A5056912641- Metamaterials and Metasurfaces Applications
- Advanced Antenna and Metasurface Technologies
- Photonic Crystals and Applications
- Plasmonic and Surface Plasmon Research
- Advanced Optical Imaging Technologies
- Optical Coatings and Gratings
- Orbital Angular Momentum in Optics
- Malaria Research and Control
- Trypanosoma species research and implications
- Nanofabrication and Lithography Techniques
- Drug Transport and Resistance Mechanisms
- Optical measurement and interference techniques
- Endoplasmic Reticulum Stress and Disease
- Antenna Design and Analysis
- Image Processing Techniques and Applications
- Advanced Memory and Neural Computing
- Injection Molding Process and Properties
- CCD and CMOS Imaging Sensors
- Manufacturing Process and Optimization
- Random lasers and scattering media
- Optical Polarization and Ellipsometry
The University of Adelaide
2023-2024
Agency for Science, Technology and Research
2018-2024
Institute of Microelectronics
2018-2024
The demonstration of a color display metasurface on 12-inch silicon wafer with critical dimension (CD) below 100 nm by complementary metal-oxide semiconductor (CMOS) compatible technology is reported for the first time. 193 ArF deep UV immersion lithography leveraged instead electron beam (EBL) to pattern metasurface, which greatly improves efficiency while keeping high resolution. demonstrated successfully generates resonant modes and reflects lights at resonance wavelengths, giving its in...
Abstract Metasurface-based beam deflector, as an important optical element to bend the light propagation direction, has drawn a lot of interests in research achieve miniaturization devices and reduction system complexity. Based on 12-inch immersion lithography technology, this work, ultra-thin large-area pixelated metasurface deflector with footprint 2500 × μm, formed by nanopillars diameters from 221 396 nm, is demonstrated glass wafer. The 21 array deflectors designed input different...
Abstract Metalenses made of artificial sub-wavelength nanostructures have shown the capability light focusing and imaging with a miniaturized size. Here, we report demonstration mass-producible amorphous silicon metalenses on 12-inch glass wafer via complementary metal-oxide-semiconductor compatible process. The measured numerical aperture fabricated metalens is 0.496 spot size 1.26 μm at wavelength 940 nm. applied in an system to test resolution. minimum bar resolution chart width 2.19...
Novel display technologies aim at providing the users with increasingly immersive experiences. In this regard, it is a long-sought dream to generate three-dimensional (3D) scenes high resolution and continuous depth, which can be overlaid real world. Current attempts do so, however, fail in either truly 3D information, or large viewing area angle, strongly limiting user immersion. Here, we report proof-of-concept solution for problem, realize compact holographic near-eye exit pupil of 10mm x...
The implementation of polarization controlling components enables additional functionalities short-wave infrared (SWIR) imagers. high-performance and mass-producible controller based on Si metasurface is in high demand for the next-generation SWIR imaging system. In this work, we report first demonstration all-Si polarizing bandpass filters (PBFs) 12-inch wafers. PBF achieves a extinction ratio above 10 dB power within passbands. Using complementary metal-oxide-semiconductor (CMOS)...
Invasion of erythrocytes by members the Plasmodium genus is an essential step parasite lifecycle, orchestrated numerous host-parasite interactions. In P. falciparum Rh5, with PfCyRPA, PfRipr, PfCSS, and PfPTRAMP, forms PCRCR complex which binds basigin on erythrocyte surface. Rh5 restricted to its close relatives; however, PTRAMP, CSS Ripr orthologs are present across genus. We investigated from three species elucidate common features complex. Like falciparum, PTRAMP form a disulfide-linked...
Stereo imaging is a widely used three-dimensional (3D) detection technique for applications ranging from medical to depth perception in artificial intelligence and robotics. A common prerequisite the integration of 3D capabilities advanced technologies wide-angle vision while keeping small device form factor. Here, we present an ultrasmall factor metalens camera stereo imaging, with experimentally measured hemispherical field-of-view (FOV) high resolution across FOV limited only by...
Nanostructures exhibiting optical resonances (so-called nanoantennas) have strong potential for applications in color printing and filtering with sub-wavelength resolution. While small scale demonstrations of these systems are interesting as a proof-of-concept, their large volume fabrication requires deeper analysis further development industrial adoption. Here, we evaluate the quality produced by size nanoantenna arrays fabricated on 12-in. wafer using deep UV immersion photolithography dry...
Apical membrane antigen-1 (AMA1) is a conserved malarial vaccine candidate essential for the formation of tight junctions with rhoptry neck protein (RON) complex, enabling Plasmodium parasites to invade human erythrocytes, hepatocytes, and mosquito salivary glands. Despite its critical role, extensive surface polymorphisms in AMA1 have led strain-specific protection, limiting success AMA1-based interventions beyond initial clinical trials. Here, we identify an i-body, humanised single-domain...
We developed a technology to directly process 12-inch glass wafers using 193 nm immersion lithography for metasurface devices fabrication. An 8-mm-dimeter metalens working at 940 wavelength has been demonstrated as proof-of-concept functional device.
Metalenses built up by artificial sub-wavelength nanostructures have shown the capability of realizing light focusing with miniature lens size. To date, most reported metalenses were patterned using electron beam lithography (EBL), which requires long processing time and is not suitable for mass production. Here, we demonstrate an amorphous silicon (a-Si) metalens on a 12-inch glass wafer via 193 nm ArF deep UV immersion lithography, critical dimension (CD) as small 100 nm. The layer...
We introduce well-developed optical proximity correction (OPC) techniques to the metasurface-based flat optics manufacturing process. Flat optics, formed by subwavelength scale nanostructure pillar (nanopillar) array, so called metasurface, has become promising substitutes for conventional bulky components. For its manufacturing, photolithography is preferable rather than electron beam lithography (EBL) technique because of time and cost effectiveness mass manufacturing. However, required...
We report the first demonstration of a metalens array fabricated on 12-inch glass wafer for dot projection. Good uniformity in size is achieved, with maximum deviation 8% to simulated value.
We have demonstrated a large-area metasurface beam deflector array patterned directly on 12-inch glass wafer using immersion lithography. The captured random points at 940 nm wavelength show good match with the design.
A 1D line-scan metalens integrated MEMS actuator with a field-of-view 80° × 60° has been demonstrated as proof-of-concept. This shows promise compact optical module for depth sensing applications.
<title>Abstract</title> Broadly cross-reactive anti-malarial vaccines and therapeutic interventions are needed to achieve better outcomes in controlling and, eventually, eradicating malaria. Apical membrane antigen-1 (AMA1) is a structurally functionally conserved malarial vaccine candidate involved the tight junction formation with rhoptry neck protein (RON) complex at host cell-parasite interface. This interaction crucial for all <italic>Plasmodium </italic>parasites invade human...
We report all-Si metasurface based polarizing bandpass filter (PBF) fabricated on 12 inch wafer, employing CMOS-compatible 193nm ArF DUV immersion lithography and ICP etch. The PBF work dual short wave infrared bands.
We report a large-area metasurface beam shaper via 12-inch immersion lithography CMOS platform. A3 × 3 mm 2 is designed to transfer Gaussian intensity distribution Top-Hat distribution.
In article number 2000538, Weitao Song, Xinan Liang, Yuanjin Zheng, Arseniy Kuznetsov and co-workers report a compact holographic 3D near-eye display with large exit pupil of 10 mm × 8.66 mm. The image is generated from Huygens' metasurface hologram >108 subwavelength pixels, fabricated via deep-ultraviolet immersion photolithography on 300 glass wafers. High-quality virtual scenes ∼50k active data points continuous depth ranging 0.5 to 2 m, overlaid the real world easily viewed by naked...
Metalens with fixed-gap nanopillars release fabrication challenges in photolithography on CMOS platform. Their performances are investigated through simulation, and the characterization results of metalens patterned directly 12-inch glass-wafer via immersion lithography presented.
Metasurfaces promise great potential in large-viewing-angle holographic 3D display applications due to their full-phase-modulation capability and submicron pixel size. I will present our work on large-scale dielectric metaholograms for Near-Eye-Displays projection future.