Paul Mazarov

ORCID: 0000-0003-4401-8352
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Research Areas
  • Ion-surface interactions and analysis
  • Integrated Circuits and Semiconductor Failure Analysis
  • Diamond and Carbon-based Materials Research
  • Electron and X-Ray Spectroscopy Techniques
  • Advanced Electron Microscopy Techniques and Applications
  • Advanced Materials Characterization Techniques
  • Mass Spectrometry Techniques and Applications
  • Semiconductor materials and devices
  • Electrohydrodynamics and Fluid Dynamics
  • Nanowire Synthesis and Applications
  • Analytical chemistry methods development
  • Force Microscopy Techniques and Applications
  • Advancements in Photolithography Techniques
  • History and advancements in chemistry
  • Optical Coatings and Gratings
  • Gas Sensing Nanomaterials and Sensors
  • GaN-based semiconductor devices and materials
  • Catalytic Processes in Materials Science
  • Metal and Thin Film Mechanics
  • Quantum Dots Synthesis And Properties
  • Laser-induced spectroscopy and plasma
  • Analytical Chemistry and Sensors
  • Photonic and Optical Devices
  • Advanced Surface Polishing Techniques
  • Magnetic properties of thin films

Raith (Germany)
2014-2024

Konrad-Adenauer-Stiftung
2018-2022

Helmholtz-Zentrum Dresden-Rossendorf
2018-2022

University of Florida
2011

Ruhr University Bochum
2008-2010

University of Duisburg-Essen
2000-2006

The focused ion beam (FIB) is a powerful tool for fabrication, modification, and characterization of materials down to the nanoscale. Starting with gallium FIB, which was originally intended photomask repair in semiconductor industry, there are now many different types FIB that commercially available. These instruments use range species applied broadly science, physics, chemistry, biology, medicine, even archaeology. goal this roadmap provide an overview instrumentation, theory, techniques,...

10.1063/5.0162597 article EN cc-by Applied Physics Reviews 2023-12-01

The artificial creation of shallow nitrogen-vacancy (NV) centres in diamond with 25 nm lateral resolution is performed by collimated implantation low-energy nitrogen ions. electron spin associated to this defect the most promising qubit for a scalable quantum computer working at room temperature. Individual optical addressing two single separated only 16 demonstrated stimulated emission depletion (STED) microscopy. Detailed facts importance specialist readers are published as "Supporting...

10.1002/smll.201000902 article EN Small 2010-09-03

Today, Focused Ion Beam (FIB) processing is nearly exclusively based on gallium Liquid Metal Sources (LMIS). But, many applications in the μm- or nm range could benefit from ion species other than gallium: local implantation, beam mixing, synthesis, Lithography (IBL). Therefore, Alloy (LMAIS) represent a promising alternative to expand remarkable application fields for FIB. Especially, IBL process shows potential advantages over, e.g., electron lithography techniques: direct, resistless, and...

10.1063/1.4947095 article EN Applied Physics Reviews 2016-05-11

Abstract We have investigated the merits of fullerene cluster ions as projectiles in time‐of‐flight secondary neutral mass spectrometry (ToF‐SNMS) sputter depth profiling an Ni:Cr multilayer sample similar to corresponding NIST standard. It is shown that erosion under bombardment with C 60 + kinetic energies between 10 and 20 keV provides good resolution interface widths several nanometres. This maintained during complete removal stack a total thickness 500 nm. finding contrast case where...

10.1002/sia.1923 article EN Surface and Interface Analysis 2004-10-01

Views Icon Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Twitter Facebook Reddit LinkedIn Tools Reprints and Permissions Cite Search Site Citation Sven Bauerdick, Lars Bruchhaus, Paul Mazarov, Achim Nadzeyka, Ralf Jede, Joel Fridmann, Jason E. Sanabia, Brent Gila, Bill R. Appleton; Multispecies focused ion beam lithography system its applications. J. Vac. Sci. Technol. B 1 November 2013; 31 (6): 06F404. https://doi.org/10.1116/1.4824327 Download citation...

10.1116/1.4824327 article EN Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena 2013-10-04

In this article, the authors review, compare, and discuss characteristics applicative potential of a variety nongallium ion liquid metal sources they have developed successfully applied to nanopatterning. These allow generating on-demand beams are promising for extending focused applications. They detail operating such capable emit projectiles ranging from atomic ions with different charge states polyatomic large clusters having sizes up few nanometers. highlight their interest relevance...

10.1116/1.5047150 article EN Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena 2018-10-12

While the application of focused ion beam (FIB) techniques has become a well-established technique in research and development for patterning prototyping on nanometer scale, there is still large underused potential with respect to usage species other than gallium. Light ions range m = 1–28 u (hydrogen silicon) are increasing interest due available high resolution their special chemical physical behavior substrate. In this work, helium neon beams from microscope compared such as lithium,...

10.3762/bjnano.11.156 article EN cc-by Beilstein Journal of Nanotechnology 2020-11-18

A carbon-cerium alloy liquid metal ion source (LMIS) with unintentional aluminum content is presented for generating focused beams of carbon ions, as well ionized clusters sizes 2, 4, and 8 atoms. Emission-current-dependent measurements were carried out the mass spectra energy spread all species, but on monomer ions clusters. The full width at half maximum distribution was determined to be 6.5eV 14eV light an emission current 5μA. showed good beam performance when used a mass-separated...

10.1116/1.3253471 article EN Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena 2009-11-01

In recent years, focused ion beam (FIB) processing has been developed into a well-established and promising technique in nearly all fields of nanotechnology for patterning prototyping on the μm-scale below. Liquid metal alloy sources (LMAIS) represent alternative to expand FIB application besides other source concepts. The need light elements like Li was investigated using various alloys. A candidate is Ga35Bi60Li5 based LMAIS, which introduced more detail operates stably than 1000 μA h. It...

10.1116/1.5086271 article EN Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena 2019-03-01

Abstract We discuss physical processes underlying the generation of ion beams with high emission current density in electrohydrodynamic (EHD) emitters based on liquid metals and alloys room temperature ionic liquids. consider EHD effects that influence ions (ion production mechanisms) kinetics interactions high-density beams. analyze factors determining zone size, sustainability at low currents, clusters, increase energy spread, decrease brightness, other features specific design problems...

10.3367/ufne.2020.09.038845 article EN Physics-Uspekhi 2020-10-18

Journal Article GaBiLi - A Novel Focused Ion Beam (FIB) Source for Microscopy and Related Workflows 3D Tomography with a Top-Down FIB From Liquid Metal Alloy Sources (LMAIS) Get access Torsten Richter, Richter Raith GmbH, Dortmund, Germany Corresponding author: torsten.richter@raith.de Search other works by this author on: Oxford Academic Google Scholar Achim Nadzeyka, Nadzeyka Paul Mazarov, Mazarov Fabian Meyer Microanalysis, Volume 29, Issue Supplement_1, 1 August 2023, Pages 536–537,...

10.1093/micmic/ozad067.252 article EN Microscopy and Microanalysis 2023-07-22

Focused ion beam (FIB) processing has been established as a well-suited and promising technique in R&D nearly all fields of nanotechnology for patterning prototyping on the micro- nanometer scale below. Among other concepts, liquid metal alloy sources (LMAISs) are one alternatives to conventional gallium beams extend FIB application field. To meet rising demand light ions, different boron containing alloys were investigated this work. A solution was found Co31Nd64B5 based LMAIS which...

10.1116/6.0000073 article EN Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena 2020-05-26

10.1016/s0168-583x(99)01117-9 article EN Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms 2000-04-01

Physical processes that determine the generation of ion beams with a high emission current density in electrohydrodynamic emitters are considered. Electrohydrodynamic effects, which manifested features emission, and kinetics interaction high-density discussed. The factors size zone, stability at low currents, cluster generation, increase energy dispersion, decrease beam brightness analyzed. problems practical maintenance stable functioning EHD applications

10.3367/ufnr.2020.09.038845 article EN Uspekhi Fizicheskih Nauk 2020-09-01

The University of Florida (UF) have collaborated with Raith to develop a version the ionLiNE IBL system that has capability deliver multi‐ion species in addition Ga ions normally available. UF is currently equipped AuSi liquid metal alloy ion source (LMAIS) and ExB filter making it capable delivering Au Si clusters for beam processing. Other LMAIS systems could be developed future other species. This high performance lithography, sputter profiling, maskless implantation, mixing, spatial...

10.1063/1.3586096 article EN AIP conference proceedings 2011-01-01

Semiconductor ZnO and GaN nanowires have shown the ability to detect many types of gases, biological chemical species interest. In this review, we give some recent examples using these for pH sensing, glucose detection hydrogen at ppm levels. addition, new ion beam systems with nm resolution capability are now available. This opens up possibility directly writing doped regions into semi-insulating materials such as undoped GaAs or creation arrays channel transistors other active elements....

10.1166/jnan.2011.1009 article EN Journal of Nanoengineering and Nanomanufacturing 2011-04-01
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