Yang Shao

ORCID: 0000-0002-1631-9206
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About
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Research Areas
  • Thin-Film Transistor Technologies
  • Semiconductor materials and devices
  • ZnO doping and properties
  • Silicon and Solar Cell Technologies
  • Electrocatalysts for Energy Conversion
  • Silicon Nanostructures and Photoluminescence
  • Biodiesel Production and Applications
  • Analytical Chemistry and Sensors
  • Transition Metal Oxide Nanomaterials
  • Electrochemical Analysis and Applications
  • Catalysis and Hydrodesulfurization Studies
  • Conducting polymers and applications
  • Advanced Battery Technologies Research
  • Coordination Chemistry and Organometallics
  • Electrical and Thermal Properties of Materials
  • Quantum Dots Synthesis And Properties
  • Electrochemical sensors and biosensors
  • Organic Electronics and Photovoltaics
  • CO2 Reduction Techniques and Catalysts
  • Perovskite Materials and Applications
  • Advanced Photocatalysis Techniques
  • Synthesis and Reactions of Organic Compounds
  • Chemical Synthesis and Analysis
  • Semiconductor Lasers and Optical Devices
  • Advanced battery technologies research

Anhui Polytechnic University
2025

Nanjing Xiaozhuang University
2021-2024

Zhejiang University
2022-2023

State Key Laboratory of Clean Energy Utilization
2022-2023

Southwestern Institute of Physics
2023

Peking University
2013-2020

Technical University of Munich
2017

China University of Petroleum, East China
2014-2016

East China Jiaotong University
2016

Hebei University of Science and Technology
2014

In this work, we present significant charge trapping memory effects of the metal-hafnium oxide-SiO2-Si (MHOS) structure. The devices based on 800 °C annealed HfO2 film exhibit a large window ∼5.1 V under ±10 sweeping voltages and excellent retention properties with only small loss ∼2.6% after more than 104 s retention. outstanding characteristics are attributed to high density deep defect states in films. We investigated films by photoluminescence excitation measurements found that...

10.1063/1.4900745 article EN Applied Physics Letters 2014-10-27

The effects of chemical and structural surface heterogeneity on the CH4 adsorption behaviour microporous carbons have been investigated using a hybrid theoretical approach, including use density functional theory (DFT), molecular dynamics (MD), grand canonical Monte Carlo (GCMC) simulations. Bader charge analysis is first performed to analyze atomic partial charges. densities in defective functionalized graphite slit pores are lower than that perfect pore according MD Finally, isotherms for...

10.1039/c3cp55107e article EN Physical Chemistry Chemical Physics 2014-01-01

Low-voltage amorphous indium-gallium-zinc oxide (a-IGZO) thin-film transistors (TFTs) with thin HfO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> gate dielectric grown by anodic oxidation (anodization) method are investigated. The morphological and electrical properties of the anodized film studied. It is shown that as-grown an equivalent thickness 3.8 nm has a low leakage current density 3.6 × 10 <sup...

10.1109/led.2015.2422895 article EN IEEE Electron Device Letters 2015-04-14

Vinification of grapes (Vitis vinifera) exposed to forest fire smoke can yield unpalatable wine due the presence taint compounds from and release derived volatiles their respective glycosides during fermentation process or in-mouth consumption. To identify glycosyltransferases (GTs) involved in formation glycosidically bound smoke-derived we performed gene expression analysis candidate GTs different grapevine tissues. Second, substrates bushfire naturally occurring were screened with...

10.1021/acs.jafc.7b01886 article EN Journal of Agricultural and Food Chemistry 2017-06-28

The electrical recovery behaviors of the amorphous InGaZnO thin-film transistors (a-IGZO TFTs) after positive gate-bias stress (PBS) are investigated. TFTs show an evident sub-threshold swing (SS) degradation PBS removal when channel layer is deposited at relatively high oxygen flow rates, although they exhibit a parallel shift in transfer characteristics during PBS. It inferred that SS results from interstitial defects created a-IGZO PBS, which octahedral configuration and usually more...

10.1109/led.2017.2723162 article EN IEEE Electron Device Letters 2017-07-04

In this paper, an efficient approach to mask optimization for digital micromirror device lithography is proposed, leveraging enhanced particle swarm algorithm, which significantly elevates the resolution and precision of lithography. Initially, chaos mapping applied initial population enhance diversity, thereby improving efficiency algorithm. Subsequently, self-adaptive parameter adjustments simulated annealing are integrated effectively avoid premature convergence escape local optima....

10.1116/6.0004107 article EN Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena 2025-01-01

As a typical high-energy-density material, the sensitivity of CL-20 severely limits its application in explosives and propellants. Adjusting structure at microscopic level can effectively solve such problems. In this study, microfluidic recrystallization technique was used to prepare ε-CL-20 with three different particle sizes, narrow size distributions (D50 = 2.77 μm, 17.22 μm 50.35 μm). The prepared samples had fewer surface defects compared raw material. decreased, density increased...

10.3390/molecules30051176 article EN cc-by Molecules 2025-03-06

10.1016/s0040-4039(98)00725-4 article EN Tetrahedron Letters 1998-06-01

The effect of O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> flow rate during the sputtered deposition channel layer on negative gate-bias stress (NGBS)-induced threshold voltage (V xmlns:xlink="http://www.w3.org/1999/xlink">th</sub> ) instability a-IGZO TFTs is investigated. It shown that results in a V shift TFTs, and amount decreases with increase rate. proposed originates from electron-detrapping oxygen vacancy-related donor-like...

10.1109/ted.2013.2286636 article EN IEEE Transactions on Electron Devices 2013-11-19

This paper reports that the electrical, optical and structural properties of ITO film can be significantly modulated by an anodization treatment. An TFT technology based on approach is then proposed demonstrated, which results in ideal homo‐junction device structure with source/drain/pixel electrodes channel region made one single layer. A preliminary fabrication at room temperature shows resulting has on/off current ratio exceeding 1 × 10 8 , a saturation mobility 29.0 cm 2 V −1 s...

10.1002/adfm.201400263 article EN Advanced Functional Materials 2014-03-28

A room-temperature flexible amorphous indium-gallium-zinc oxide thin film transistor (a-IGZO TFT) technology is developed on plastic substrates, in which both the gate dielectric and passivation layers of TFTs are formed by an anodic oxidation (anodization) technique. While Al2O3 grown with a conventional anodization Al:Nd electrode, channel layer using localized The anodized shows superior effect to that PECVD SiO2. room-temperature-processed a-IGZO TFT exhibits field-effect mobility 7.5...

10.1021/acsami.7b13211 article EN ACS Applied Materials & Interfaces 2017-12-13

Glycosylasparaginase is an N-terminal nucleophile hydrolase and activated by intramolecular autoproteolytic processing. This cis-autoproteolysis possesses unique kinetics characterized a reversible N-O acyl rearrangement step in the Arg-180 Asp-183, involved binding of substrate mature enzyme, are also free amino acids partially formed pocket on certain mutant precursors. site sequestered wild-type precursor. Binding precursors can either inhibit or accelerate their processing, depending...

10.1074/jbc.273.16.9695 article EN cc-by Journal of Biological Chemistry 1998-04-01

The last step in the sequence of reactions that lead to protein splicing is intramolecular O‐N or S‐N acyl rearrangement ester thioester linkage, respectively, between two exteins and hydrolysis aminosuccinimide residue at C‐terminus intein. This paper presents data on rates rearrangements model depsipeptides as a function pH temperature. both oxygen depsipeptide increased strikingly with pH, being about 10 3 times more reactive 5.5, had relatively low dependence temperature, indicative...

10.1111/j.1399-3011.1997.tb01185.x article EN Journal of Peptide Research 1997-09-01

Br − /Br 2 mediated electrochemical oxidation of primary amines to nitriles paired with HER.

10.1039/d3cc05861a article EN Chemical Communications 2024-01-01

Amorphous indium tin oxide (a-ITO) thin-film transistors (TFTs) were fabricated with the channel layer deposited by cosputtering of In <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> and SnO ceramic targets. It is shown that cosputter-deposited ITO film for well keeps in amorphous structure even after being annealed at 300° if sputtering powers two targets are properly selected. The...

10.1109/ted.2015.2513421 article EN IEEE Transactions on Electron Devices 2016-01-27

The effect of oxygen adsorption at the back channel a-IGZO thin-film transistors (TFTs) is investigated. It shown that for TFTs with layer sputter-deposited a high O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> /Ar flow rate ratio (RO/Ar), threshold voltages in vacuum and ambient do not show any difference; devices fabricated low RO/Ar, are lower than those . In addition, more significant voltage shift under positive gate bias stress....

10.1109/led.2017.2666881 article EN IEEE Electron Device Letters 2017-02-09

A back-channel-etched fabrication process for amorphous indium-gallium-zinc oxide (a-IGZO) thin-film transistors is proposed, in which an alumium-doped ZnO (AZO) transparent conductive film used to form both source/drain and pixel electrodes. It demonstrated that rinsed acetic acid solution has a high etching selectivity over 100:1 between AZO a-IGZO. In addition, bus interconnect lines are formed separate step this process, so the Cu could be adopted without bringing contamination issue.

10.1109/ted.2016.2542862 article EN IEEE Transactions on Electron Devices 2016-03-29
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