A5084815075- Laser Material Processing Techniques
- Nanofabrication and Lithography Techniques
- Nonlinear Optical Materials Studies
- Advanced Surface Polishing Techniques
- Force Microscopy Techniques and Applications
- Electrodeposition and Electroless Coatings
- Metallic Glasses and Amorphous Alloys
- Electrical and Thermal Properties of Materials
- Advanced Measurement and Metrology Techniques
- Advanced ceramic materials synthesis
- Ferroelectric and Piezoelectric Materials
Technische Universität Ilmenau
2021-2022
Walter de Gruyter (Germany)
2022
Abstract The field of optical lithography is subject to intense research and has gained enormous improvement. However, the effort necessary for creating structures at size 20 nm below considerable using conventional technologies. This resulting financial requirements can only be tackled by few global companies thus a paradigm change semiconductor industry conceivable: custom design solutions specific applications will dominate future development (Fritze in: Panning EM, Liddle JA (eds) Novel...
Abstract Since the first realization of two-photon direct laser writing (DLW) in Maruo et al. (Opt Lett 22:132–134, 1997), manufacturing using techniques spread out many laboratories all over world. Photosensitive materials with different material properties open a new field for micro- and nanofabrication. The achievable structuring resolution this technique is reported to be sub-100 nm (Paz J. Laser Appl. 24:042004, 2012), while smallest linewidth 25 could shown Tan (Appl Phys 90:071106,...
Two-photon-absorption (2PA) techniques enables the possibility to create extremely fine structures in photosensitive materials. For direct laser writing as micro- or nanofabrication a system can be combined with highly precise positioning systems. These are mostly limited by few hundreds micrometer range applications based on piezoelectric stages even just relatively tens galvanometer scanners. Although these precise, but stitching methods required for larger fabrication areas. Therefore,...
Abstract Thermal bonding of silicon and low-temperature cofired ceramics (LTCC) at sintering temperatures 900 ° C represents currently the standard process in silicon-ceramic composite (SiCer) substrate fabrication. We analyse thermal behavior LTCC using thermogravimetric analysis, differential scanning calorimetry laser flash analysis. The decomposition could be identified with a mass loss 24% temperature range up to 1000 what influences diffusivity values from about 0.19 mm 2 s −1 before...
Zusammenfassung Die Erweiterung von Nanopositionier- und Nanomessmaschinen (NPM-Maschinen) zu Fabrikationsmaschinen durch den Einsatz eines Femtosekundenlasers für die Umsetzung direktem Laserschreiben mittels Zwei-Photonen-Absorption (2PA) ist ein vielversprechender Ansatz zur skalenübergreifenden metrologischen Fertigung im Bereich der lithografischen Techniken [23]. Dazu wurde zunächst Konzept Integration Zwei-Photonen-Technologie in eine NPM-Maschine entwickelt umgesetzt. Anschließend...
Abstract The extension of nanopositioning and nanomeasuring machines (NPM-machines) to fabrication by using a femtosecond laser for the implementation direct writing means two-photon absorption (2PA) is promising approach cross-scale metrological in field lithographic techniques [24]. To this end, concept integrating technology into an NPM machine was developed implemented, followed characterization system targeted investigations provide evidence synergy two techniques. On basis, new...
Plattform für Methoden, Systeme und Anwendungen in der Messtechnik.Organ des AHMT (Arbeitskreis Hochschullehrer Messtechnik e.V.), AMA (Verband Sensorik e.V.) NAMUR (