A5105418268- Particle physics theoretical and experimental studies
- High-Energy Particle Collisions Research
- Particle Detector Development and Performance
- Quantum Chromodynamics and Particle Interactions
- Crystallization and Solubility Studies
- X-ray Diffraction in Crystallography
- Dark Matter and Cosmic Phenomena
- Radiation Detection and Scintillator Technologies
- Advancements in Photolithography Techniques
- Neutrino Physics Research
- Computational Physics and Python Applications
- CCD and CMOS Imaging Sensors
- Cosmology and Gravitation Theories
- advanced mathematical theories
- Integrated Circuits and Semiconductor Failure Analysis
- Industrial Vision Systems and Defect Detection
- Electron and X-Ray Spectroscopy Techniques
- Astrophysics and Cosmic Phenomena
- Advanced Measurement and Metrology Techniques
- Distributed and Parallel Computing Systems
- Advanced Surface Polishing Techniques
- Parallel Computing and Optimization Techniques
- Black Holes and Theoretical Physics
- Medical Imaging Techniques and Applications
- Image Processing Techniques and Applications
Oklahoma State University Oklahoma City
2024
Royal Darwin Hospital
2023
University of Oxford
2002-2020
Queen Mary University of London
2011-2012
European Organization for Nuclear Research
2011-2012
Yale University
2012
Wallenberg Wood Science Center
2011
National Science and Technology Council
2011
Turkish Atomic Energy Authority
2011
Lawrence Berkeley National Laboratory
2011
Abstract Laparoscopic cholecystectomy is a common surgical procedure, with potential for significant morbidity. The incidence of bile duct injuries has increased the advent laparoscopy, occurring in up to 1% cases. Risk injury increases aberrant anatomy, acute inflammation and fibrosis. Preventative strategies include obtaining critical view safety, using fundus-first approach performing subtotal difficult gallbladder. Although controversy exists routine cholangiography, its use helpful...
Control of defect density is very important in all the processes integrated circuits. Photomask plays a role IC fabrication. Defect has to be well controlled photomasks. It not only work for good process control mask fabrication shop. also necessary that we understand various causes these defects. There can multifarious sources Some defects are caused by improper processing, others insufficent environment and still imaging. In this paper present results comprehensive study classification...
Simulation of images two-dimensional structures in optical lithography is considered to have become quite important with the patterning near-micrometer geometries complex encountered VLSI. Here, results are presented theoretical computations performed calculate aerial image square apertures a projection system using partially coherent light source. The resist has been modeled by its sensitivity curve order compute profile on after development. A figure merit (FOM) proposed that quantifies...
At Rutherford Appleton Laboratory, in collaboration with University of California-Santa Cruz and the Oxford, we were involved design development digital readout schemes for front end silicon strip detector at SDC. As a result our work, have designed built 128 channel integrated circuit to buffer hit patterns transmit them out module. This is referred as DDR2RH (Digital Data Read-out Radiation Hardened Version).< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML"...
As the feature size is reduced, two dimensional proximity printing of contact openings one simpler cases which can be computed using Fresnel diffraction theory. This applicable only if gap larger than aperture size. approximation also applied to case more apertures in close proximity. In this paper, we discuss three separated by equal distances. The conditions under valid for have been discussed. aerial image such a has computed. variation shape calculated form contours constant intensity...
In this paper, we report the results of ANKAN, a computer program written for exposure and development positive photoresist using matrix formulation. Exposure process is modelled diffraction limited optics partially coherent light source with wavelength λ. The uses string model resist development. theoretical computations are reported found to be in good agreement those previous workers. addition, can also used computing edge threshold linewidth measurement predicting shape aerial image two...
Proximity Printing is a simple, high throughput non-contact method for wafer exposure. Image quality of such system limited by the diffraction light at edges object. This causes exposure variation in resist and hence image distortion. printing process has been simulated lithography purpose. Computations were done an array apertures. Aperture separation aperture to substrate gap have varied see effect on intensity distributions. Some experiments using Cobilt aligner proximity mode....
Photomasks are very important in the manufacturing of integrated circuits and should be high quality with low defect density good edge definition. A photomask fabrication process involves various photo-imaging, processing, measurement control steps. The complexity sophistication requires that either operator extremely killed conversant all steps involved as per requirements given set masks or entire computerised. CEERI has developed a data-base for complete processing emulsion hard surface...
Photomasks are in widespread use production of integrated circuits either the form reticles or step-and-repeated working masks. The quality these masks depends on control both line dimensions and defect density. Unders'tanding generation mechanism has been a topic extensive study past. In this paper, caused by over-lapping flashes, exposed an optical pattern generator emulsion photoplates, reported. It observed that data tapes produced computer-aided-design (CAD) systems often contains...