Chen Liu

ORCID: 0000-0003-0164-7570
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About
Contact & Profiles
Research Areas
  • Advanced Memory and Neural Computing
  • Ferroelectric and Negative Capacitance Devices
  • Semiconductor materials and devices
  • MXene and MAX Phase Materials

Xiangtan University
2020-2021

Hf <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.5</sub> Zr O xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> (HZO)-based ferroelectric field-effect transistors (FeFETs) with HfO seed layer were investigated for radiation-hard nonvolatile memory applications. First, it was found that the HZO thin films grown on showed improved crystallinity and ferroelectricity compared those directly SiO film, leading to a larger window (MW), better...

10.1109/ted.2021.3095036 article EN publisher-specific-oa IEEE Transactions on Electron Devices 2021-07-13

Non-volatile field-effect transistor (FET) with amorphous Al <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> dielectric is demonstrated on Si substrate, which enabled by the voltage modulation of oxygen vacancy and negative charge dipoles in gate insulator. Ferroelectric-like behavior TaN/Al /Si xmlns:xlink="http://www.w3.org/1999/xlink">0.70</sub> Ge...

10.1109/led.2020.3010363 article EN IEEE Electron Device Letters 2020-07-20

Exploring the high-performance non-volatile memories for realizing energy-efficient memory in complementary metal-oxide-semiconductor (CMOS) circuits, memory-in-computing, and artificial synapse is key to rapid growth data markets. One of significant aspects development field-effect transistor (NVFET), which possesses advantage decoupling "write" "read" functions using third terminal. In this work, building on a semiconductor channel integrated with an amorphous Al <sub...

10.1109/ted.2020.3007563 article EN IEEE Transactions on Electron Devices 2020-07-22

Multilevel ferroelectric field−effect transistors (FeFETs) integrated with HfO2−based thin films demonstrate tremendous potential in high−speed massive data storage and neuromorphic computing applications. However, few works have focused on the stability of multiple memory states FeFETs. Here we firstly report write/read disturb effects Hf0.5Zr0.5O2 (HZO)−based The HZO−based FeFETs do not show obvious degradation write read cycles. Moreover, retention characteristics intermediate unsaturated...

10.1016/j.jmat.2021.11.003 article EN cc-by Journal of Materiomics 2021-11-12
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