Tomoaki Nishimura

ORCID: 0000-0002-4555-2146
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About
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Research Areas
  • Semiconductor materials and devices
  • GaN-based semiconductor devices and materials
  • Ion-surface interactions and analysis
  • Electronic and Structural Properties of Oxides
  • Electron and X-Ray Spectroscopy Techniques
  • Silicon Carbide Semiconductor Technologies
  • Ga2O3 and related materials
  • X-ray Spectroscopy and Fluorescence Analysis
  • Diamond and Carbon-based Materials Research
  • Integrated Circuits and Semiconductor Failure Analysis
  • Graphene research and applications
  • Semiconductor Quantum Structures and Devices
  • Advancements in Semiconductor Devices and Circuit Design
  • ZnO doping and properties
  • Surface and Thin Film Phenomena
  • Catalytic Processes in Materials Science
  • Copper Interconnects and Reliability
  • Metal and Thin Film Mechanics
  • Semiconductor materials and interfaces
  • Photonic and Optical Devices
  • Advanced Chemical Physics Studies
  • Atomic and Molecular Physics
  • Advanced Semiconductor Detectors and Materials
  • Semiconductor Lasers and Optical Devices
  • Ferroelectric and Piezoelectric Materials

Hosei University
2016-2025

Kyoto Medical Center
2024

Kyoto Prefectural University of Medicine
2024

Saiseikai Shigaken Hospital
2022-2023

Kyushu Institute of Technology
2020

Osaka City University
2020

Helmholtz Institute Jena
2019

Australian National University
2013

Ritsumeikan University
1999-2009

Kagoshima University
2006-2008

We describe extracellular interactions between fibronectin (Fn) and vascular endothelial growth factor (VEGF) that influence integrin-growth receptor crosstalk cellular responses. In previous work, we found VEGF bound specifically to but not vitronectin or collagens. Herein report binds the heparin-II domain of Fn cell-binding VEGF-binding domains Fn, when physically linked, are necessary sufficient promote VEGF-induced cell proliferation, migration, Erk activation. Using recombinant...

10.1161/01.res.0000246849.17887.66 article EN Circulation Research 2006-09-29

Embryonic stem (ES) cell self-renewal and pluripotency are maintained by several signaling cascades expression of intrinsic factors, such as Oct3/4 Nanog. The activated extrinsic leukemia inhibitory factor, bone morphogenic protein, Wnt. However, the mechanism that regulates in ES cells is unknown. Heparan sulfate (HS) chains ubiquitously present surface proteoglycans known to play crucial roles regulating pathways. Here we investigated whether HS on involved pathways important for...

10.1074/jbc.m705621200 article EN cc-by Journal of Biological Chemistry 2007-11-18

Oligosaccharides are increasingly being recognized as important partners in receptor−ligand binding and cellular signaling. Surface plasmon resonance (SPR) is a very powerful tool for the real-time study of specific interactions between biological molecules. We report here an advanced method immobilization oligosaccharides clustered structures SPR their application to analysis heparin−protein interactions. Reductive amination reactions linker molecules were designed optimized. Using mono-,...

10.1021/bc0600620 article EN Bioconjugate Chemistry 2006-08-31

Abstract Atomic number ( Z 1 ) dependences of electronic stopping cross sections S e for channeling trajectories had been well explained low-velocity ions; however, this is not the case with random ). We modeled difference between effective atomic and that ones Z’ changing linearly actual . The proportionality constant k in Al, Ni, Ag 1.8×10 8 cm s −1 ions was found to depend little on target number. 4H-SiC 1.5×10 ions, other hand, located Si determined from 1.4×10 C 2.0×10 C.

10.35848/1347-4065/adbc78 article EN cc-by-nc-nd Japanese Journal of Applied Physics 2025-03-04

Nitric oxide postoxidation anneal results in a significant decrease of defect state density (Dit) near the conduction bandedge n-4H–SiC at oxide/(112̄0) 4H–SiC interface. Comparison with measurements on conventional (0001) Si-terminated face shows similar interface following passivation. Medium energy ion scattering provides quantitative measure nitrogen incorporation SiO2/SiC

10.1063/1.1651325 article EN Applied Physics Letters 2004-02-20

A nearly-ideal edge termination for GaN p–n junctions was designed and demonstrated using Mg-ions implanted field limiting rings (FLRs). The FLRs were fabricated via the ultra-high-pressure annealing process after implanting into etched n-type region outside main junction. results of technology computer-aided design simulation indicate that by optimizing space width rings, breakdown voltage (BV) can be increased over 90% ideal parallel plane BV (973 V). Accordingly, diodes exhibited low...

10.35848/1882-0786/ac0b09 article EN Applied Physics Express 2021-06-14

We report on the thermal decomposition of uncapped, ultrathin HfO2 films grown by chemical vapor deposition SiO2/Si(100) substrates. Medium energy ion scattering, x-ray photoelectron spectroscopy, scanning electron microscopy and atomic force were used to examine after they had been annealed in vacuum 900–1050 °C. Film is a strong function overlayer thickness at given temperature, but underlying SiO2 layer does not significantly affect stability film. Oxygen diffusion system was monitored...

10.1063/1.1578525 article EN Journal of Applied Physics 2003-06-30

10.1016/s0168-583x(99)00715-6 article EN Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms 2000-03-01

A new toroidal electrostatic analyzer (ESA) configuration for medium energy ion scattering has been designed and fabricated structural analysis of surfaces. The present a wide interelectrode distance 16 mm an range 10% the pass at constant applied voltage. is mounted horizontally on turntable accepts ions scattered within well defined angular range. To get good resolution, we employed photon-counting image acquisition system (PIAS: Hamamatsu Photonics) with spatial resolution 40–50 μm,...

10.1063/1.1148825 article EN Review of Scientific Instruments 1998-04-01

The oxidation kinetics for $\mathrm{Ni}(111)$ surface and the structure of oxide layers grown at room temperature were analyzed by high-resolution medium energy ion scattering using isotopically labeled $^{18}\mathrm{O}_{2}$. Initially, showed a reflection high electron diffraction (RHEED) pattern $\mathrm{Ni}(111)\text{\ensuremath{-}}(2\ifmmode\times\else\texttimes\fi{}2)\text{\ensuremath{-}}\mathrm{O}$ chemisorption an oxygen exposure few langmuir...

10.1103/physrevb.75.033413 article EN Physical Review B 2007-01-31

A normally-off GaN double-implanted vertical MOSFET (DMOSFET) with an atomic layer deposition (ALD)-Al₂O₃ gate dielectric film on a free-standing substrate fabricated by triple ion implantation is presented. The DMOSFET was formed Si implanted source regions in Mg p-type base N termination regions. maximum drain current of 115 mA/mm, transconductance 19 mS/mm at voltage 15 V, and threshold 3.6 V were obtained for the length 0.4 μm estimated surface concentration 5 × 1018 cm-3. difference...

10.3390/ma12050689 article EN Materials 2019-02-26

It is demonstrated that (NBCO) thin films, deposited by laser ablation, show extraordinary properties which are unprecedented in the 123 system. These include ease of oxidation, very high crystallinity, surface stability, and a relatively . The NBCO films compared with those best reported origins their differences discussed. implications NBCO's superior thin-film quality context device applications also addressed throughout paper.

10.1088/0953-2048/10/11/006 article EN Superconductor Science and Technology 1997-11-01

An experiment addressing electron capture (EC) decay of hydrogen-like $^{142}$Pm$^{60+}$ ions has been conducted at the experimental storage ring (ESR) GSI. The appears to be purely exponential and no modulations were observed. Decay times for about 9000 individual EC decays have measured by applying single-ion spectroscopy method. Both visually automatically analysed data can described a single with constants 0.0126(7) s$^{-1}$ automatic analysis 0.0141(7) manual analysis. If modulation...

10.1016/j.physletb.2019.134800 article EN cc-by Physics Letters B 2019-07-24

Abstract Ion implantation into p-type gallium nitride (GaN) to a depth of several microns for power devices is challenge because their activation disturbed by the damage caused implantation. To reduce this damage, channeled technique was applied implant magnesium (Mg) ions GaN (0001). Compared with random implantation, demonstrated and activate in >10 times deeper regions. Thus, indispensable deep Mg devices.

10.35848/1882-0786/ac039e article EN Applied Physics Express 2021-05-20

10.1016/s0168-583x(97)00819-7 article EN Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms 1998-03-01

We report great possibilities of ion implantation technology for applying to high-power GaN electron devices. demonstrated high-performance normally-off self-aligned metal gate MISFETs with Si reduce the contact resistances ohmic contacts and N device isolation. formed p-type in n-type using Mg observed p-n junction diode behavior on forward I-V characteristics EL measurements.

10.1149/06911.0105ecst article EN ECS Transactions 2015-09-21
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