M. Thomas

ORCID: 0000-0003-4252-8500
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About
Contact & Profiles
Research Areas
  • Semiconductor materials and devices
  • Copper Interconnects and Reliability
  • Analytical Chemistry and Sensors
  • 3D IC and TSV technologies
  • Advancements in Semiconductor Devices and Circuit Design
  • Salmonella and Campylobacter epidemiology
  • Molecular Junctions and Nanostructures
  • Ferroelectric and Negative Capacitance Devices
  • Electrochemical Analysis and Applications
  • Vibrio bacteria research studies
  • Electromagnetic Compatibility and Noise Suppression
  • Viral gastroenteritis research and epidemiology
  • Global Maternal and Child Health
  • Leptospirosis research and findings
  • Microwave and Dielectric Measurement Techniques
  • Ferroelectric and Piezoelectric Materials
  • Radio Frequency Integrated Circuit Design
  • MXene and MAX Phase Materials
  • Esophageal and GI Pathology
  • Antibiotic Resistance in Bacteria
  • Mechanical and Optical Resonators
  • Diagnosis and treatment of tuberculosis
  • Microwave Engineering and Waveguides
  • Microfluidic and Capillary Electrophoresis Applications
  • Gastrointestinal disorders and treatments

Duncan Village Day Hospital
2023

University of Minnesota
2018-2021

STMicroelectronics (Switzerland)
2005-2008

STMicroelectronics (France)
2005-2008

STMicroelectronics (India)
2007

Centre National de la Recherche Scientifique
2005-2006

The floating gate, electrolyte-gated transistor (FGT) is a chemical sensing device utilizing gate electrode to physically separate and electronically couple the active area with transistor. FGT platform has yielded promising results for detection of DNA proteins, but questions remain regarding its fundamental operating mechanism. Using carboxylic acid-terminated self-assembled monolayers (SAMs) exposed solutions different pH, we create charged surface hence characterize role that interfacial...

10.1021/acs.jpclett.8b00285 article EN The Journal of Physical Chemistry Letters 2018-03-06

Printed electrolyte-gated transistors (EGTs) are an emerging biosensor platform that leverage the facile fabrication engendered by printed electronics with low voltage operation enabled ion gel dielectrics. The resulting label-free, nonoptical sensors have high gain and provide sensing operations can be challenging for conventional chemical field effect transistor architectures. After providing overview of EGT device operation, we highlight opportunities microfluidic enhancement sensor...

10.1063/1.5131365 article EN cc-by Biomicrofluidics 2020-01-01

Floating-gate transistors (FGTs) are a promising class of electronic sensing architectures that separate the transduction elements from molecular components, but factors leading to optimum device design unknown. We developed model, generalizable many different semiconductor/dielectric materials and channel dimensions, predict sensor response changes in capacitance and/or charge at surface upon target binding or other chemistry. The model predictions were compared experimental data obtained...

10.1021/acssensors.1c00261 article EN ACS Sensors 2021-04-22

Ileal perforation occurs in about 1% of enteric fevers as a complication, with case fatality risk (CFR) 20%-30% the early 1990s that decreased to 15.4% 2011 South East Asia. We report nontraumatic ileal perforations and its associated CFR from 2-year prospective fever surveillance across India.The Surveillance for Enteric Fever India (SEFI) project established multitiered system between December 2017 March 2020. Nontraumatic were surveilled at 8 tertiary care 6 secondary hospitals classified...

10.1093/infdis/jiab258 article EN cc-by The Journal of Infectious Diseases 2021-05-12

The electrolyte gated transistor with a floating gate (FGT) is promising sensing platform for both chemical and biodetection applications due to its fast, label-free response, low voltage operation, simple fabrication by printing conventional lithography. We present here unified framework understanding how FGTs measure changes in interfacial capacitance surface charge, using self-assembled monolayers (SAMs) on the FGT detection area as model systems. measurements take advantage of alkyl...

10.1088/2058-8585/ab4dcf article EN Flexible and Printed Electronics 2019-11-01

RF and analog designs require high performances MIM capacitors. In order to continue downscaling of devices, we have developed integrated a 3D damascene capacitor in the copper back-end 0.13 mum BICMOS technology. Si <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> N xmlns:xlink="http://www.w3.org/1999/xlink">4</sub> has been used as dielectric reach excellent for 5 fF/mum <sup xmlns:xlink="http://www.w3.org/1999/xlink">2</sup>...

10.1109/bipol.2006.311168 article EN Bipolar/BiCMOS Circuits and Technology Meeting 2006-10-01

A new simple 3D Damascene architecture requiring only one additional mask is introduced for high-density MIM capacitors. TiN/Ta <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O xmlns:xlink="http://www.w3.org/1999/xlink">5</sub> /TiN stack deposited by PEALD has been integrated between Cu interconnect levels to maximize quality factor Q, reaching up 17 fF/μm <sup xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> capacitance....

10.1109/vlsit.2007.4339726 article EN 2007-06-01

High-frequency simulations and characterizations of advanced metal-insulator-metal (MIM) capacitors with ultra thin 32 nm PECVD Si/sub 3/N/sub 4/ dielectric are presented. The frequency dependent behavior is numerically experimentally extracted over a wide bandwidth. Numerical results validated by comparison to experimental results. An equivalent circuit model including four parameters developed for better understanding the behavior. We focused on impact design performances MIM realized Si...

10.1109/essder.2005.1546693 article EN 2005-12-13
Megan E. Carey Zoe A. Dyson Danielle J. Ingle Afreenish Amir Mabel Kamweli Aworh and 95 more Marie Anne Chattaway Ka Lip Chew John A. Crump Nicholas Feasey Benjamin P. Howden Karen H. Keddy Mailis Maes Christopher M. Parry Sandra Van Puyvelde Hattie E. Webb Ayorinde O. Afolayan Shalini Anandan Jason R. Andrews Philip Ashton Buddha Basnyat Ashish Bavdekar Isaac I. Bogoch John D. Clemens Kesia E. da Silva Anuradha De Joep de Ligt Paula Díaz Christiane Dolecek Shanta Dutta Louise Francois Watkins Denise O Garrett Gauri Godbole Melita A. Gordon Andrew R. Greenhill Chelsey Griffin Madhu Gupta Rene Hendricksen Robert S. Heyderman Yogesh Hooda Juan Carlos Hormazábal Odion O. Ikhimiukor Junaid Iqbal Jobin John Jacob Claire Jenkins Dasaratha Ramaiah Jinka Jacob John Gagandeep Kang Abdoulie Kanteh Arti Kapil Abhilasha Karkey Samuel Kariuki Robert A. Kingsley Roshine Mary Koshy A.C. Lauer Myron M. Levine Ravikumar Kadahalli Lingegowda Stephen P. Luby Grant Mackenzie Tapfumanei Mashe Chisomo Msefula Ankur Mutreja Geetha Nagaraj Savitha Nagaraj Satheesh Nair Take Naseri Susana Nimarota-Brown Elisabeth Njamkepo Iruka N. Okeke Sulochana Putli Bai Perumal Andrew J. Pollard Agila Kumari Pragasam Firdausi Qadri Farah Naz Qamar Sadia Rahman Savitra Rambocus David A. Rasko Pallab Ray Roy M. Robins‐Browne Temsunaro Rongsen‐Chandola Jean Pierre Rutanga Samir K. Saha Senjuti Saha Karnika Saigal Mohammad Saiful Islam Sajib Jessica C. Seidman Jivan Shakya Varun Shamanna Jayanthi Shastri Rajeev Shrestha Sonia Sia Michael J. Sikorski Ashita Singh Anthony M. Smith Kaitlin A. Tagg Dipesh Tamrakar Arif Mohammad Tanmoy Maria Thomas M. Thomas Robert Thomsen Nicholas R. Thomson

Abstract The Global Typhoid Genomics Consortium was established to bring together the typhoid research community aggregate and analyse Salmonella enterica serovar Typhi (Typhi) genomic data inform public health action. This analysis, which marks twenty-one years since publication of first genome, represents largest genome sequence collection date (n=13,000), provides a detailed overview global genotype antimicrobial resistance (AMR) distribution temporal trends, generated using open analysis...

10.1101/2022.12.28.22283969 preprint EN cc-by medRxiv (Cold Spring Harbor Laboratory) 2022-12-30

MIM capacitors are widely integrated for RF and analog applications. A high density full PEALD TiN/Ta <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O xmlns:xlink="http://www.w3.org/1999/xlink">5</sub> /TiN capacitor is among copper interconnect following an innovative 3D damascene architecture. The impact of a TaN/Ta layer, introduced to avoid Cu diffusion, on both TiN electrode properties stack performance studied. Unexpected lower...

10.1109/iitc.2007.382377 article EN 2007-06-01

<para xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> High-frequency characterizations of ultra thin 32 nm PECVD Si<formula formulatype="inline"><tex Notation="TeX">$_{3}$</tex></formula>N<formula formulatype="inline"> <tex Notation="TeX">$_{4}$</tex></formula> dielectric in an advanced metal–insulator–metal (MIM) capacitors are presented, with focus on the impact design performance MIM capacitors. Frequency dependent capacitance has been extracted...

10.1109/tcapt.2008.2001128 article EN IEEE Transactions on Components and Packaging Technologies 2008-09-01

RF and analog designs require high performances MIM capacitors. In order to continue the downscaling of devices, we proposed integrated a 3D damascene capacitor using Si <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> N xmlns:xlink="http://www.w3.org/1999/xlink">4</sub> dielectric in copper back-end 0.13 μm BICMOS technology. Layout process have been recently optimized reach excellent reliability while keeping very good performances.

10.1109/bipol.2007.4351879 article EN Proceedings of the ... Bipolar/BiCMOS Circuits and Technology Meeting/Proceedings of the ... BipolarBiCMOS Circuits and Technology Meeting 2007-09-01

High frequency characterizations of ultra thin 32 nm PECVD Si 3 N 4 dielectric on advanced metal-insulator-metal (MIM) capacitors are presented. We focused the impact design performances MIM realized substrates. The dependent behavior capacitance is extracted over a wide bandwidth. An equivalent circuit model including four parameters developed to explain this behavior. Results compared values obtained by 3D Electro-Magnetic modeling.

10.1109/mwsym.2005.1516583 article EN IEEE MTT-S International Microwave Symposium digest 2005-06-17

High frequency characterizations and simulations of 3D damascene Metal-Insulator-Metal (MIM) capacitors are presented. We focused on the impact design performance integrated capacitors. Results showed that properties MIM capacitor get improved with specific recommendations electrodes shape.

10.1109/essderc.2007.4430961 article EN 2007-01-01

High-frequency (HF) characterisations of 2D and 3D metal–insulator–metal (MIM) damascene capacitors are presented focusing on the impact MIM architecture HF performance integrated in back end line with Si3N4 as insulating material. Dedicated test structures were characterisation methods developed. Results show that properties (parasitic inductance cutoff frequency) improve architecture.

10.1049/el:20083129 article EN Electronics Letters 2008-03-12

High frequency characterizations of high-K dielectrics and advanced metal-insulator-metal (MIM) capacitors are presented. This work deals with the impact process on materials permittivity effect architectures MIM electrical performances.

10.1109/commad.2006.4429874 article EN Conference on Optoelectronic and Microelectronic Materials and Devices 2006-12-01

Metal-insulator-metal (MIM) capacitors are key components in radio frequency integrated circuits. In this paper, several 0.12 mum-CMOS Cu-Si <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> N xmlns:xlink="http://www.w3.org/1999/xlink">4</sub> -Cu realized with damascene architecture and whose process allows high-k dielectric compatibility have been designed characterised from 45 MHz to 40 GHz. Large band equivalent electrical models...

10.1109/iecon.2006.347533 preprint EN 2006-11-01

High frequency characterizations and simulations of advanced metal-insulator-metal (MIM) capacitors in Cu/low-k backend interconnection process are presented. First, we focus on the impact silicon substrate design MIM high performance. Numerical results obtained by a 3D electromagnetic modeling validated comparison to experimental results. Second, show possibility increase HF electrical performance capacitor with optimized integration new medium or high-k materials.

10.1109/mwsym.2007.380070 article EN IEEE MTT-S International Microwave Symposium digest 2007-06-01
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