with uncoated explore efficiency modification. XRD...
Abstract In this work, TiO 2 layers are synthetized on Ti6Al4V alloy substrate by electrochemical anodizing process in fluoride‐containing alkaline electrolytes and under different applied voltages (10, 20, 30 V). The scanning electron microscopy (SEM) reveals a nearly regular vertical alignment of nanotubes (≈80–100 nm) for specimen treated at 20 V an agglomerate particles with no particular orientations those specimens 10 V. X‐ray diffraction (XRD) indicates the formation mixed phases...
A reactive r.f magnetron sputtering method was used to deposit titanium dioxide coating on stainless steel substrates without intentional heating or biasing. The purpose of this work is given study the argon-oxygen mixing gas corrosion behavior TiO 2 coatings. morphology and structure coatings were studied by X-ray diffraction (XRD). Potentiodynamic polarization results obtained from potentiodynamic curves showed that possessed higher resistance than uncoated substrate.
Titanium carbide (TiC) hard coatings have been obtained on steel and silicon substrates by rf magnetron sputtering process.Two layer deposited in order to improve adhesion steel.The lower was titanium metal the upper TiC reactive of target Ar methane gas mixture.The study confirmed that composition depends substrate bias voltage.Film microhardness measured microindentation.Measurement results showed hardness coating microstructure our polarization is an important parameter control microstructure.
Abstract ZnO thin films are synthesized by an ultrasonic spray pyrolysis method, with the deposition temperature in a range between 250–450 °C. The obtained analyzed X‐ray diffraction (XRD), atomic force microscopy (AFM), and photoluminescence (PL). samples used photocatalytic experiment to compare degradation efficiency methylene blue decomposition under UV irradiation. XRD patterns confirm polycristalline wurtzite structure preferred orientation along (002) plane. AFM images reveal...