A5071779530- Nanofabrication and Lithography Techniques
- Advancements in Photolithography Techniques
- Advanced Surface Polishing Techniques
- Force Microscopy Techniques and Applications
- Photonic and Optical Devices
- Optical Coatings and Gratings
- Microfluidic and Capillary Electrophoresis Applications
- Advanced optical system design
- Injection Molding Process and Properties
- Photonic Crystals and Applications
- Metal and Thin Film Mechanics
- Nonlinear Optical Materials Studies
- Nanomaterials and Printing Technologies
- Semiconductor Lasers and Optical Devices
- Adhesion, Friction, and Surface Interactions
- Mechanical and Optical Resonators
- Laser Material Processing Techniques
- Additive Manufacturing and 3D Printing Technologies
- Integrated Circuits and Semiconductor Failure Analysis
- Fluid Dynamics and Thin Films
- Advanced Sensor and Energy Harvesting Materials
- 3D Printing in Biomedical Research
- Plasmonic and Surface Plasmon Research
- Monoclonal and Polyclonal Antibodies Research
- Liquid Crystal Research Advancements
Paul Scherrer Institute
2015-2024
FHNW University of Applied Sciences and Arts
2006-2015
University of Bern
2013
Fraunhofer Institute for Microengineering and Microsystems
1993-2005
University of Siena
2004
Swiss Center for Electronics and Microtechnology (Switzerland)
2004
ETH Zurich
2004
We describe a novel parallel method for the patterning of proteins with nanoscale resolution. Combining nanoimprint lithography (NIL) and molecular assembly by lift-off (MAPL), we produced streptavidin patterns feature sizes in order 100 nm. A stamp is imprinted into heated PMMA film followed dry etching step that converts topography PMMA/Nb2O5 contrast. biotin functionalized copolymer, poly(l-lysine)-graft-poly(ethylene glycol)-biotin (PLL-g-PEG/PEG-biotin), spontaneously adsorbs on oxide...
We have investigated pattern formation of thin PMMA films during both hot embossing and demoulding micro- nanostructures. During filling the stamp cavities, compressive capillary effects were observed, under certain conditions periodic patterns with characteristic length scales formed. In unstructured regions form these is affected by local differences in pressure. For structured stamps, self-assembly strongly influenced size shape cavities. Rapid expansion trapped air resulted viscous...
A new chemical vapour deposition setup for the generation of anti-adhesive coatings on Si stamps used in nanoimprint lithography has been developed. This is suitable controlled co-evaporation more than one type silane by directly injecting a premixed into an evacuated reactor through septum. process was found to be very flexible and resulted reproducible coatings. surface coated with mixture mono- trichlorosilanes shows higher water contact angle those individual coatings, which attributed...
3D electron beam lithography and thermal reflow were combined to fabricate structures with multilevel continuous profiles. New shapes, smooth surfaces sharp corners achieved. By using exposure variable doses, up 20 steps fabricated in a 500 nm thick resist lateral resolution of 200 nm. Steps reflowed into slopes by post-processing, transferred silicon substrates proportional plasma etching. The method can be used for the fabrication nanoimprint stamps both features
Abstract Micro- and nanostructures with three-dimensional (3D) shapes are needed for a variety of applications in optics fluidics where structures both smooth sharp features enhance the performance functionality. We present novel method generation true 3D surfaces based on thermally activated selective topography equilibration (TASTE). This technique allows generating almost arbitrary sloped, convex concave profiles same polymer film dimensions micro- nanometer scale. describe its principal...
Chemical nanopatterns down to 50 nm in feature size have been fabricated via nanoimprint lithography and used simultaneously control azimuthal polar orientation of liquid crystals (LCs). The depends on the ratio homeotropic/planar surface potential areas, while LC azimuthally orients along direction silane patterns (see Figure).
Dense two-dimensional periodic photonic bandgap structures are produced in poly(methyl methacrylate) thin films using nanoimprint lithography (NIL). The stamp original was made by electron beam lithography. Then, a high versatility of the process achieved fabricating copies via NIL, which enables varying and optimizing both fill factors aspect ratios independently. For reliable copying over whole structural areas, nanorheological behaviour had to be considered. Using those copies, polymeric...
Photonic nanofences consisting of high aspect ratio polymeric optical subwavelength waveguides have been developed for their application into photonic sensing devices. They are up to millimeter long arrays 250 nm wide and 6 μm ridges produced by an advanced lithography process on a silicon substrate enabling straightforward integration complex circuits. Both simulations experimental results show that the overlap evanescent fields propagating from each nanofence allows formation effective...
Abstract Different methods capable of developing complex structures and building elements with high-aspect-ratio nanostructures combined microstructures, which are interest in nanophotonics, presented. As originals for subsequent replication steps, two families masters were developed: (i) 3.2 μm deep, 180 nm wide trenches fabricated by silicon cryo-etching (ii) 9.8 high, 350 ridges using 2-photon polymerization direct laser writing. Both emerging technologies enable the vertical smooth...
A two-step replication process chain is developed for a microlens array structure with deep three dimensional (3D) reliefs and sharp features enabling the transfer of photocured acrylic resist patterns into thermoplastic poly-methyl methacrylate (PMMA) same structural polarity via an intermediate stamp. By using ultraviolet (UV)-curable polydimethyl siloxane (PDMS), high fidelity negatives were cast from original microstructures made by two-photon-polymerization subsequently replicated PMMA...