A5045184899- Plasma Diagnostics and Applications
- Metal and Thin Film Mechanics
- Plasma Applications and Diagnostics
- Pulsed Power Technology Applications
- Vacuum and Plasma Arcs
- Semiconductor materials and devices
- Laser Design and Applications
- Diamond and Carbon-based Materials Research
- Ion-surface interactions and analysis
- Electron and X-Ray Spectroscopy Techniques
- Laser-induced spectroscopy and plasma
- Gyrotron and Vacuum Electronics Research
- Electrohydrodynamics and Fluid Dynamics
- Advanced Sensor Technologies Research
- High-Temperature Coating Behaviors
- Material Properties and Applications
- Advanced ceramic materials synthesis
- Laser-Plasma Interactions and Diagnostics
- Particle accelerators and beam dynamics
- Boron and Carbon Nanomaterials Research
- Electrostatic Discharge in Electronics
- Copper Interconnects and Reliability
- Integrated Circuits and Semiconductor Failure Analysis
- Engineering and Environmental Studies
- Silicon Carbide Semiconductor Technologies
Tomsk State University of Control Systems and Radio-Electronics
2014-2023
Institute of High Current Electronics
2018
National Research Tomsk State University
2004
Abstract This paper presents a review of physical principles, design, and performances plasma-cathode direct current (dc) electron beam guns operated in so called fore-vacuum pressure (1–15 Pa). That operation range was not reached before for any kind sources. A number unique parameters the e-beam were obtained, such as energy (up to 25 kV), dc 0.5 A), total power 7 kW). For generation at these relatively high pressures, following special features are important: probability electrical...
In the irradiation of an insulated target by electron beam produced a plasma-cathode source operating in fore-vacuum pressure range (5–15 Pa), potential is much lower than energy, offering possibility direct treatment insulating materials. It found that non-conducting moderately high range, charge on surface neutralized mainly ions from volume discharge established between negatively charged and grounded walls vacuum chamber. This allows (heating, melting, welding) ceramics other semiconductor
The results of measuring the electrical, mechanical and optical properties silicon-carbon films obtained by electron beam evaporation silicon carbide in an argon-oxygen gas mixture pressure range 3 – 5 Pa are presented. was generated a fore-vacuum plasma source. It is shown that with increase oxygen content gas, resistivity increases, hardness decreases band gap raises. Measurements composition analysis IR transmission spectra indicate replacement bonds silicon-oxygen as gaseous medium...
We describe our experimental investigation of the effect background gas pressure on emission parameters a pulsed cathodic-arc-based forevacuum-pressure plasma-cathode electron source. find that increased over range 4–16 Pa significantly reduces beam current rise-time and increases amplitude. For example, at discharge 20 A, increasing working from 4 to 16 8 A 18 shortens 50 μs μs. This influence can be explained by arc switching anode emission. In case, is caused pressure. forevacuum range,...
We describe a system for the generation of spatially uniform and homogeneous dense plasma in dielectric flask using forevacuum-pressure plasma-cathode electron beam source. At optimum energy gas pressure, non-uniformity density distribution along length is less than 10%, temperature are greater produced vacuum chamber with no flask. The measured parameters compared to predictions model based on balance equations.
The work demonstrated the sintering of zirconium dioxide ceramics by means an electron beam produced a plasma-cathode e-beam source operating at fore-vacuum pressure. sintered consist tetragonal-modified with grain size from 0.7 to 10 micrometers, depending on conditions. At constant temperature, density material and its depend integrated energy injected into beam.
This article reports on design and application of wide-aperture pulsed beam source, based hollow cathode discharge. The source is intended for electron generation in pressure range 2–15 Pa. Multi-aperture extraction system, used a provided cross-section uniformity 10% diameter 40 mm. limiting values the current density, pulse duration, accelerating voltage are 350 mA/cm2, 250 μs, 10 kV, respectively. These parameters sufficient surface modification various materials, including non-conducting matters.
The paper presents the results of experimental research and numerical simulation, demonstrating a considerable influence secondary electrons on parameters beam-produced plasma generated at pressure range 1–13 Pa by injection continuous (with current tens mA) electron beam into dielectric (quartz) flask. An was formed fore-vacuum plasma-cathode source based hollow cathode discharge. were emitted as result high-energy (3–8 keV) bombardment mainly bottom end These provide an additional...
This paper is devoted to the engineering embodiment of modern methods for producing charged ion and electron beams by extracting them from plasma a discharge. Electron use execute electron-beam welding, annealing, surface heating materials realize plasmochemical reactions stimulated fast electrons. Ion allow realization technologies implantation or ion-assisted deposition coatings thereby opening new prospects creation compounds alloys method that makes it possible obtain desired parameters...
We describe our experimental research on the stable generation of large-radius pulsed high-current electron beams using a forevacuum-pressure plasma-cathode beam source with cathodic arc plasma generation. find that increased gas pressure and use higher ionization cross-section considerably decrease emission current due to loss electric strength acceleration gap (breakdown). Increased pulse duration results in current, but influence species its remains for all durations. There is an extremum...