L. Imhoff

ORCID: 0000-0003-1115-5342
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About
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Research Areas
  • Semiconductor materials and devices
  • Metal and Thin Film Mechanics
  • ZnO doping and properties
  • Electronic and Structural Properties of Oxides
  • Catalytic Processes in Materials Science
  • Diamond and Carbon-based Materials Research
  • GaN-based semiconductor devices and materials
  • Quantum Dots Synthesis And Properties
  • Copper-based nanomaterials and applications
  • Copper Interconnects and Reliability
  • Advanced materials and composites
  • Electron and X-Ray Spectroscopy Techniques
  • Photonic Crystals and Applications
  • TiO2 Photocatalysis and Solar Cells
  • Gas Sensing Nanomaterials and Sensors
  • Anodic Oxide Films and Nanostructures
  • High-Temperature Coating Behaviors
  • MXene and MAX Phase Materials
  • Additive Manufacturing and 3D Printing Technologies
  • Advanced Photocatalysis Techniques
  • Transition Metal Oxide Nanomaterials
  • Advanced ceramic materials synthesis
  • Gold and Silver Nanoparticles Synthesis and Applications
  • Optical Coatings and Gratings
  • Ga2O3 and related materials

Université de Bourgogne
2009-2024

Laboratoire Interdisciplinaire Carnot de Bourgogne
2012-2024

Centre National de la Recherche Scientifique
2007-2020

Laboratoire de Réactivité et Chimie des Solides
2000-2006

École nationale supérieure d'arts et métiers
1996-1999

École Nationale Supérieure d'Architecture Montpellier
1998

École Normale Supérieure - PSL
1997

Abstract Thin films of TiN x O y were deposited by d.c. magnetron sputtering on glass substrates using an (Ar + ,N 2 ) plasma and Ti target. The N partial pressure was changed from 2.3 × 10 −4 mbar to 4.6 −3 in order obtain with increasing nitrogen contents. X‐ray photoelectron spectroscopy used determine the as‐deposited composition. presence oxygen, which is probably due contamination residual atmosphere vacuum chamber, always detected, both surface layers bulk films, confirming formation...

10.1002/sia.1423 article EN Surface and Interface Analysis 2002-06-19

Titanium oxynitride (TiNxOy) thin films were deposited by low-pressure metal–organic CVD (LP-MOCVD) on (100) silicon, sapphire, and polycrystalline alumina substrates. isopropoxide (TIP) ammonia used as precursors. The influence of the growth temperature, ranking from 450 °C to 750 °C, was investigated scanning electron microscopy (SEM), electrical DC measurements. Rutherford back-scattering (RBS) measurements determine N/O ratio in films. surface observations showed two morphological...

10.1002/(sici)1521-3862(200006)6:3<109::aid-cvde109>3.0.co;2-4 article EN Chemical Vapor Deposition 2000-06-01

Abstract Nowadays, almost all the cutting tools in metal machining are protected with a surface treatment. Nevertheless, this is not case wood where no protected, except by thermal treatments, and so they present previous wear because of use steel or carbide materials milling, sawing, routing, etc. During these processes, particularly exposed to abrasive shock wear. To enhance their resistance, one solution protect them hard coatings. The study deals development ternary systems (CrAlN CrSiN)...

10.1002/ppap.200930407 article EN Plasma Processes and Polymers 2009-06-01
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