Han Gardeniers

ORCID: 0000-0003-0581-2668
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About
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Research Areas
  • Microfluidic and Capillary Electrophoresis Applications
  • Innovative Microfluidic and Catalytic Techniques Innovation
  • Microfluidic and Bio-sensing Technologies
  • Analytical Chemistry and Chromatography
  • Catalytic Processes in Materials Science
  • Nanowire Synthesis and Applications
  • Advanced MEMS and NEMS Technologies
  • Analytical Chemistry and Sensors
  • Electrowetting and Microfluidic Technologies
  • Silicon Nanostructures and Photoluminescence
  • Gas Sensing Nanomaterials and Sensors
  • Nanofabrication and Lithography Techniques
  • Nanopore and Nanochannel Transport Studies
  • Electrohydrodynamics and Fluid Dynamics
  • Advanced Surface Polishing Techniques
  • Semiconductor materials and devices
  • Plasma Applications and Diagnostics
  • 3D IC and TSV technologies
  • Electrocatalysts for Energy Conversion
  • Electrochemical Analysis and Applications
  • Ultrasound and Cavitation Phenomena
  • Acoustic Wave Resonator Technologies
  • Fuel Cells and Related Materials
  • Thin-Film Transistor Technologies
  • Silicon and Solar Cell Technologies

University of Twente
2016-2025

Tecnológico de Monterrey
2023

Chan Heart Rhythm Institute
2021

Institute of Nanotechnology
2009-2018

Saxion University of Applied Sciences
2016

KU Leuven
2007-2013

Vrije Universiteit Brussel
2006-2010

Japan External Trade Organization
2010

Lawrence Berkeley National Laboratory
2010

Radboud University Nijmegen
1988-2009

This article is a brief review of dry etching as applied to pattern transfer, primarily in silicon technology. It focuses on concepts and topics for materials interest micromechanics. The basis plasma-assisted etching, the main technique, explained plasma system configurations are described such reactive ion (RIE). An important feature RIE its ability achieve etch directionality. mechanism behind this directionality various chemistries fulfil task will be explained. Multi-step found useful...

10.1088/0960-1317/6/1/002 article EN Journal of Micromechanics and Microengineering 1996-03-01

This paper presents a novel process for the fabrication of out-of-plane hollow microneedles in silicon. The method consists sequence deep-reactive ion etching (DRIE), anisotropic wet and conformal thin film deposition, allows needle shapes with different, lithography-defined tip curvature. In this study, length needles varied between 150 350 micrometers. widest dimension at its base was 250 μm. Preliminary application tests arrays show that they are robust permit skin penetration without...

10.1109/jmems.2003.820293 article EN Journal of Microelectromechanical Systems 2003-12-01

When a droplet impacts upon surface heated above the liquid's boiling point, either comes into contact with and boils immediately (contact boiling), or is supported by developing vapor layer bounces back (film boiling, Leidenfrost state). We study transition between these characteristic behaviors how it affected parameters such as impact velocity, temperature, controlled roughness (i.e., micro-structures fabricated on silicon surfaces). In film regime, we show that residence time of droplets...

10.1039/c3sm27643k article EN Soft Matter 2013-01-01

Thin films of ZnO have been deposited on glass and silicon substrates by the pulsed laser deposition technique employing a KrF (λ=248 nm). The influence parameters, such as substrate temperature, oxygen pressure, fluence properties grown films, has studied. All over rather wide range conditions were found to be optically transparent, electrically conductive, c-axis oriented, with full width at half-maximum (FWHM) (002) x-ray reflection line being very often less than 0.25°. Under optimized...

10.1063/1.112478 article EN Applied Physics Letters 1994-12-05

This paper presents guidelines for the deep reactive ion etching (DRIE) of silicon MEMS structures, employing SF/sub 6//O/sub 2/-based high-density plasmas at cryogenic temperatures. Procedures how to tune equipment optimal results with respect etch rate and profile control are described. Profile is a delicate balance between respective deposition rates SiO/sub x/F/sub y/ passivation layer on sidewalls bottom an etched structure in relation removal from unpassivated areas. Any parameter that...

10.1109/jmems.2002.800928 article EN Journal of Microelectromechanical Systems 2002-08-01

Thin ZnO films were deposited on various types of substrates with rf magnetron reactive sputtering a Zn target in pure O2 atmosphere. The layers characterized by x-ray diffraction and electrical measurements. piezoelectric strain constant d31 the was determined via optical interferometric measurements piezoelectrically forced vibration silicon cantilevers. Because high resistivity samples (higher than 109 Ω cm), excitation down to frequencies 100 Hz found be feasible. relation between c-axis...

10.1063/1.367959 article EN Journal of Applied Physics 1998-06-15

Building upon the micromachined column idea proposed by group of Regnier in 1998, we report on first high-resolution reversed-phase separations pillar array columns under pressure-driven LC conditions. A three component mixture could be separated 3 s using arrays nonporous silicon pillars with a diameter approximately 4.3 microm and an external porosity 55%. Under slightly retained conditions (retention factor k' = 0.65-1.2), plate heights about H 4 were obtained at mobile phase velocity...

10.1021/ac070352p article EN Analytical Chemistry 2007-06-21

Valorisation of humin by-products: the chemical structure and evolution as well reactivity in dry reforming.

10.1039/c4gc01324g article EN Green Chemistry 2014-10-17

A microfluidic high-resolution NMR flow probe based on a novel stripline detector chip is demonstrated. This tool invaluable for the in situ monitoring of reactions performed microreactors. As an example, acetylation benzyl alcohol with acetyl chloride was monitored. Because uncompromised (sub-Hz) resolution, this holds great promise metabolomics studies, as shown by analysis 600 nL human cerebrospinal fluid.

10.1021/ja900389x article EN Journal of the American Chemical Society 2009-03-25

Evaporation-driven particle self-assembly can be used to generate three-dimensional microstructures. We present a unique method create colloidal microstructures in which we control the amount of particles and their packing fraction. To this end, evaporate dispersion droplets on special type superhydrophobic microstructured surface, droplet remains Cassie–Baxter state during entire evaporative process. The remainders consist massive spherical cluster microspheres, with diameters ranging from...

10.1073/pnas.1209553109 article EN Proceedings of the National Academy of Sciences 2012-09-24

Microfluidics enable the manipulation of chemical reactions using very small amounts fluid, in channels with dimensions tens to hundreds micrometers; so-called microstructured devices, from which iconic image chips emerges. The immediate attraction microfluidics lies its greenness: use quantities reagents and solvents, hence less waste, a precise control reaction conditions, integration functionality for process intensification, safer often faster protocols, reliable scale-up, possibility...

10.1039/c2cc33920j article EN Chemical Communications 2012-01-01

Abstract The extraction and recovery efficiency of swabs used to collect evidence at crime scenes is relatively low (typically <50%) for bacterial spores body fluids. Cell‐free deoxyribonucleic acid ( DNA ) an interesting alternative compared whole cells as a source forensic analysis, but from has not been tested before using pure . In this study cotton, foam, nylon flocked, polyester rayon are investigated in order isolated saliva samples. morphology absorption capacity studied....

10.1111/1556-4029.13837 article EN cc-by-nc-nd Journal of Forensic Sciences 2018-06-11

A new method for the fabrication of micro structures fluidic applications, such as channels, cavities, and connector holes in bulk silicon wafers, called buried channel technology (BCT), is presented this paper. The are constructed by trench etching, coating sidewalls trench, removal at bottom etching into substrate. can be sealed deposition a suitable layer that closes trench. BCT process used to fabricate complete channels single wafer with only one lithographic mask processing on side...

10.1109/84.825783 article EN Journal of Microelectromechanical Systems 2000-03-01

A microfluidic chip with an integrated planar microcoil was developed for Nuclear Magnetic Resonance (NMR) spectroscopy on samples volumes of less than a microliter. Real-time monitoring imine formation from benzaldehyde and aniline in the microreactor by NMR demonstrated. The reaction times can be set 30 min down to ca. 2 s, latter being mixing time chip. Design rules will described optimize detection coil order deal inherent sensitivity minimize magnetic field inhomogeneities obtain...

10.1039/b414832k article EN Lab on a Chip 2005-01-01

A systematic investigation of the influence process parameters temperature, pressure, total gas flow, and SiH2Cl2:NH3 flow ratio on residual stress, refractive index, its nonuniformity across a wafer, growth rate, film thickness Si/N incorporation low pressure chemical vapor deposition SixNy films has been performed. As tool for complete characterization property-deposition parameter relations, full factorial experimental design was used to determine dominant their interactions. From this...

10.1116/1.580239 article EN Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 1996-09-01

A theory is presented which describes the initial direct wafer bonding process. The effect of surface microroughness on bondability studied basis contact and adhesion elastic solids. An effective energy, maximum specific energy adhesion, proposed to describe real binding interface, including influence microroughness. Both area between rough surfaces depend a dimensionless parameter, θ. Using parameter as measure, three kinds interfaces can be identified with respect their bondability; viz....

10.1063/1.369377 article EN Journal of Applied Physics 1999-05-15
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