A5030828359- Analytical chemistry methods development
- Mass Spectrometry Techniques and Applications
- Ion-surface interactions and analysis
- Laser-induced spectroscopy and plasma
- Analytical Chemistry and Sensors
- Plasma Diagnostics and Applications
- Mercury impact and mitigation studies
- Semiconductor materials and devices
- Metal and Thin Film Mechanics
- Advanced Chemical Sensor Technologies
- Electrochemical Analysis and Applications
- Force Microscopy Techniques and Applications
- Gas Sensing Nanomaterials and Sensors
- Diamond and Carbon-based Materials Research
- Water Quality Monitoring and Analysis
- Analytical Chemistry and Chromatography
- Electron and X-Ray Spectroscopy Techniques
- Anodic Oxide Films and Nanostructures
- Plasma Applications and Diagnostics
- Advanced Sensor Technologies Research
- Cultural Heritage Materials Analysis
- Integrated Circuits and Semiconductor Failure Analysis
- Electrohydrodynamics and Fluid Dynamics
- Conservation Techniques and Studies
- Electrochemical sensors and biosensors
Universidad de Oviedo
2015-2024
Consejo Superior de Investigaciones Científicas
1996
Centro de Investigaciones Energéticas, Medioambientales y Tecnológicas
1992
Universidad Autónoma de Madrid
1987-1991
Centre National de la Recherche Scientifique
1991
Université Claude Bernard Lyon 1
1991
IBM Research - Zurich
1985-1989
First Page
ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTGeneration of Cadmium Atoms at Room Temperature Using Vesicles and Its Application to Determination by Cold Vapor Atomic SpectrometryA. Sanz-Medel, M. C. Valdes-Hevia y Temprano, N. Bordel Garcia, R. Fernandez de la CampaCite this: Anal. Chem. 1995, 67, 13, 2216–2223Publication Date (Print):July 1, 1995Publication History Published online1 May 2002Published inissue 1 July...
The analytical potential of a nanosecond laser ablation inductively coupled plasma mass spectrometer system, equipped with an ultra-fast wash-out chamber, is critically investigated for fast and highly spatially resolved (∼μm) qualitative elemental distribution within single cells.
The on-line coupling of vesicle-mediated high-performance liquid chromatography (HPLC) to low-power argon microwave-induced plasma (MIP) detection is described. analytical potential such a hybrid technique illustrated for the speciation mercury and arsenic compounds. Continuous cold vapour (CV) or hydride generation (HG) techniques were used as interfaces between exit HPLC column MIP, held in surfatron at reduced pressure. Detection was by atomic emission spectrometry (AES). effect different...
Direct solid analysis of bulk and thin coated glasses by pulsed radiofrequency (rf) glow discharge time-of-flight mass spectrometry (GD-TOFMS) is investigated. Modulated low pressure plasma created pulsed-rf-GD has been coupled to a fast TOFMS in order obtain complete spectra information from the different GD pulse domains (pre-peak, plateau afterglow). In particular, it was observed that analytes show highest atomic ion signals afterglow region some hundred microseconds after maximum Ar...
The application of a new methodology for direct solid analysis fluorine by LIBS is evaluated. This approach, based on the nebulization Ca solution over fluorine-containing sample, allows F quantification using emission CaF molecular bands.
ADVERTISEMENT RETURN TO ISSUEPREVArticleNEXTScanning tunneling microscopy of electrochemically activated platinum surfaces. A direct ex-situ determination the electrode nanotopographyL. Vazquez, J. Gomez, A. M. Baro, N. Garcia, L. Marcos, Gonzalez Velasco, Vara, Arvia, Presa, and Cite this: Am. Chem. Soc. 1987, 109, 6, 1730–1733Publication Date (Print):March 1, 1987Publication History Published online1 May 2002Published inissue 1 March...
The analytical potential of a radiofrequency glow discharge orthogonal time-of-flight mass spectrometer (RFGD-TOFMS) has been evaluated in both pulsed and non-pulsed modes. A certified reference steel was selected for this study. operating conditions the GD plasma (pressure applied power) were optimized terms sensitivity. Additionally, duty cycle pulse width parameters investigated RF mode. In case, high analyte ion signals improved signal to background ratios measured after end pulse,...
Fast, high-spatially resolved, multi-elemental analysis of otoliths using fs-LA-ICP-TOFMS, quantitative IR-fs-LA and UV-fs-LA, determination major trace analytes, MACS3 as calibrating sample.
R4sum6.L'obtention de faisceaux d'ions (environ 10~ions/s) partir d'dmetteurs ayant une di- mension atomique est possible et nous pr6sentons id leur r6alisation exp6rimentale.Ce travail repose sur le principe d'une fusion surface sons champ temp6rature d'environ un tiers la temptrature volume.Ces 6metteurs pr6sentent structure pyramidale dimension nanomdtrique terminde par atome.Le voisinage plusieurs dmetteurs, distants aussi quelques nanomltres, ddfinit alors des joints grains surface.Nos...
A plasma cleaning procedure to improve elemental depth profiling of shallow layered materials by glow discharge spectrometry is proposed. The based on two approaches applied prior profiling, either individually or sequentially. first approach employs a generated at low power, i.e. "soft" plasma, for removal contaminants adsorbed the surface target material. In second approach, sacrificial material sputtered under normal conditions, e.g. those used clean inner anode source. It demonstrated...
Abstract We demonstrate the potential of an innovative technique, pulsed radiofrequency glow discharge time‐of‐flight mass spectrometry, for molecular depth profiling polymer materials. The technique benefits from presence, in afterglow discharge, fragment ions that can be related to structures polymers under study. Thin films different (PMMA, PET, PAMS, PS) were successfully profiled with retention information along profile. Multilayered above also profiled, and it was possible discriminate...
The analytical potential of ArF* excimer Laser Ablation Inductively Coupled Plasma Mass Spectrometry (LA-ICP-MS) is investigated for fast qualitative depth profile analysis multi-layer CdTe photovoltaic (PV) devices.