- Optical Coatings and Gratings
- Advanced Surface Polishing Techniques
- Advanced X-ray Imaging Techniques
- Ion-surface interactions and analysis
- Advanced Measurement and Metrology Techniques
- Photonic and Optical Devices
- Advancements in Photolithography Techniques
- Surface Roughness and Optical Measurements
- Diamond and Carbon-based Materials Research
- Laser-Plasma Interactions and Diagnostics
- Integrated Circuits and Semiconductor Failure Analysis
- Advanced Fiber Optic Sensors
- Near-Field Optical Microscopy
- Plasma Diagnostics and Applications
- Metal and Thin Film Mechanics
- Atomic and Molecular Physics
- X-ray Spectroscopy and Fluorescence Analysis
- Adhesion, Friction, and Surface Interactions
- Optical measurement and interference techniques
- Photocathodes and Microchannel Plates
- Optical Systems and Laser Technology
- Advanced optical system design
- Adaptive optics and wavefront sensing
- Calibration and Measurement Techniques
- Infrastructure Resilience and Vulnerability Analysis
University of Science and Technology of China
2015-2025
National Synchrotron Radiation Laboratory
2015-2025
Shanghai Jiao Tong University
2024
Southwestern University of Finance and Economics
2023
Hefei University
2016
A method was developed for aligning interference fringes generated in lithography to the vertical {111} planes of <110> oriented silicon wafers. The alignment error is 0.036°. This high precision makes it possible combine with anisotropic wet etch technique fabrication aspect ratio gratings extremely smooth sidewalls over a large sample area. With this method, 320 nm and 2 μm period have been successfully fabricated. highest up 100. area about 50 mm × 60 mm. roughness (root mean square)...
The ion beam sputtering (IBS) of smooth mono-elemental Si with impurity co-deposition is extended to a pre-rippled binary compound surface fused silica (SiO2). dependence the rms roughness and deposited amount Al on distance from source under Ar+ IBS was investigated SiO2, surfaces, using atomic force microscopy X-ray photoelectron spectroscopy. Although amounts these three surfaces all decreased increasing target, morphology did not demonstrate strong dependence. In contrast Si, both SiO2...
The energy dependence of nanostructures on a photoresist produced by ion bombardment (IB) under normal incidence is studied through atomic force microscopy and time-of-flight secondary mass spectroscopy (ToF-SIMS). energy-dependent morphology evolved from weak islands via nanoholes to smooth surface the resist; in particular, were for broad range 300–550 eV. enrichment light components layer irradiated resist was illustrated owing strong decomposition IB. morphologies explained according...
Submicrometer double-grooved gratings feature unique optical properties and diverse potential applications, most of which have been fabricated by electron beam lithography up till now. On the other hand, holographic based on a phase mask [near-field holography (NFH)] has advantages high throughput, low cost, compact setup in terms short path. Distinguished from conventional NFH double-beam interference, multibeam interference is studied to form groove profiles this study. The formation...
We describe a simple and convenient method of controlling the profile blazed grating that consists using patterned native-oxide layer off-cut silicon (111) wafers as mask anisotropic etching to maximize smooth blaze facets desired angle minimize deficiencies groove apexes. With blazed-grating well controlled by this technique, 1200 g/mm was fabricated had 5.0 degrees about 0.2 nm rms. It measured have efficiency in vacuum-ultraviolet wavelength region.
Grating beam splitters have been fabricated for soft X-ray Mach- Zehnder interferometer using holographic interference lithography. The grating splitter consists of two gratings, one works at laser wavelength 13.9 nm with the spatial frequency 1000 lines/mm as operation grating, other visible 632.8 pre-aligning 22 pre-alignment grating. gratings lie vertically on same substrate. main feature is use low-spatial- beat a double interferometer. line parallelism between can be judged by observing...
A cylindrical Öffner stretcher based on ternary reflector (COSTER) is proposed and analyzed. Compared with the traditional stretcher, COSTER has no off-axis aberration in multipass configuration, output laser of lower spectral phase noise higher temporal contrast far field. The quite suitable to be used multi-petawatt facilities, it might preferred configuration for ultrafast ultra-intense lasers.
A fabrication method comprising near-field holography (NFH) with an electron beam lithography (EBL)-written phase mask was developed to fabricate soft X-ray varied-line-spacing gratings (VLSGs). An EBL-written area of 52 mm × 30 and a central line density greater than 3000 lines −1 used. The introduction the substantially simplified NFH optics for pattern transfer. characterization groove distribution diffraction efficiency fabricated VLSGs indicates that EBL–NFH is feasible promising...
Random nanohole morphologies on a photoresist surface were produced spontaneously by ion bombardment, from normal to near-normal incidence. At an optimized energy, the critical parameters (diameter and depth) uniformity of these nanoholes can be tailored with multi-ion parameters, including fluence (i.e. bombardment time), flux, incidence angle. The temporal evolution structures, at incidence, showed growth stabilization regimes. mass redistribution effect distribution energy deposition led...
We demonstrate a method of fabricating varied-line-spacing grating by employing elastic medium with variable vertical section. The advantages this technique include continuous variation line spacing, high fabrication efficiency, low cost, etc. It is very difficult or impractical to produce spacing traditional interference lithography. This kind can be used in an optical position sensor improve the precision sensor.
Near-field holography (NFH), with its virtues of precise critical dimensions and high throughput, has a great potential for the realization soft x-ray diffraction gratings. We show that NFH reflections reduced by integration antireflective coatings (ARCs) simplifies process relative to setups using refractive index liquids. Based on proposed ARCs, gold-coated laminar gratings were fabricated subsequent ion beam etching. The efficiency angular spectrum shows stray light is one level magnitude...
Near-field holography (NFH) combined with electron beam lithography (EBL)-written phase masks is a promising method for the rapid realization of diffraction gratings high resolution and accuracy in line density distribution. We demonstrate dynamic exposure which grating substrate shifted during pattern transfer. This reduces effects stitching errors, resulting decreased intensity optical stray light (i.e., Rowland ghosts). suppression ghosts by 60%. illustrates potential NFH to suppress...
The morphology evolution of self-organized nanopatterns induced during Ar+ ion bombardment (IB) with Mo co-deposition on fused silica (SiO2) surfaces at different incidence angles and fluences was investigated by using atomic force microscopy transmission electron microscopy. For pure IB from 30° to 70°, SiO2 evolve being flat, via ripples, direction-transversed ripples. In contrast, the same fluence angles, simultaneous leads significant terraced structures significantly enhanced roughness...
Abstract Ion bombardment (IB) is a promising nanofabrication technique for producing nanoripples. A critical issue that restricts the application of IB limited quality IB-induced Photoresist (PR) and antireflection coating (ARC) are technological relevance lithographic exposure processes. Moreover, to improve self-organized nanoripples, in this study, PR/ARC bilayer was bombarded at an incidence angle 50°. The surface normalized defect density power spectral density, obtained via scanning...
Ion bombardment (IB) is a promising nanofabrication tool for self-organized nanostructures. When ions bombard nominally flat solid surface, nanoripples can be induced on the irradiated target which are called intrinsic of material. The degree ordering an outstanding issue to overcome, similar other self-organization methods. In this study, IB-induced bilayer systems with enhanced quality revisited from perspective guided self-organization. First, power spectral density (PSD) entropy...
The Long Trace Profiler (LTP) is a useful optical metrology instrument for measuring the figure and slope error of cylindrical aspheres commonly used as synchrotron radiation (SR) optics. It extensively at number laboratories around world. In order to improve SR beam line quality resolution, National Synchrotron Radiation Laboratory (NSRL) China developing versatile LTP that can be measure both optics more conventional "normal" surfaces. Brookhaven (BNL) NSRL are collaborating in multiple...
A wavelength-encoding optical position sensor was designed in this study. The critical component of the is its innovative digital encoding grating ruler (DEGR), which a substrate on several blazed units with different line densities are arranged parallel to one another following certain order. Two types multi-DEGR were designed. We obtained over 100,000 codes that significantly assisted designing long-range and high-resolution sensors by optimizing coding algorithm. wavelength signals...
The binary fused silica gratings (BFSGs) with high diffraction efficiency are presented for large astronomical ground-based telescopes. Calculations demonstrate that the BFSGs could obtain in a wider wavelength range and angle of incident (AOI) compared volume phase holographic gratings. Several size 60mm×60mm have been fabricated by lithography reactive ion-beam etching technology. measured peak reaches 94%, results show there 130 nm bandwidth 12° AOI which is higher than 70%. stray light...
In order to improve the efficiency uniformity of large-aperture beam sampling gratings (BSGs), a conventional chemical mechanical polishing (CMP) process fused silica by CeO₂ slurry is proposed modify their groove profiles. With CMP process, several BSGs with an aperture 430 mm×430 mm has been successfully controlled within rms 5%. The effective method BSGs. Using requirement holographic ion etching can be released in realization