A5011776410- Block Copolymer Self-Assembly
- Advancements in Photolithography Techniques
- Auditing, Earnings Management, Governance
- Corporate Finance and Governance
- Polymer Surface Interaction Studies
- Advanced Polymer Synthesis and Characterization
- Nanofabrication and Lithography Techniques
- Banking stability, regulation, efficiency
- Financial Markets and Investment Strategies
- Integrated Circuits and Semiconductor Failure Analysis
- Anodic Oxide Films and Nanostructures
- Semiconductor materials and devices
- Machine Learning in Materials Science
- Insurance and Financial Risk Management
- Financial Reporting and Valuation Research
- Optical Coatings and Gratings
- Modular Robots and Swarm Intelligence
- Electronic Packaging and Soldering Technologies
- Advanced Materials and Mechanics
- Housing Market and Economics
- Adhesion, Friction, and Surface Interactions
- Gold and Silver Nanoparticles Synthesis and Applications
- Rheology and Fluid Dynamics Studies
- Genetic diversity and population structure
- Advancements in Semiconductor Devices and Circuit Design
National Taiwan University
2008-2024
University of Chicago
2016-2022
National Defense Medical Center
2022
Tri-Service General Hospital
2022
IBM Research - Thomas J. Watson Research Center
2015-2020
IBM (United States)
2012-2020
IBM Research - Austin
2017-2020
Shih Hsin University
2020
Albany Molecular Research (United States)
2016
National Chengchi University
1995-2016
Self-assembling block copolymers are of interest for nanomanufacturing due to the ability realize sub-100 nm dimensions, thermodynamic control over size and uniformity density features, inexpensive processing. The insertion point these materials in production integrated circuits, however, is often conceptualized short term niche applications using dense periodic arrays spots or lines that characterize bulk copolymer morphologies, long device layouts completely redesigned into arrays. Here we...
Lamellae-forming polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) films, with bulk period L0, were directed to assemble on lithographically nanopatterned surfaces. The chemical pattern was comprised of "guiding" stripes cross-linked polystyrene (X-PS) or poly(methyl (X-PMMA) mats, width W, and interspatial "background" regions a random copolymer brush styrene methyl methacrylate (P(S-r-MMA)). fraction (f) in the varied control chemistry background regions. Ls. After assembly, density...
We investigate how banks' loan portfolio composition affects the timeliness of loss provisions and, thus, relation between security returns and such provisions. maintain that relative to other information about default decreases as discretion over increases, varies by type. Bank managers have more for large frequently renegotiated loans, e.g., foreign commercial than small or infrequently consumer loans. Large size possibility renegotiation provide rationales banks losses on a loan-by-loan...
We report the induction of perpendicularly oriented cylindrical domains in PS-b-PMMA block copolymer (BCP) films thicker than 100 nm by thermally annealing on a substrate modified with random copolymer. The effects temperature, composition substrate-modifying copolymer, and BCP film thickness morphology PMMA cylinder forming were studied. For nm, fabrication perpendicular cylinders is highly dependent both temperature as these two parameters control interactions free surface, respectively....
Chemically patterned surfaces comprised of polymer mats and brushes well-defined chemistry were fabricated at the length scale 10 nm. A key concept is integration new materials, cross-linked mats, with traditional lithographic processing. Resist was on top polystyrene mats. After etching, regions remaining mat dimensions ranging from to 35 nm separated by interspatial openings underlying substrate. End-grafted brushes, in this case hydroxyl-terminated poly(2-vinylpyridine) or...
Directed self-assembly (DSA) of lamellar phase block-co-polymers (BCPs) can be used to form nanoscale line-space patterns. However, exploiting the potential this process for circuit relevant patterning continues a major challenge. In work, we propose way impart two-dimensional pattern information in graphoepitaxy-based DSA processes by utilizing interactions BCP with template pattern. The image formation mechanism is explained through use Monte Carlo simulations. Circuit patterns consisting...
The island of Sardinia has been particular interest to geneticists for decades. current model Sardinia's genetic history describes the as harboring a founder population that was established largely from Neolithic peoples southern Europe and remained isolated later Bronze Age expansions on mainland. To evaluate this model, we generate genome-wide ancient DNA data 70 individuals 21 Sardinian archaeological sites spanning Middle through Medieval period. earliest show strong affinity western...
Abstract Present-day Tibetans have adapted both genetically and culturally to the high altitude environment of Tibetan Plateau, but fundamental questions about their origins remain unanswered. Recent archaeological genetic research suggests presence an early population on Plateau within past 40 thousand years, followed by arrival subsequent groups 10 years. Here, we obtain new genome-wide data for 33 ancient individuals from elevation sites southern fringe in Nepal, who show are most closely...
ABSTRACT: We hypothesize and provide evidence that characteristics of banks’ loan securitizations accounted for as sales determine the extent to which banks retain risks securitized loans. show more risk when: (1) types loans have higher and/or less externally verifiable credit risk, (2) are closed-ended larger contractual interests in loans, (3) strongly concentrate magnitude type retained not risk-relevant revolving securitizations, because incentive ability implicit recourse, a...
As information technology demands for larger capability in data storage continue, ultrahigh bit density memory devices have been extensively investigated. To produce an device, multilevel cell operations that require several states one proposed as solution, which can also alleviate the scaling issues current state-of-the-art complementary metal oxide semiconductor technology. Here, we report first demonstration of nanodot using a self-assembled block copolymer lift-off. This with simple low...
Random copolymer brushes of poly(styrene-r-methyl methacrylate) (PS-r-PMMA) have previously been used to control the wetting behavior poly(styrene-b-methyl (PS-b-PMMA) block copolymer. Here we demonstrate that use random may be generalized other systems. A series poly(styrene-r-2-vinylpyridine-r-hydroxyethyl (PS-r-P2VP-r-PHEMA) copolymers was synthesized and evaluated as brush layers orientation domains in thin films poly(styrene-b-2-vinylpyridine) (PS-b-P2VP) On nonpreferential brushes,...
ABSTRACT Genes encoding vanillin dehydrogenase ( vdh ) and vanillate O -demethylase vanAB were identified in Rhodococcus jostii RHA1 using gene disruption enzyme activities. During growth on or vanillate, vanA was highly upregulated while not. This study contributes to our understanding of lignin degradation by other actinomycetes.
The domain orientation and grain sizes in cylinder-forming poly(styrene-b-methyl methacrylate) (PS-b-PMMA) films were systematically investigated as a function of film thickness (32–640 nm), annealing temperature (190–230 °C), wetting behavior PS-b-PMMA on substrates. at the surface depended well both polymer–substrate polymer−free boundary conditions. In thin (thickness L < 3L0, where L0 is period block copolymer), condition dominated determined copolymer. At intermediate thicknesses (3L0...
Weakly preferential substrates were utilized in a single step process to direct the assembly of symmetric PS-b-PMMA. The thickness dependence domain orientation on weakly was exploited dictate lateral ordering perpendicular lamellae. Detailed facts importance specialist readers are published as "Supporting Information". Such documents peer-reviewed, but not copy-edited or typeset. They made available submitted by authors. Please note: publisher is responsible for content functionality any...
Polystyrene-block-poly(methyl methacrylate), (PS-b-PMMA) diblock copolymer is a promising lithography alternative for nanometer scale features. The two components segregate into nanoscale domains when the polymer solution spun on to form thin film and annealed above glass transition temperatures of both components. Preferential removal PMMA through plasma etching leave behind PS mask subsequent underlying layers focus this work. quality characterized by thickness lateral dimension structures...
Self-assembling sphere-forming block copolymers that normally adopt a hexagonal packing in thin films were directed to assemble on chemically patterned surfaces into their three-dimensional bulk-like body-centered cubic morphology; two-dimensional manufacturing-relevant patterns with square and rectangular symmetry could be derived from the using molecular transfer printing at resolution beyond limits of current lithographic tools materials. Detailed facts importance specialist readers are...
Soft lithographic techniques augment or enhance the capabilities of traditional patterning processes and expand diversity materials that can be patterned. Realization robust parallel for creating chemical patterns at nanoscale has been challenging. Here we present a method replicating uses functionalized homopolymer inks are preferentially segregated into nanodomains phase-separated diblock copolymer films. The transferred by reaction to substrates brought contact with block films, on...
This study modifies the authors’ previously reported directed self-assembly (DSA) process of polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) in order to meet throughput and material-related requirements a semiconductor manufacturing environment. It is demonstrated that all bottleneck steps DSA process, including deposition cross-linkable mat brush layer, can be done minutes on hot plate an N2 atmosphere, which simulates processing environment lithography track module. A 25-nm-pitch...
Domestic and foreign tourism marketing has adopted micro-movies as a new information communication media in recent years. A micro-movie compiles the story content to include scenic spots characteristics of travel destinations, thus enabling viewers resonate with leading characters plots when watching micro-movie. Therefore, this study investigates analyzes whether empathy persuasion developed by them will affect their attitude response destinations further induce willingness.
Population structure is a commonplace feature of genetic variation data, and it has importance in numerous application areas, including evolutionary genetics, conservation human genetics. Understanding the sample necessary before more sophisticated analyses are undertaken. Here we provide protocol for running principal component analysis (PCA) admixture proportion inference-two most commonly used approaches describing population structure. Along with hands-on examples CEPH-Human Genome...
Self-assembly block copolymers have drawn a lot of attention for its great potential on critical dimension (CD) control and line-edge roughness (LER) reduction, which become more crucial as the CD transistors is only tens nanometers nowadays. In this study, lamellar-forming poly(styrene-b-methyl methacrylate) copolymer fabricates line patterns was chosen ability to provide higher aspect ratio vertical sidewall profile in template stage, thus suitable following etching process substrate. A...
An integration scheme of block copolymer directed assembly with 193 nm immersion lithography is presented. It experimentally shown that a thin silicon nitride film can be used as an antireflective coating (ARC). With such ARC, (BCP) to triple the feature density chemical pattern was demonstrated. A high quality obtained over large area, and transfer feasibility illustrated. The multiplication via BCP provided comparable existing double patterning techniques, suggesting process could...