A5037101353- Nanofabrication and Lithography Techniques
- Advancements in Photolithography Techniques
- Force Microscopy Techniques and Applications
- Advanced Surface Polishing Techniques
- Advanced Measurement and Metrology Techniques
- Surface Roughness and Optical Measurements
- Tribology and Lubrication Engineering
- Semiconductor Lasers and Optical Devices
- Photonic and Optical Devices
- Optical measurement and interference techniques
- Analytical Chemistry and Sensors
- Electronic Packaging and Soldering Technologies
- Quantum Mechanics and Applications
- 3D IC and TSV technologies
- Quantum Information and Cryptography
- Scientific Measurement and Uncertainty Evaluation
- Electrical and Thermal Properties of Materials
- Quantum optics and atomic interactions
- Advanced machining processes and optimization
Technische Universität Ilmenau
2019-2024
Abstract The field of optical lithography is subject to intense research and has gained enormous improvement. However, the effort necessary for creating structures at size 20 nm below considerable using conventional technologies. This resulting financial requirements can only be tackled by few global companies thus a paradigm change semiconductor industry conceivable: custom design solutions specific applications will dominate future development (Fritze in: Panning EM, Liddle JA (eds) Novel...
We present an ultra-compact, hybrid faint pulse source (FPS) at 850 nm, making use of a linear eight VCSELs array spectral (<1 pm wavelength difference, and >90% overlap FWHM) temporal ps) indistinguishability, as well polarization quality in the four H/V/D/A BB84 channels >20 dB. A common VCSEL on single substrate is used, pitch 250 μm with integrated polarizers, having indistinguishability if temperature levelled < 0.5 K. Each represents either or full amplitude signal for protocol. The...
Although the field of optical lithography is highly investigated and numerous improvements are made, structure sizes smaller than 20 nm can only be achieved by considerable effort when using conventional technology. To cover upcoming tasks in future lithography, enormous exertion put into development alternative fabrication technologies particular for micro- nanotechnologies that capable measuring patterning at atomic scale growing operating areas several hundred square millimetres. Many new...
Abstract The majority of nanopositioning and nanomeasuring machines (NPMMs) are based on three independent linear movements in a Cartesian coordinate system. This combination with the specific nature sensors tools limits addressable part geometries. An enhancement an NPMM is introduced by implementation rotational while keeping precision nanometer range. For this purpose, parameter-based dynamic evaluation system quantifiable technological parameters has been set up employed to identify...
Imprinting micro- and nanostructures on non-planar surfaces has gained prominence in various fields such as optoelectronics, photonics biomedical implants. It been implemented for applications optical sensor arrays fibers. Nanoimprint lithography (NIL) is a low cost, high resolution nanofabrication process. In this work, soft UV-NIL process used which flexible stamp makes it ideal imprinting curved plano-convex lens. However, the substrate to positioning successful transfer of patterns...
For the characterization of mechanical deformation materials at microscopic length scales, image processing a high-quality surface pattern was used. We imprinted speckle patterns onto thin polymer film attached to flat and curved metal substrates using flexible molds soft-thermal nanoimprint lithography. High optical contrast achieved by mixing black dye into generating high absorption in elevated structures, adding titania nanoparticles as fillers recessed areas induce diffuse scattering....
Abstract The growing applications and constant miniaturization of electronic devices low‐temperature co‐fired ceramics (LTCC) in various fields, such as aviation, telecommunications, automotive, satellite communications, military, have led to an increase the demand for LTCC. Such prospects arise due continuous scaling down components high‐density interconnection electronics packaging. This paper reports a technique transfer high‐resolution microstructures from silicon substrates In this...
Abstract Uniform molding and demolding of structures on highly curved surfaces through conformal contact is a crucial yet often-overlooked aspect nanoimprint lithography (NIL). This study describes the development NIL tool its integration into nanopositioning nanomeasuring machine to achieve high-precision orthogonal for soft ultraviolet-assisted (soft UV-NIL). The process was implemented primarily edges plano-convex substrates demonstrate structure uniformity edges. High-resolution...
To keep up with Moore's law in future, the critical dimensions of device features must further decrease size. Thus, nano-electronics and nano-optics manufacturing is based on ongoing development lithography encompasses also some unconventional methods. In this context, we use Nanopositioning Nanomeasuring Machine (NPMM) to generate resist layers by means Direct Laser Writing (DLW),<sup>1</sup> Field Emission Scanning Probe Lithography (FE-SPL)<sup>2</sup> Soft UV-Nanoimprint (Soft...