A5015496128- Advancements in Photolithography Techniques
- Nanofabrication and Lithography Techniques
- Semiconductor materials and devices
- Electron and X-Ray Spectroscopy Techniques
- Additive Manufacturing and 3D Printing Technologies
- Photonic and Optical Devices
- Crystallization and Solubility Studies
- Metal and Thin Film Mechanics
- X-ray Diffraction in Crystallography
- Radioactive element chemistry and processing
- Advanced Surface Polishing Techniques
- Surface Modification and Superhydrophobicity
- Catalytic Processes in Materials Science
- Semiconductor Lasers and Optical Devices
- Brake Systems and Friction Analysis
- Lanthanide and Transition Metal Complexes
- Plasma Diagnostics and Applications
- Advanced Memory and Neural Computing
- Plasma Applications and Diagnostics
- ZnO doping and properties
- Advanced Vision and Imaging
- Thin-Film Transistor Technologies
- Mechanical stress and fatigue analysis
- Tribology and Wear Analysis
- Advanced ceramic materials synthesis
Université de Lille
2003-2025
École Centrale de Lille
2003-2025
Centre National de la Recherche Scientifique
2008-2025
Laboratoire de Mécanique, Multiphysique, Multiéchelle
2018-2023
Unité de catalyse et de chimie du solide de Lille
2007-2014
Catalyse
2007-2014
Université Lille Nord de France
2014
Institut d'électronique de microélectronique et de nanotechnologie
2001-2013
École Nationale Supérieure de Chimie de Lille
2011
Laboratoire des Technologies de la Microélectronique
2007-2010
Abstract Four metal–organic frameworks (MOF) with tetravalent uranium have been solvothermally synthesized by treating UCl 4 rigid dicarboxylate linkers in N , ‐dimethylfomamide (DMF). The use of the ditopic ligands 4,4′‐biphenyldicarboxylate ( 1 ), 2,6‐naphthalenedicarboxylate 2 terephthalate 3 and fumarate ) resulted formation three‐dimensional networks based on hexanuclear uranium‐centered motif [U 6 O (OH) (H O) ]. This corresponds to an octahedral configuration nodes is also known for...
By controlling the water content, a new poly-oxo-metalate species containing 38 uranium centers has been solvothermally synthesized in presence of benzoic acid tetrahydrofuran (THF). The {U38} motif contains distorted UO2 core fluorite type, stabilized by benzoate and THF molecules. This compound is analogous to {Pu38} was characterized X-ray photoelectron spectroscopy magnetic analyses.
An uranium trimesate open framework is built up from trinuclear building blocks (μ(3)-OU(3)) connected to each other by tricarboxylate linkers generate honeycomb-like 3D topology. This compound was solvothermally synthesized low-valent in an N,N-dimethylformamide solvent under inert atmosphere, favoring stabilization of the tetravalent oxidation state, which confirmed X-ray photoelectron spectroscopy analysis.
The adhesion between the fused silica mold and resist remains a key issue in ultraviolet nanoimprint lithography (UV-NIL), especially step repeat processes. In this paper, we present results on antisticking layers (ASLs) of tridecafluoro-1,1,2,2-tetrahydrooctyltrichlorosilane (F13-TCS) deposited vapor phase commercial product, Optool DSX™, from Daikin Chemical, liquid phase. properties structural morphologies formed self-assembled monolayer are investigated using contact angle, Fourier...
In this study, through severe reduced-scale braking tests, we investigate the wear and integrity of organic matrix brake pads against gray cast iron (GCI) discs. Two prototype pad materials are designed with aim representing a typical non-metal NAO low-steel (LS) formulation. The worn surfaces observed SEM. toughness is tested at raw state after heat treatment. During braking, LS-GCI disc configuration produces heavy wear. friction parts both keep their macroscopic appears to be homogeneous....
In this work, the authors tackle problem of laboratory simulation frictional contact in wheels-up emergency landing conditions. To design a novel tribometer simulating between an aircraft structure and runway, one must carry two complementary main tasks: understanding underlying physical mechanisms scaling up in-lab results to scale interest. The propose progress on first task by conducting exploratory work using existing resources. Their contribution consists multi-scale methodology...
In this work, the authors evaluate a new type of perfluoropolyether molecule (FLUOROLINK® S10) to be used as an antisticking mold treatment in UV nanoimprint lithography. Unlike currently ones, has two anchoring ends groups allowing covalent grafting sites surface. Obtained results on are compared Optool DSX’s ones. Using contact angle measurement, x-ray photoelectron spectroscopy, and electron spin resonance, carried out chemical analysis evolution treatments function number imprints. It is...
Abstract In this article, a medium‐pressure DBD plasma treatment is used to improve the cell–material interaction of polyhydroxybutyrate/polyhydroxyvalerate (PHB/PHV) film. PHB/PHV biodegradable natural polyester, for different biomedical applications, including sutures, repair devices, and bone marrow scaffolds. The cell adhesion onto far less than optimal due inadequate surface properties, modification usually necessary be able use full potential. Medium‐pressure treatments, in...
Views Icon Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Twitter Facebook Reddit LinkedIn Tools Reprints and Permissions Cite Search Site Citation G. Gay, D. Belhachemi, J. P. Colonna, S. Minoret, Brianceau, Lafond, T. Baron, Molas, E. Jalaguier, A. Beaurain, B. Pelissier, V. Vidal, De Salvo; Passivated TiN nanocrystals/SiN trapping layer for enhanced erasing in nonvolatile memory. Appl. Phys. Lett. 11 October 2010; 97 (15): 152112....
Plasma etching of W in a poly-Si∕TiN∕W∕HfO2 gate stack is investigated Cl2∕O2 based plasmas. Preliminary studies have illustrated the issues induced with introduction metal layer stack. Based on scanning electron microscopy observations, authors first show that mixture Cl2, O2, and NF3 required to successfully pattern without damaging HfO2, poly-Si, TiN profiles. For better understanding etch mechanisms, studied blanket wafers rates are presented discussed respect plasma parameters. The...