K.-Y. Hsiang

ORCID: 0000-0002-4789-4668
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About
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Research Areas
  • Ferroelectric and Negative Capacitance Devices
  • Advanced Memory and Neural Computing
  • Semiconductor materials and devices
  • MXene and MAX Phase Materials
  • Ferroelectric and Piezoelectric Materials
  • Advancements in Semiconductor Devices and Circuit Design
  • Advanced Sensor and Energy Harvesting Materials
  • Acoustic Wave Resonator Technologies
  • GaN-based semiconductor devices and materials
  • Thermal properties of materials
  • Electronic and Structural Properties of Oxides
  • Silicon Carbide Semiconductor Technologies
  • Metallic Glasses and Amorphous Alloys
  • Diamond and Carbon-based Materials Research
  • ZnO doping and properties
  • Cardiac Structural Anomalies and Repair
  • Magnetic properties of thin films
  • Supercapacitor Materials and Fabrication
  • Advanced Fiber Optic Sensors
  • Thin-Film Transistor Technologies

National Yang Ming Chiao Tung University
2020-2025

National Taiwan University
2024-2025

National Taiwan Normal University
2020-2023

National Taiwan University of Science and Technology
2023

Industrial Technology Research Institute
2022

Electro Optical Systems (Germany)
2021

A double-HZO (HfZrO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> ) FeFET (ferroelectric FET) with nonidentical ferroelectric thicknesses is experimentally demonstrated as low |V xmlns:xlink="http://www.w3.org/1999/xlink">P/E</sub> | = 5 V, 2-bit endurance > 10 <sup xmlns:xlink="http://www.w3.org/1999/xlink">5</sup> cycles and retention xmlns:xlink="http://www.w3.org/1999/xlink">4</sup> s. Inserting an insulator to separate the layers...

10.1109/led.2021.3060589 article EN IEEE Electron Device Letters 2021-02-19

Atomic layer deposition (ALD)-based TiN electrode on ferroelectric HfZrO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> metal/ferroelectric/metal (MFM) capacitor and field-effect transistor (FeFET) is demonstrated experimentally with weight transfer, that is, <inline-formula xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\Delta {P}$ </tex-math></inline-formula> , per pulse analysis through consecutive...

10.1109/ted.2020.3017463 article EN IEEE Transactions on Electron Devices 2020-08-31

The fusion of volatile and nonvolatile memory within a complementary-dynamic random-access (C-DRAM) in one cell is proposed with antiferroelectric-like hafnium-zirconium oxide dual function characteristics DRAM storage class the hierarchy. Atomic-resolution spherical aberration-corrected scanning transmission electron microscopy employed to directly reveal insights phase evolution by utilizing diffractograms determine lattice parameters. Storage-data-transfer-cycling-recovery an alternating...

10.1021/acsami.4c14132 article EN cc-by ACS Applied Materials & Interfaces 2025-02-20

The bilayer-based Antiferroelectric Tunneling Junction (AFTJ) with ferroelectric (FE) HfZrO<sub>2</sub> (HZO) and dielectric (DE) Al<sub>2</sub>O<sub>3</sub> demonstrates a current ratio of <inline-formula> <tex-math notation="LaTeX">$&gt; 100\times $ </tex-math></inline-formula>, TER (tunneling electroresistance) 50\times multilevel states, 10^{4}$ </tex-math></inline-formula> sec retention, cycling endurance as high 10<sup>8</sup>. concept tunneling through DE in an antiferroelectric (AFE)...

10.1109/led.2021.3107940 article EN IEEE Electron Device Letters 2021-08-25

A plasma-based undoped-HfO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> FeFET (ferroelectric FET) with non-volatile memory characteristics is demonstrated. Modifying the O plasma period in plasma-enhanced atomic layer deposition (PE-ALD) an effective approach to enhance remnant polarization ( P xmlns:xlink="http://www.w3.org/1999/xlink">r</sub> ) up 2P = 25 μC/cm <sup xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> for MFM...

10.1109/led.2021.3092787 article EN IEEE Electron Device Letters 2021-06-28

After 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">11</sup> high endurance cycles with memory window (MW) =0.9 V is achieved for the 3D gate-all-around (GAA) nanosheet (NS) ferroelectric field-effect transistor (FeFET) based on double-HZO; aim to homogenize corner field and mitigate dead zones. The interlayer Al <inf xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> O xmlns:xlink="http://www.w3.org/1999/xlink">3</inf> or TiN in double-HZO...

10.1109/vlsitechnologyandcir46769.2022.9830345 article EN 2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) 2022-06-12

Opposite polarity cycling recovery (OPCR) is proposed to completely restore a fatigued antiferroelectric (AFE) capacitor back its initial state, thereby extending the endurance number of switching cycles for AFE-RAM. A comprehensive model exclusive AFE with unipolar revealed achieve unlimited endurance, and OPCR experimentally demonstrated accumulate <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math...

10.1109/ted.2023.3238364 article EN cc-by-nc-nd IEEE Transactions on Electron Devices 2023-01-30

Superlattice (SL) HfO <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> -ZrO with physical thickness of 5 nm and low phase fraction ratio 0.101:1 monoclinic-phase (m-phase) to orthorhombic-phase (o-phase) investigated by geometrical analysis (GPA) is demonstrated. The homogeneous congruous SL-HfZrO (HZO) sufficient ferroelectric-domain integrated as ferro-stack FeFETs for multibit NVM |V...

10.1109/iedm45625.2022.10019369 article EN 2022 International Electron Devices Meeting (IEDM) 2022-12-03

Asymmetric Field Cycling Recovery (AFCR) with a low E-field is proposed for the first time to extend endurance cycles of ferroelectric (FE) capacitor and experimentally demonstrated 200 periods accumulated 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">12</sup> switching cycles. Positive negative minor loops (AmL) AFCR achieve nondegradation complete restoration $\triangle 2 \mathrm{P}_{\mathrm{r}}$ toward prospect unlimited operation....

10.23919/vlsitechnologyandcir57934.2023.10185274 article EN 2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) 2023-06-11

In this work, we have conducted an NLS-based Monte-Carlo modeling and characterization for antiferroelectric/ferroelectric (AFE/FE) Hf <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">1-</inf> xmlns:xlink="http://www.w3.org/1999/xlink">x</inf> Zr O xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> (HZO). With the coexistence of orthorhombic-phase (FE) tetragonal-phase (AFE) grains crucial consideration back-switching field, our generalized NLS...

10.1109/iedm19574.2021.9720645 article EN 2021 IEEE International Electron Devices Meeting (IEDM) 2021-12-11

Endurance ~ 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">12</sup> cycling of ferroelectric (FE) and antiferroelectric (AFE) HfZrO2 (HZO) capacitors are achieved experimentally by adjusting the programming pulse width (t <inf xmlns:xlink="http://www.w3.org/1999/xlink">p</inf> ). The correlation between switching polarization (△P) fatigue behavior high endurance is discussed. For long t (= 1 µs), AFE exhibits excellent with >...

10.1109/irps48227.2022.9764533 article EN 2022 IEEE International Reliability Physics Symposium (IRPS) 2022-03-01

Opposite polarity cycling recovery (OPCR) is proposed for the first time to completely restore a fatigued antiferroelectric (AFE) capacitor back its initial state, thereby extending endurance number of switching cycles AFE-RAM. A comprehensive model exclusive AFE with unipolar revealed toward prospect unlimited endurance, and OPCR experimentally demonstrated be 5.6×10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">11</sup> cycles, while...

10.1109/iedm45625.2022.10019508 article EN 2022 International Electron Devices Meeting (IEDM) 2022-12-03

A plasma-based ferroelectric undoped HfO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">x</sub> capacitor is fabricated using plasma-enhanced atomic layer deposition (PE-ALD), and the multilevel characteristics of synaptic behavior are investigated. gradual phase transition in material confirmed by grazing incidence X-ray diffraction (GI-XRD) for different O xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> plasma periods. The...

10.1109/ted.2021.3052428 article EN IEEE Transactions on Electron Devices 2021-01-28

The 3D vertical ferroelectric tunneling junction (FTJ) of bilayer antiferroelectric (AFE) <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\mathrm {Hf}_{1-x}Zr_{x}\text{O}$ </tex-math></inline-formula> 2(HZO) and Al2O3 has been demonstrated for NAND-compatible feasibility. A bilayer-type FTJ is explored the designs dielectric interlayer 0 nm to 4 type, while current mechanism revealed. multilevel AFE-FTJ...

10.1109/led.2022.3204445 article EN IEEE Electron Device Letters 2022-09-05

Instability threshold voltage (VT) with retention loss of read-after-write is a critical issue fundamental physics for ferroelectric field effect transistors (FeFETs) scaling down under high-speed operation. The mechanisms including charge trapping and depolarization (Edep) are discovered related to surface potential coercive (EC). trapped can be effectively detrapped by opposite polarity stimulation validated technology computer-aided design modeling. In addition, the Edep revealed serious...

10.1063/5.0111592 article EN Applied Physics Letters 2022-12-19

A 1500x I <inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">LRS</inf> /I xmlns:xlink="http://www.w3.org/1999/xlink">HRS</inf> with a high cell current of ~100 nA/ (J = 83 A/cm <sup xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> ) is achieved by antiferroelectric (AFE) vertical ferroelectric tunnel junctions (V-FTJs) that demonstrates multilevel, self-rectifying rate > 1000x, and macro operation. The stackable 3 D architecture integrating...

10.23919/vlsitechnologyandcir57934.2023.10185163 article EN 2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) 2023-06-11

Ferroelectric (FE) Hf1-xZrxO2 is a potential candidate for emerging memory in artificial intelligence (AI) and neuromorphic computation due to its non-volatility data storage with natural bi-stable characteristics. This study experimentally characterizes demonstrates the FE antiferroelectric (AFE) material properties, which are modulated from doped Zr incorporated HfO2-system, diode-junction current operations. Unipolar operations on one of two hysteretic polarization branch loops mixed AFE...

10.3390/nano11102685 article EN cc-by Nanomaterials 2021-10-12

The classical memory device with cryogenic operation is in high demanded for quantum information processing. endurance of anti-ferroelectric (AFE) and ferroelectric (FE) <tex xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">$\text{Hf}_{1-\mathrm{x}}\text{Zr}_{\mathrm{x}}\mathrm{O}_{2}$</tex> capacitors investigated xmlns:xlink="http://www.w3.org/1999/xlink">$\sim 10^{10}$</tex> cycles (80 K). Moreover, the AFE capacitor exhibits a speed response ~ 80%...

10.1109/irps48203.2023.10118311 article EN 2022 IEEE International Reliability Physics Symposium (IRPS) 2023-03-01

An ultralow program/erase voltage ( |VP/E| = 4 V) is demonstrated by using an antiferroelectric-ferroelectric field-effect transistor (AFE-FE-FET) through a multipeak coercive E -field EC ) concept for four-level stable state with outstanding endurance (>105 cycles) and data retention (>104 s at 65 °C). The mixture of ferroelectric (FE) AFE domains can provide multistate storage zero bias multilevel cell (MLC) applications. HfZrO2 (HZO) AFE-FE assembles orthorhombic/tetragonal (o/t) phase...

10.1109/tuffc.2022.3165047 article EN IEEE Transactions on Ultrasonics Ferroelectrics and Frequency Control 2022-04-05

Experimental insights into a reverse switching charge for antiferroelectric (AFE) Hf <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.1</sub> Zr xmlns:xlink="http://www.w3.org/1999/xlink">0.9</sub> O xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> are validated by pulse measurement and capacitance–voltage (C-V). The difference between saturation polarization ( <inline-formula xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math...

10.1109/led.2022.3189669 article EN IEEE Electron Device Letters 2022-07-11

Asymmetric field cycling recovery (AFCR) with alternating opposite low <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${E}$ </tex-math></inline-formula> -field is proposed to restore a fatigued ferroelectric (FE) capacitor and experimentally demonstrated for up notation="LaTeX">$10^{{12}}$ switching cycles, thereby extending the endurance of FeRAM. Positive negative asymmetric minor loops (AmLs) AFCR...

10.1109/ted.2024.3364116 article EN IEEE Transactions on Electron Devices 2024-02-13

Since the analog-based energy-efficient accelerator for synapses is highly demanded in artificial intelligence (AI) era, homogeneous and coherence ferroelectric phase of HfZrO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> (HZO) by superlattice (SL) growth mode with double layers proposed this work. The experimental results demonstrate excellent linear alternating consecutive potentiation depression conductance (α...

10.1109/tmat.2024.3393431 article EN IEEE Transactions on Materials for Electron Devices 2024-01-01

10.7567/ssdm.2024.b-7-04 article EN Extended Abstracts of the 2020 International Conference on Solid State Devices and Materials 2024-09-04
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