A5073811961- Advanced X-ray Imaging Techniques
- X-ray Spectroscopy and Fluorescence Analysis
- Optical Coatings and Gratings
- Metal and Thin Film Mechanics
- Advanced Surface Polishing Techniques
- Diamond and Carbon-based Materials Research
- Ion-surface interactions and analysis
- Crystallography and Radiation Phenomena
- Optical Systems and Laser Technology
- Semiconductor materials and interfaces
- Advancements in Photolithography Techniques
- Surface Roughness and Optical Measurements
- Magnetic properties of thin films
- Electron and X-Ray Spectroscopy Techniques
- Advanced Electron Microscopy Techniques and Applications
- Thin-Film Transistor Technologies
- Boron and Carbon Nanomaterials Research
- Optical measurement and interference techniques
- Advanced Measurement and Metrology Techniques
- Semiconductor materials and devices
- Integrated Circuits and Semiconductor Failure Analysis
- Magneto-Optical Properties and Applications
- Laser-Plasma Interactions and Diagnostics
- Adaptive optics and wavefront sensing
- Silicon Carbide Semiconductor Technologies
Tongji University
2015-2024
Shanghai Jiao Tong University
2023-2024
Institute of Precision Mechanics
2012-2022
Yangtze University
2020
Chinese Academy of Sciences
2019
Shanghai Institute of Microsystem and Information Technology
2019
University of Twente
2014-2017
Holst Centre (Netherlands)
2017
ISTEQ (Netherlands)
2017
Institute of Spectroscopy
2017
Extreme ultraviolet and soft X-ray (XUV) multilayer optics have experienced significant development over the past few years, particularly on controlling spectral characteristics of light for advanced applications like EUV photolithography, space observation, accelerator- or lab-based XUV experiments. Both planar three dimensional structures been developed to tailor response in a wide wavelength range. For optics, different layered schemes are explored. Stacks periodic multilayers capping...
Extreme ultraviolet lithography (EUVL) has been demonstrated to meet the industrial requirements of new-generation semiconductor fabrication. The development high-power EUV sources is a long-term critical challenge implementation EUVL in high-volume manufacturing (HVM), together with other technologies such as photoresist and mask. Historically, both theoretical studies experiments have clearly indicated that CO2 laser-produced plasma (LPP) system promising solution for source, able realize...
Al/Sc multilayers are potential optical elements to be used for the extreme ultraviolet range at wavelengths longer than Sc M2,3 absorption edge. The existing research exhibits a significant gap concerning incorporation of barrier layer within multilayer enhance interface quality. A series Al/Sc, Al/Sc/Mo, Al/Mo/Sc, and Al/Mo/Sc/Mo were fabricated by direct-current magnetron sputtering technique. Grazing incidence X-ray reflectivity, transmission electron microscopy, selected area...
For photon energies of 1 -5 keV, blazed gratings with multilayer coating are ideally suited for the suppression stray and higher orders light in grating monochromators.We developed characterized a 2000 lines/mm coated 20 period Cr/C-multilayer.The d-spacing 7.3 nm has been adapted to line distance 500 blaze angle 0.84° order provide highest efficiency energy range between 1.5 keV 3 keV.Efficiency as well reflectance witness which were simultaneously have measured.An 35% was measured at 2...
Abstract The possibility of obtaining edge states light that are robust against disorder by mimicking the topological properties a solid‐state system has brought profound impact on optical sciences. In short‐wavelength region, X‐ray science and technology is undergoing tremendous development. It requires high‐precision optics with exquisite control robustness structural perturbations. Therefore, it very attractive to extend concept manipulation regime. Herein, state theoretically proposed...
Abstract Gratings, one of the most important energy dispersive devices, are fundamental building blocks for majority optical and optoelectronic systems. The grating period is key parameter that limits dispersion resolution system. With rapid development large X-ray science facilities, gratings with periodicities below 50 nm in urgent need ultrahigh-resolution spectroscopy. However, wafer-scale fabrication nanogratings through conventional patterning methods difficult. Herein, we report a...
Two kinds of Al/Zr (Al(1%wtSi)/Zr and Al(Pure)/Zr) multilayers for extreme ultraviolet (EUV) optics were deposited on fluorine doped tin oxide coated glass by using direct-current magnetron sputtering technology. The comparison the two systems shows that Al(1%wtSi)/Zr have lowest interfacial roughness highest reflectivity. Based X-ray diffraction, performance is determined crystallization Al layer. To fully understand multilayer, we built up a two-layer model to fit situation AFM images,...
To develop the high reflectance mirror for short wavelength range of water window region (λ=2.42–2.73 nm), Cr/V multilayers with B4C barrier layers are studied. The grazing incidence x-ray reflectometry results show that multilayer interface widths significantly reduced down to 0.21–0.31 nm, after introduction 0.1 nm at both interfaces. [B4C/Cr/B4C/V] a large number bilayers N=300 maintains same small while surface roughness is only 0.2 nm. According transmission electron microscope...
The optimized design of multilayer-coated blazed gratings (MLBG) for high-flux tender X-ray monochromators was systematically studied by numerical simulations. resulting correlation between the multilayer d-spacing and grating blaze angle significantly deviated from one predicted conventional equations. Three high line density with different angles were fabricated coated same Cr/C multilayer. MLBG an optimal 1.0° showed a record efficiency reaching 60% at 3.1 keV 4.1 keV. measured...
Pd/Y multilayer mirrors operating in the soft X-ray region are characterized by a high theoretical reflectance, reaching 65% at normal incidence 8-12 nm wavelength range.However, severe intermixing of neighboring Pd and Y layers results an almost total disappearance interfaces inside structures fabricated direct current magnetron sputtering thus dramatic reflectivity decrease.Based on grazing reflectometry photoelectron spectroscopy, we demonstrate that stability can be essentially improved...
We present state-of-the-art high resolution transmission gratings, applicable for spectroscopy in the vacuum ultraviolet (VUV) and soft Xray (SRX) wavelength range, fabricated with a novel process using based nano imprint lithography (UV-NIL).Free-standing, highline-density gratings up to 10,000 lines per mm various space-toperiod ratios were fabricated.An optical characterization of was carried out range from 17 34 nm highharmonic generation capillary waveguide filled Ne, around 13.5 (from...
A universal analytical theory of soft x-ray multilayer gratings operating in the single-order regime is developed here. The regime, which an incident wave excites only diffracted wave, characterized by maximum possible diffraction efficiency tending to reflectivity a conventional mirror. applied analysis different gratings, including lamella sliced blazed and gratings. simple formula that describes arbitrary grating as function wavelength incidence angle deduced. Expressions for peak value...
B4C/Pd multilayers with small d-spacing can easily degrade in the air, and exact degradation process is not clear. In this work, we studied chemical modification of B4C films double layers stored four different environments: a dry nitrogen environment, atmosphere, oxygen-rich wet environment. The XANES spectra placed environment showed most significant decrease σ* states B–C bonds an increase π* B–O compared other samples. X-ray photoelectron spectroscopy (XPS) measurements samples more...
Chemical-mechanical polishing (CMP) is widely adopted as a key bridge between fine rotation grinding and ion beam figuring in super-smooth monocrystalline silicon mirror manufacturing. However, controlling mid- to short-spatial-period errors during CMP challenge owing the complex chemical-mechanical material removal process surface morphology formation. In this study, nature of chemical mechanical theoretically studied based on three-system elastic-plastic model wet etching behavior. The...
Abstract Delayed polymer gel systems have been the leading in-depth water conformance control agents in enhanced oil recovery applications. However, most had limitations to tolerance high temperature and salinity conditions. The objective of this work is develop a new delayed system that could form stable gels at 80-100 ℃ brines with up 200,000 mg/L gelation time more than 3 days. tests Acrylamide-ATBS copolymer crosslinking agent were performed anaerobic chambers around 90 various synthetic...
Abstract The measurement of X-ray continuous emission from laser-driven plasma was achieved through multiple monochromatic imaging utilizing a multilayer mirror array. This methodology exemplified by the development an eight-channel system, capable operating in energy range several keV with spatial resolution approximately 3 μm. By integrating this system streak camera, temperature and trajectory imploding capsules were successfully measured at kJ-class Shenguang III prototype laser...
Owing to the superior quality of interface, WC/SiC multilayers have been considered promising candidates for X-ray Laue lenses in nano-focusing facilities and supermirrors telescopes. To investigate microstructure evolution multilayers, a set periodic was prepared with varied WC layer thicknesses ranging from 1.0 nm 10.0 while keeping thickness SiC constant at 3.0 nm. These samples were characterized using various analytical techniques, including GIXR, AFM, XRD. An aperiodic multilayer...
V/Sc multilayer is experimentally demonstrated for the first time as a high reflectance mirror soft X-ray water window region. It primarily works at above Sc-L edge (λ = 3.11 nm) under near normal incidence while second peak appears V-L 2.42 grazing incidence. The fabricated with d-spacing of 1.59 nm and 30 bilayers has smaller interface width (σ 0.27 0.32 than conventional used Cr/Sc 0.28 0.47 nm). For bilayers, introduction B4C barrier layers little improvement on structure. As number...
Ru/B4C multilayer mirrors are used for hard X-ray monochromators with moderate spectral resolution and high integral flux. To overcome the problem of large compressive stress inherent in multilayers, a reactive sputtering technique using mixture working gas argon nitrogen different partial pressures was tested, fabricated multilayers had period 3 nm. The intrinsic essentially reduced after nitridation relaxed to zero value at approximately 15% pressure gas. Interface roughness slightly...