A5067612564- Metal and Thin Film Mechanics
- Diamond and Carbon-based Materials Research
- Iron oxide chemistry and applications
- Magnetic Properties and Synthesis of Ferrites
- High-Temperature Coating Behaviors
- Ion-surface interactions and analysis
- Plasma Diagnostics and Applications
- Minerals Flotation and Separation Techniques
- ZnO doping and properties
- Nanoparticle-Based Drug Delivery
- GaN-based semiconductor devices and materials
- Transition Metal Oxide Nanomaterials
- Magnetic properties of thin films
- Semiconductor materials and devices
- Metallic Glasses and Amorphous Alloys
- Characterization and Applications of Magnetic Nanoparticles
- Adhesion, Friction, and Surface Interactions
- Multiferroics and related materials
- Laser-induced spectroscopy and plasma
- Clay minerals and soil interactions
- Advanced Sensor Technologies Research
- Magnetic Properties and Applications
- Tribology and Wear Analysis
- Iron Metabolism and Disorders
- Advanced materials and composites
Jožef Stefan Institute
2015-2024
Polytechnique Montréal
2015-2017
Lawrence Berkeley National Laboratory
2012-2017
The paper summarizes current knowledge of growth defects in physical vapor deposition (PVD) coatings. A detailed historical overview is followed by a description the types and evolution defects. Growth are microscopic imperfections coating microstructure. They most commonly formed overgrowing topographical (pits, asperities) on substrate surface or foreign particles different origins (dust, debris, flakes). Such not only those that remain after wet cleaning procedure, but also ones generated...
Ion energy distribution functions measured for high power impulse magnetron sputtering show features, such as a broad peak at several 10 eV with an extended tail, well asymmetry respect to E×B, where E and B are the local electric magnetic field vectors, respectively. Here it is proposed that those features due formation of potential hump V in each traveling ionization zones. Potential associated negative-positive-negative space charge naturally forms zones driven by energetic drifting electrons.
Using movable emissive and floating probes, we determined the plasma potentials of an ionization zone (spoke) in a direct current magnetron sputtering discharge. Measurements were recorded space time resolved manner, which allowed us to make three-dimensional representation potential. From this information could derive related electric field, charge, spatial distribution electron heating. The data reveal existence strong fields parallel perpendicular target surface. largest E-fields result...
In this paper, we present a comparative study of tribological properties TiN coatings deposited by low-voltage electron beam evaporation, magnetron sputtering and cathodic arc deposition. The correlation behavior these with their intrinsic friction condition was studied. influence surface topography the surrounding atmosphere analyzed in more detail. We limited ourselves to investigation processes that take place initial phase sliding test (the first 1000 cycles). A significant difference...
Electron and ion fluxes from direct current high-power impulse magnetron sputtering (dcMS HiPIMS) plasmas were measured in the plane of target surface. Biased collector probes a particle energy mass analyzer showed asymmetric emission electrons singly doubly charged ions. For both HiPIMS dcMS discharges, higher all types particles observed direction electrons' E × B drift. These results are put context with ionization zones that drift over magnetron's racetrack. The currents time-resolving...
Non-homogeneous plasma distribution in the form of organized patterns called spokes was first observed high power impulse magnetron sputtering (HiPIMS). In present work we investigate spoke phenomenon non-pulsed low-current dc (DCMS). Using a high-speed camera were systematically studied with respect to discharge current, pressure, target material and magnetic field strength. Increase current and/or gas pressure resulted sequential formation two, then three more spokes. The reproducible for...
The primary objective of this study was to investigate and compare the surface topography hard coatings deposited by three different physical vapor deposition methods (PVD): low-voltage electron beam evaporation, unbalanced magnetron sputtering cathodic arc evaporation. In these systems, various ion etching techniques were applied for substrate cleaning. paper summarizes our experience expertise gained during many years development PVD protection tools machine components. Surface...
Total sputtering yield and spatial distributions of sputtered atoms are important for numerous deposition techniques. We performed SRIM (Stopping Range Ions in Matter) simulations to analyze the total angular distribution a range single-element target materials. The were conducted normal argon ion incidence 300–1200 eV at an oblique angle selected energies. examined differential yields transition metals periods 4–6 groups (Ti, V, Cr; Zr, Nb, Mo; Hf, Ta, W) group 11 (Cu, Ag, Au) periodic...