Hao Du

ORCID: 0000-0003-0663-8980
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About
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Research Areas
  • Metal and Thin Film Mechanics
  • Diamond and Carbon-based Materials Research
  • Advanced materials and composites
  • High-Temperature Coating Behaviors
  • Advanced ceramic materials synthesis
  • Advanced Surface Polishing Techniques
  • High Entropy Alloys Studies
  • Boron and Carbon Nanomaterials Research
  • GaN-based semiconductor devices and materials
  • Semiconductor materials and devices
  • Plasma Diagnostics and Applications
  • Extraction and Separation Processes
  • Metal Extraction and Bioleaching
  • Advanced machining processes and optimization
  • Tunneling and Rock Mechanics
  • Fungal Biology and Applications
  • Welding Techniques and Residual Stresses
  • Catalytic Processes in Materials Science
  • Plant Pathogens and Fungal Diseases
  • Minerals Flotation and Separation Techniques
  • Tribology and Wear Analysis
  • Intermetallics and Advanced Alloy Properties
  • Integrated Circuits and Semiconductor Failure Analysis
  • Porphyrin and Phthalocyanine Chemistry
  • Injection Molding Process and Properties

North University of China
2025

Beihang University
2024

Dali University
2024

Linköping University
2020-2023

Guizhou University
2017-2023

Kunming University of Science and Technology
2020-2023

Yunnan Metallurgical Group (China)
2020

Changchun University of Technology
2019

Sichuan University
2012-2016

Chinese Academy of Sciences
2012-2015

10.1016/j.ijrmhm.2012.10.017 article EN International Journal of Refractory Metals and Hard Materials 2012-11-02

Growth temperature (Ts) and ion irradiation energy (Ei) are important factors that influence film growth as well their properties. In this study, we investigate the evolution of crystal structure residual stress TiNbCrAlHfN films under various Ts Ei conditions, where latter is mainly controlled by tuning flux sputtered Hf ions using bipolar high-power impulse magnetron (BP-HiPIMS). The results show exhibit typical FCC NaCl-type structure. By increasing from room to 600 °C, texture changes...

10.1016/j.surfcoat.2023.129389 article EN cc-by Surface and Coatings Technology 2023-03-06

The catalytic performance of oxygen evolution reaction (OER) catalysts is influenced by their elemental composition. Aluminum (Al) offers abundant active sites due to its high oxidation affinity, which makes it unstable in both acidic and alkaline environments. We used the gas atomization method (GAM) prepare aluminum-containing single-phase high-entropy alloy AlxCoCrFeNi2.1 (x = 0, 0.1, 0.3, 0.5, 1). Besides, changing aluminum content HEAs can control particle size. GAM enable with...

10.1021/acsami.4c20528 article EN ACS Applied Materials & Interfaces 2025-03-13

Hydrogen can be easily produced from the catalytic hydrolysis of sodium borohydride (NaBH4), with metaborate (NaBO2) being co-product. If NaBO2 economically recycled in process, NaBH4 could considered as a promising hydrogen carrier fuel cells because its high content. In this paper, we report our investigation into synthesis via ball milling. The starting materials for were and magnesium hydride (MgH2). After milling at ambient temperature inert gas, oxide (MgO) produced. synthesized was...

10.1021/ef900619y article EN Energy & Fuels 2009-09-03

10.1007/s00170-019-03361-6 article EN The International Journal of Advanced Manufacturing Technology 2019-02-20

Abstract Bipolar high-power impulse magnetron sputtering (HiPIMS) is used to achieve ion acceleration for bombardment of dielectric thin films. This realized by increasing the plasma potential (Up), during interval in-between HiPIMS-pulses, using a positive reversed voltage (Urev). As long as film surface (Us) maintained low, close ground potential, this increase in Up results ion-acceleration ions approach surface. The effect Urev on demonstrated growth (Al,Cr)2O3 films two sets substrates,...

10.1016/j.surfcoat.2021.127152 article EN cc-by Surface and Coatings Technology 2021-04-09

Abstract The plasma potential at a typical substrate position is studied during the positive pulse of bipolar high-power impulse magnetron sputtering (bipolar HiPIMS) discharge with Cu target. goal study to identify suitable conditions for achieving ion acceleration independent on grounding. We find that time-evolution can be separated into several distinct phases, which are highly dependent conditions. This includes exploring influence working gas pressure (0.3–2 Pa), HiPIMS peak current...

10.1088/1361-6595/ac4b65 article EN cc-by Plasma Sources Science and Technology 2022-01-14

Molecular dynamics has been employed in this paper to investigate the nanoscale cutting process of single-crystal copper with a diamond tool. The behavior workpiece during material removal by studied. effects tool geometry including rake angle, clearance and edge radius are thoroughly investigated terms chips, dislocation movement, temperature distribution, temperature, force, friction coefficient. investigation showed that an appropriate positive angle ([Formula: see text]), suitable or...

10.1177/1350650119826448 article EN Proceedings of the Institution of Mechanical Engineers Part J Journal of Engineering Tribology 2019-01-29

Multicomponent TixNbCrAl nitride films were deposited on Si(100) substrates by reactive direct current magnetron sputtering (dcMS) and high power impulse (HiPIMS) in the absence of substrate heating bias. Three single Ti, Nb, Cr50Al50 targets either driven three dc or HiPIMS supplies. The Ti content was varied tuning applied to target. composition determined ion beam analysis. nitrogen is nearly stoichiometric (48–50 at.%) series, while dcMS are understoichiometric (39–45 at.%). crystal...

10.1016/j.surfcoat.2021.127743 article EN cc-by Surface and Coatings Technology 2021-09-30

Selective ion acceleration using a synchronized substrate bias is common way to tailor the microstructure and intrinsic stress of films grown by high-power impulse magnetron sputtering (HiPIMS), owing high degree sputtered metal ionization inherent time separation between different ionic species in fluxes at position. Here we show that it possible achieve selective with masses employing positive reversed pulse (Urev) on target itself, after end main HiPIMS pulse, i.e., bipolar (BP-HiPIMS),...

10.1016/j.surfcoat.2022.129153 article EN cc-by Surface and Coatings Technology 2022-12-17

10.1016/j.ijrmhm.2014.03.013 article EN International Journal of Refractory Metals and Hard Materials 2014-04-12
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