A5027970493- Copper Interconnects and Reliability
- Semiconductor materials and devices
- Metal and Thin Film Mechanics
- Advancements in Photolithography Techniques
- Organic Electronics and Photovoltaics
- 3D IC and TSV technologies
- Advanced Surface Polishing Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Conducting polymers and applications
- Organic Light-Emitting Diodes Research
- Semiconductor materials and interfaces
- Anodic Oxide Films and Nanostructures
- Surface Modification and Superhydrophobicity
- Molecular Junctions and Nanostructures
- Nanoporous metals and alloys
- Silicone and Siloxane Chemistry
- Electrodeposition and Electroless Coatings
- Electron and X-Ray Spectroscopy Techniques
- Electronic Packaging and Soldering Technologies
- Ion-surface interactions and analysis
- Silicon and Solar Cell Technologies
- Force Microscopy Techniques and Applications
- Advanced ceramic materials synthesis
- Plasma Diagnostics and Applications
- Corrosion Behavior and Inhibition
IMEC
2014-2024
SCREEN (Japan)
2018
Institut de Chimie de la Matière Condensée de Bordeaux
2017
Instituto Superior Técnico
2017
KU Leuven
2002-2014
University of Rochester
1999-2001
École Normale Supérieure - PSL
1999
University of Namur
1994-1998
The electronic structure and chemistry of interfaces between tris-(8-hydroxyquinoline) aluminum (Alq3) representative group IA IIA metals, Al, Al/LiF have been studied by x-ray ultraviolet photoelectron spectroscopies. Quantum-chemical calculations at the density functional theory level predict that Alq3 radical anion is formed upon reaction with alkali metals. In this case, up to three metal atoms can react a given molecule form trivalent anion. formation results in splitting N 1s core new...
We report on the chemical adsorption of acids and bases indium tin oxide (ITO). Ultraviolet photoelectron spectroscopy was used to measure work function treated ITO atomic surface concentrations were determined by x-ray spectroscopy. The acid treatments yield work-function shifts as high 0.7 eV compared nontreated ITO. Huge in are also obtained for with opposite those acids. These dramatic indicative a double ionic layer. importance an appropriate plasma treatment prior or is discussed terms...
We have investigated the interfaces of aluminum on tris-(8-hydroxyquinoline) (Alq3) and LiF/Alq3, using x-ray ultraviolet photoemission spectroscopy (UPS). Aluminum appears to react destructively with Alq3 causing significant modification oxygen, nitrogen, spectra. The well-defined UPS spectrum is quickly destroyed by very low coverages aluminum. With only a 5 Å layer LiF Alq3, reaction significantly suppressed. molecular orbital features in shift higher binding energy but remain easily...
Ruthenium and molybdenum are candidate materials to replace Cu as the back-end-of-line interconnect metal for tightest pitch features future technology nodes. Due their better figure of merit ρ0 × λ (ρ0 bulk resistivity, electron mean free path), it is expected that resistance <10 nm wide Ru Mo lines can be significantly reduced compared Cu. An important advantage both materials, in contrast Cu, patterned by means so-called direct etch, through reactive ion etching or atomic layer...
The influence of the indium tin oxide (ITO) electrode surface acido basicity on organic electroluminescent device characteristics is studied. As measured by photoelectron spectroscopy, acid and base treatments produce large work function shifts compared to standard ITO treated an oxygen plasma or water. current onsets for triphenyldiamine (TPD) single layer diodes sandwiched between a silver are in qualitative agreement with hole injecting electrode. However, saturated photovoltage...
The interface formation between indium–tin–oxide (ITO) having various work functions and N,N′-bis-(1-naphthyl)-N,N′-diphenyl-1,1′-biphenyl-4,4′-diamine (NPB) was investigated using x-ray ultraviolet photoelectron spectroscopy. Phosphoric acid tetrabutylammonium hydroxide were used to modify the ITO function. energy difference highest occupied molecular orbital (HOMO) position of NPB Fermi level can be varied substantially by surface treatment. function acid-treated dramatically decreases...
A multitechnique approach has been used to characterize the surface of nonosseointegrated titanium implants and surrounding biological tissues. Five pure dental were as reference, 25 removed studied. Surface in-depth chemical compositions (from a total 16 patients) investigated by X-ray photoelectron spectroscopy (XPS). Histological slides tissues examined light microscopy, XPS, electron microprobe analysis. None failed presented regular composition depth profile TiO2 overlayer; foreign...
As an interconnect material, copper has the disadvantage of not forming self-limiting oxides, which can negatively affect device performance and reliability. Undesired oxide layers need to be removed by in situ cleaning, before is subjected subsequent depositions. We have used ethyl alcohol as a vapor phase reducing agent remove oxides formed on electroplated films upon exposure ambient. Spectroscopic ellipsometry been monitor reduction process situ. Ex characterization using X-ray...
In this paper we present the concept of Fully Self Aligned Via (FSAV) with motivation achieving manufacturable litho process windows for patterning vias in 5nm-node interconnects. A flow is proposed FSAV which includes metal recess etching and insertion an etch stop layer. Integration challenges are addressed solutions demonstrated complementary capacitance simulation.
Abstract PET (Polyethylene terephthalate) films were modified with two different plasmas, nitrogen and oxygen, as a function of treatment times RF powers. Firstly, the chemical composition plasma‐modified was investigated by XPS. In case plasma, formation amine, imine amide groups is detected. A slight diffusion nitrogen‐containing species into bulk also observed angle‐resolved XPS measurements. The appearance alcohol, carbonyl carboxyl functions in oxygen plasma treatment. After thermal...
The formation of the interface between aluminium and O2 or CO2 plasma-modified poly(ethylene terephthalate) (PET) has been investigated by X-ray photoelectron spectroscopy (XPS). As demonstrated changes in C 1s, O A1 2p core level spectra upon deposition, metal was found to react preferentially with original ester, plasma-induced carboxyl carbonyl groups form interfacial complexes. phenyl ring at modified PET surface seen be involved interface, but a lesser extent. This confirms high...
Interconnect options will be introduced and reviewed targeting tight pitch metal layers at the local levels. Examples include hybrid metallization, semi-damascene interconnects as well potential new conductor materials.
For many years traditional 193i lithography has been extended to the next technology node by means of multi-patterning techniques. However recently such a became challenging and expensive push beyond for complex features that can be tackled in simpler manner Extreme UltraViolet Lithography (EUVL) technology. Nowadays, EUVL is part high-volume manufacturing device landscape it reached critical decision point where one further single print on 0.33NA full field scanner or move EUV double...
We have investigated the interface formation between ITO and N,N′-bis-(1-naphthyl)-N,N′-diphenyl-1,1′-biphenyl-4,4′-diamine (NPB), an organic materials often used as hole transport layer in light-emitting devices (OLED), by using X-ray ultraviolet photoelectron spectroscopy (XPS UPS) atomic force microscopy (AFM). Acid or base treatment of indium tin oxide (ITO) surfaces can significantly alter surface work function which, case acid treatment, points to improved energy level alignment with...
The deposition of homogeneous thin films on porous substrates has been investigated. film Ta(N) by physical vapor with different average pore sizes and material compositions studied. continuity top low-k dielectrics is evaluated means ellipsometric porosimetry combined sheet resistance atomic force microscopy measurements. Interface reactions are analyzed x-ray photoelectron spectroscopy profiling. It observed that the minimal thickness required to obtain a continuous metal layer depends,...
Fluorocarbon polymer deposited on a checkerboard wafer composed of low-k dielectrics and TiN dies (2×2 cm squares) was used as model for wet removal experiments. The the residues generated sidewalls patterned dielectric structure were characterized using ellipsometry, Fourier transform infrared spectroscopy, X-ray photoelectron angle-resolved respectively. Both types samples showed that while cleans mixture dimethylsulfoxide monoethanolamine or commercial solvent only removed partially...
Chemical modification of the PET surface by carbon dioxide plasma treatment has been studied using X-ray photoelectron spectroscopy (XPS). The process results mainly in formation carbonyl, carboxyl, and carbonate groups at surface. Under rather mild conditions (low power combined with a short time), C-O bonds was found to be dominant, whereas highly oxidized or double-bonded oxygen-containing required high relatively long time. treatments performed under excessive frequently led degradation...
The removal of an oxygen-containing plasma-modified layer on top porous low dielectric constant (low-k) materials by treatment with aqueous HF has been investigated. Our study demonstrates that estimation the thickness a damaged low-k film requires careful consideration concentration and immersion time. High concentrations result in enhanced etch rate is difficult to control for thicknesses interest here. Ellipsometry measurements before after provide good means internal comparison, instance...
This work reports metal exploration for buried power rail (BPR) and Via-to-BPR (VBPR) towards the 1 nm node. For tungsten, which is first choice of BPR at 3 node, we optimize W metallization stack to minimize line resistivity, together with ways reduce W-BPR - W-VBPR contact resistance (R). scaled CDs 2 nodes, introduce molybdenum level benchmark its R electromigration against Ru metallization. Additionally, Mo dry & wet, selective etch processes enable Mo-BPR recess in fin/STI fin pitch 24...
A fluorocarbon polymer generated by plasma polymerization of CF4/CH2F2 used as a model for sidewall residues was subjected to ultraviolet (UV) irradiation (λ = 254 nm). Fourier transform infrared spectroscopy and X-ray photoelectron indicated that the as-deposited mainly contains CF, CF2, small concentration unsaturated, fluorinated C=C bonds, carbonyl functionalities. partial removal occurred during UV in oxygen. Experimental results showed resulted slight decrease fluorine content...